Abstract: [Object] To provide a radiation shielding material that includes a resin composition obtained by filling a matrix formed of resin with a radiation-absorbing substance and is capable of obtaining a structure in which transparency is significantly improved as compared with the conventional radiation shielding material while having a radiation shielding effect similar to that of the conventional radiation shielding material. [Solving Means] A radiation shielding material includes: a resin composition containing a proportion of 20 to 80 vol % of fluoride powder containing barium as a constituent element. The fluoride powder is favorably barium fluoride or lithium barium fluoride, the resin favorably has a refractive index (n) of 1.4 to 1.6, and particularly, a difference between a refractive index of the resin and a refractive index of the fluoride powder is favorably within ±0.05.

Abstract: A solution for disinfecting an area using ultraviolet radiation is provided. The solution can include an enclosure including at least one ultraviolet transparent window and a set of ultraviolet radiation sources located adjacent to the at least one ultraviolet transparent window. The set of ultraviolet radiation sources can be configured to generate ultraviolet radiation directed through the at least one ultraviolet transparent window. An input unit can be located on the enclosure and configured to generate an electrical signal in response to pressure applied to the enclosure. A control unit can be configured to manage the ultraviolet radiation by monitoring the electrical signal generated by the input unit and controlling, based on the monitoring, the ultraviolet radiation generated by the set of ultraviolet radiation sources.

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a plurality of first blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a plurality of second blankers to deflect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member to be in a direction orthogonal to a deflection direction of the plurality of first blankers, a blanking aperture member to block each of beams which were deflected to be in a beam off state by at least one of the plurality of first blankers and the plurality of second blankers, and a detection processing unit to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member.

Abstract: A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.

Abstract: Areas having different isotopic ratios are artificially introduced into a metal material before sintering, a heat treatment, or grain boundary diffusion, and atom probe analysis results before and after sintering, a heat treatment, or grain boundary diffusion are compared to evaluate a change in isotopic distribution over time.

Abstract: A shutter assembly includes a first shutter blade having a first toothed arm extending therefrom and a first light transmitting aperture therein, and a second shutter blade positioned adjacent and parallel to the first shutter blade. The second shutter blade has a second toothed arm extending therefrom and a second light transmitting aperture therein. The first and second shutter blades are supported to allow parallel linear motion. A motor gear is disposed between, and meshed with, the first and second toothed arms such that rotation of the gear causes the first and second shutter blades to move linearly in opposite directions between an open position in which the first and second light transmitting apertures are in an overlapping relationship with respect to one another, and a closed position in which the first and second light transmitting apertures are in a non-overlapping relationship with respect to one another.

Abstract: This sample holder for a scanning probe microscope is constituted of (1) a container that retains a liquid and (2) a flat-plate-shaped upper cover that covers an upper opening of the container and that has a narrow slit above the position where a sample is placed. In the upper cover, the slit has a slit width with which a thin film of the liquid is formed over the upper surface of the sample when the liquid fills the space between the container and the upper cover. The thin film of the liquid has a film thickness smaller than the distance between the upper surface of the sample and the upper cover.

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

Abstract: A method is provided of measuring the mass thickness of a target sample for use in electron microscopy. Reference data are obtained which is representative of the X-rays (28) generated within a reference sample (12) when a particle beam (7) is caused to impinge upon a region (14) of the reference sample (12). The region (14) is of a predetermined thickness of less than 300 nm and has a predetermined composition. The particle beam (7) is caused to impinge upon a region (18) of the target sample (16). The resulting X-rays (29) generated within the target sample (16) are monitored (27) so as to produce monitored data. Output data are then calculated based upon the monitored data and the reference data, the output data including the mass thickness of the region (18) of the target sample (16).

Abstract: A charged particle beam specimen inspection system is described. The system includes an emitter for emitting at least one charged particle beam, a specimen support table configured for supporting the specimen, an objective lens for focusing the at least one charged particle beam, a charge control electrode provided between the objective lens and the specimen support table, wherein the charge control electrode has at least one aperture opening for the at least one charged particle beam, and a flood gun configured to emit further charged particles for charging of the specimen, wherein the charge control electrode has a flood gun aperture opening.

