Abstract: A method for cleaning components of a gas turbine engine is presented. The method includes introducing a working fluid into a gas flow path or a cooling circuit defined by the one or more components of the gas turbine engine such that the working fluid impinges upon a surface of the one or more components of the gas turbine engine, wherein the working fluid includes a plurality of detergent droplets entrained in a flow of steam. A system for cleaning components of a gas turbine engine are also presented.

Abstract: Methods, systems, and apparatus for generating hydrogen radicals for processing a workpiece, such as a semiconductor workpiece, are provided. In one example implementation, a method can include generating one or more species in a plasma chamber from an inert gas by inducing a plasma in the inert gas using a plasma source; mixing hydrogen gas with the one or more species to generate one or more hydrogen radicals; and exposing the workpiece in a processing chamber to the one or more hydrogen radicals.

Abstract: Novel materials and devices can remove small defects from long rolls of flexible electronics material while they are in continuous motion. The cleaning materials are designed to remove small particles without transferring defects or damaging the flexible electronics. The device generally consists of variable speed, motor-driven cylinders mounted on moveable brackets. The cylinders are capable of matching the speed of the cleaning material such that the cleaning material is always in contact with the web roll to be cleaned. The brackets are capable of rotating so the same material can be used more than once. Another material is used to remove debris from the cleaning material. A similar device consisting of motor-driven cylinders and moveable is used to apply the debris removal film to the cleaning film, allowing the cleaning film to be used multiple times.

Abstract: A cleaning module for cleaning a wafer comprises a wafer gripping device configured to support a wafer in a vertical orientation and comprises a catch cup and a gripper assembly. The catch cup comprises a wall that has an annular inner surface that defines a processing region and has an angled portion that is symmetric about a central axis of the wafer gripping device. The gripper assembly comprises a first plate assembly, a second plate assembly, a plurality of gripping pin, and a plurality of loading pin. The gripping pins are configured to grip a wafer during a cleaning process and the loading pins are configured to grip the wafer during a loading and unloading process. The cleaning module further comprises a sweep arm coupled to a nozzle mechanism configured to deliver liquids to the front and back side of the wafer.

Abstract: Peroxyformic acid compositions for removal of biofilm growth and mineral deposits on membranes are disclosed. In particular, peroxyformic acid compositions are generated in situ or on site generation for the reduction and prevention, of biofilms and the mitigation of mineral buildup on the membranes. The compositions according to the invention are compatible with the membranes under application of use conditions.

Abstract: A plumbing clog removal apparatus that includes a vacuum chamber having an inlet, an outlet, and a compressor port. The clog removal apparatus also includes an inlet seal disposed at the vacuum chamber inlet. The vacuum chamber inlet seal is movably coupled to the vacuum chamber inlet and is movable between an open position and a closed position. The plumbing clog removal apparatus also includes, an outlet seal disposed at the vacuum chamber outlet. The outlet seal is movably coupled to the vacuum chamber outlet and is movable between an open position and a closed position. The vacuum chamber also includes an air compressor fluidically connected to the vacuum chamber compressor port. The compressor is configured to remove air from the compressor chamber and form a low pressure condition inside the vacuum chamber.

Abstract: According to one embodiment of the present disclosure, a dishwashing machine includes a tub accommodating tableware, a nozzle assembly spraying washing water, a vane assembly changing a traveling direction of the washing water sprayed from the nozzle assembly to move linearly inside the tub, a user interface for receiving a divided washing zone selected by a user, and a control unit controlling movement of the vane assembly to wash the selected divided zone by the washing water including the changed traveling direction.

Abstract: To facilitate removal of foreign matters from a preform. The preform in an inverted position with a mouth portion thereof facing down is being continuously transferred, filtered air is blasted into the preform through the mouth portion of the preform, and at the same time, air is sucked from the side of the mouth portion of the preform. Foreign matters can be more easily discharged from the preform because of the flow of air and the weight of the foreign matters.

Abstract: The present invention refers to a system and method of manual surface cleaning comprising: a) applying a first use solution of a first detergent composition to a cleaning textile; b) wet wiping a surface with cleaning textiles wetted with a first use solution of the first detergent composition; c) washing the cleaning textiles soiled in the previous step by washing in a second use solution of the first detergent composition; and d) wet wiping a surface with cleaning textiles obtained in the previous step. The present invention further refers to the use of the detergent composition for manual surface cleaning involving the use of cleaning textiles and for washing said cleaning textiles soiled by said manual surface cleaning.

Abstract: A device for the integrated production and filling of containers and a method for cleaning and/or disinfecting at least the mold of at least one molding and filling station of the device. During a cleaning and/or disinfecting operation of the device, at least the inside of the mold is cleaned and/or disinfected with at least one cleaning and/or disinfecting agent by at least one cleaning element. During the cleaning and/or disinfecting operation, the at least one mold is opened and closed at least once, preferably many times and/or the plunger is moved at least once, preferably many times, between its initial position and end position.