Abstract: A microscope system and method allow for a desired x?-direction scanning along a specimen to be angularly offset from an x-direction of the XY translation stage, and rotates an image sensor associated with the microscope to place the pixel rows of the image sensor substantially parallel to the desired x?-direction. The angle of offset of the x?-direction relative to the x-direction is determined and the XY translation stage is employed to move the specimen relative to the image sensor to different positions along the desired x?-direction without a substantial shift of the image sensor relative to the specimen in a y?-direction, the y?-direction being orthogonal to the x? direction of the specimen. The movement is based on the angle of offset.

Abstract: A device for transmitting and projecting greater photonic energy. The device includes at least one photonic source for generating and emitting photonic energy in a wavelength or in a range of wavelengths of visible light. The device also includes a lens formed of a fluoropolymer material wherein the at least one photonic source is sealed within an interior and underneath an outer surface of the fluoropolymer material so as to be surrounded by the fluoropolymer material. The at least one photonic source is coupled with the lens such that the photonic energy emitting from the at least one photonic source transmits through and projects beyond the fluoropolymer material. The lens propagates photons in an omnidirectional pattern simultaneously throughout the entirety of the lens. The joining of the at least one photonic source and the fluoropolymer material comprises all components for generating and emitting photonic energy when the photonic source is activated, such that it is an operable source.

Abstract: A system includes a digital pattern generator (DPG) having a plurality of pixels that are dynamically and individually controllable; a switching device that is coupled to the DPG, the switching device configured to route a packet to the DPG so as to control at least one of the pixels, the switching device further comprising: a plurality of input buffers configured to receive and store the packet through a transmission line; a plurality of output buffers; a plurality of memory devices, wherein each of the plurality of memory devices is associated with one of the plurality of output buffers; and a scheduling engine that is coupled to the plurality of input buffers, the plurality of output buffers, and the plurality of memory devices and is configured to determine a routing path for the packet stored in one of the input buffers based on an availability of the output buffers and a vacancy level the memory devices.

Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

Abstract: The invention provides methods of detecting an analyte by multi-stage mass spectrometry with improved S/N ratio. An analyte is labeled with a positively-charged mass tag to form a precursor ion that leads by anchimeric assistance to a greatly enhanced, analyte-characteristic first product ion that can, in turn, lead to a greatly enhanced, analyte-characteristic second product ion in a mass spectrometer. Either a three stage mass spectrometer (true MS3) or a two-stage mass spectrometer (MS2) operated in a pseudo MS3 mode can be used. The precursor ion is split via an anchimeric-assisted reaction to form a first product ion, which in turn can be fragmented to form the second product ion. The methods offer extreme ultrasensitivity, at the low amol level. The invention also provides anchimeric mass tags for use in the methods. A wide variety of previously undetectable analytes of biological or environmental origin can be detected and quantified.

Abstract: Multiplexed ion mobility spectrometry (IMS), mass spectrometry (MS) such as time-of-flight mass spectrometry (TOFMS), or hybrid IM-MS is carried out on a sample, and the resulting measurement data are deconvoluted. A pulse sequence controlling ion pulsing is utilized in conjunction with the multiplexing. The pulse sequence may be modified based on the raw measurement data acquired. A demultiplexing matrix based on the modified pulse sequence is utilized to improve deconvolution.

Abstract: A method of determining the structure of a macromolecular assembly (MMA) comprises the steps of (a) generating precursor ions of an MMA species to be investigated; (b) transporting the MMA precursor ions to a fragmentation zone; (c) carrying out pulsed fragmentation of the MMA precursor ions in the fragmentation zone; (d) for a first plurality of MMA precursor ions, detesting both a spatial distribution of the resultant MMA fragment ions, and an m/z distribution of the MMA fragment ions; (e) analyzing the spatial and m/z distributions of fragment ions formed from the said first plurality of precursor ions of the MMA species to be investigated, to determine the relative positions of those fragment ions within the structure of the precursor MMA; and (f) reconstructing the three dimensional (3D) structure of the MMA from the analysis of the spatial and m/z distributions of fragment ions.

Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.

Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).

Abstract: A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.