Abstract: A method for obtaining information about a load of articles to be cleaned in a dishwasher is provided. The method may include stopping a pump from pumping liquid through a spraying system of the dishwasher at a point of time; recording a pressure signal in a sump of the dishwasher from the point of time the pump was stopped; measuring a time period, said time period being measured from the point of time the pump stopped until the pressure signal is essentially stable; and comparing the time period with reference values for obtaining information about the load in the dishwasher. A corresponding dishwasher, computer program, and computer program product may be provided.

Abstract: Cleaning particles are arranged in a space between the inner tub and the outer tub of a washing machine. A drainage and dewatering control method comprises: opening a drainage valve; determining the amount of the cleaning particles per each unit volume of water in the space; and controlling the rotating speed of the inner tub. Drainage and dewatering processes are divided into at least two control stages according to the amount of the cleaning particles per each unit volume of water in the space, different rotating ways of the inner tub are set in respective stages, and the rotating speed of the inner tub is higher in the stage that the amount of the cleaning particles per unit volume of water is larger. A control stage is selected according to the detected amount of the cleaning particles per unit volume of water in the space.

Abstract: A method for cleaning a filter arrangement which has a first fluid connector, a second fluid connector and a filter device which is arranged between the first and second fluid connectors and which has a surface to which contaminants can adhere. The method has the following steps: connecting the first fluid connector to a blowing chamber which has a gas connector, at least partially filling the blowing chamber with a liquid, and generating a cleaning pulse, in which gas is conducted under pressure via the gas connector into the blowing chamber for a first time duration, such that a gas-liquid mixture is forced via the first fluid connector through the filter device and out of the second fluid connector.

Abstract: A method for operating an electronic device manufacturing system is provided that includes introducing an inert gas into a process tool vacuum pump at a first flow rate while the process tool is operating in a process mode, and introducing the inert gas into the process tool vacuum pump at a second flow rate while the process tool is operating in a chamber clean mode. Numerous other embodiments are provided.

Abstract: Spray apparatus and uses thereof are described herein. A vacuum spray nozzle apparatus may include a first tube in fluid communication with a fluid source, a rotor coupled to the tube, a conduit in fluid communication with the passages of the first tube, and a second tube coupled to the conduit, the second tube being in fluid communication with a vacuum source. The rotor is in fluid communication with the pressurized fluid source. The conduit is substantially arched or angled such that an outlet of the conduit is offset a radial distance in a radial direction from the rotor axis, and when pressurized fluid is ejected from the outlet, during use, rotates the conduit. The vacuum spray nozzle apparatus is configured to remove components from a material through the second tube when a pressure of the system is reduced using the vacuum source.

Abstract: A cleaning system and method uses a tank holding a fluid detergent and an equipment assembly formed from a plurality of discrete components joined together. One or more ultrasound transducers remove one or more deposits on the equipment assembly by generating and propagating high frequency ultrasound waves into the fluid detergent while the equipment assembly is in contact with the fluid detergent.

Abstract: In an aseptic filling apparatus, a CIP of the content filling station is performed after rotation of a wheel in the content filling station is stopped, a COP or SOP of the content filling station is performed while the wheel in the content filling station is rotating immediately after the CIP is completed, an SIP of the content filling station is performed with rotation of the wheel in the content filling station being stopped immediately after the COP or SOP is completed, and one or both of the COP and SOP of the other stations is performed in a predetermined order while wheels in the other stations are rotating in a period from the start of the CIP to the end of the SIP.

Abstract: A method of eliminating microbes in an overflow space in a sink having a sink basin may include obtaining a liquid dispensing and effluent shielding container assembly including a splash guard including a splash guard shield and an injection nozzle carried by the splash guard shield, the injection nozzle having an injection nozzle bore and at least one injection opening in the injection nozzle, the at least one injection opening, disposed in fluid communication with the injection nozzle bore; inserting the injection nozzle of the liquid dispensing and effluent shielding container assembly in the at least one overflow opening in the sink basin until the splash guard substantially covers the at least one overflow opening; and expelling the antimicrobial or cleaning agent liquid through the injection nozzle and the at least one injection opening and into the overflow space in the sink basin of the sink, respectively.

Abstract: A method for cleaning a substrate includes setting a substrate inside a cleaning chamber, supplying on a surface of the substrate a treatment solution which includes a volatile component and forms a treatment film, vaporizing the volatile component of the treatment solution supplied on the surface of the substrate such that the treatment solution solidifies or is cured on the surface of the substrate and the treatment film is formed on the surface of the substrate, and supplying onto the treatment film formed on the surface of the substrate a removal solution which removes the treatment film.

Abstract: Disclosed is a substrate liquid processing apparatus including: a processing bath in which a processing liquid is stored; a chemical liquid component supply unit that supplies chemical liquid components; a concentration detecting unit that detects a concentration of the chemical liquid components; and a controller configured to perform a first control as a feedback control that replenishes the processing liquid with the chemical liquid components such that the concentration of the chemical liquid components contained in the processing liquid within the processing bath does not become less than a predetermined allowable lower limit, based on the concentration of the chemical liquid components detected by the concentration detecting unit.