Abstract: A semiconductor memory device includes a first chip having a peripheral transistor and a first insulating layer, and includes a second chip having a stacked structure and a second insulating layer. The stacked structure includes conductive patterns and insulating patterns alternately stacked with each other, the first insulating layer includes a first bonding surface, the second insulating layer includes a second bonding surface contacting the first bonding surface, and the second chip further includes a protrusion protruding from the second bonding surface of the second insulating layer toward the first insulating layer.

Abstract: A semiconductor device assembly is provided. The assembly comprises a package substrate, a first stack of semiconductor dies having a first set of planform dimensions disposed over a first location on the substrate, a second stack of semiconductor dies having a second set of planform dimensions different from the first set disposed over a second location on the substrate, and an encapsulant at least partially encapsulating the substrate, the first stack and the second stack. The first stack of semiconductor dies has a first planform area, the second stack of semiconductor dies has a second planform area, and a sum of the first and second planform areas can be at least 50%, 67%, 75%, or even more of an area of the package substrate.

Abstract: A three-dimensional semiconductor memory device is provided. The device may include a first substrate including a bit-line connection region and a word-line connection region, a cell array structure on the first substrate, a second substrate including a first core region and a second core region, which are respectively overlapped with the bit-line connection region and the word-line connection region, and a peripheral circuit structure on the second substrate.

Abstract: Embodiments of structure and methods for forming a three-dimensional (3D) memory device are provided. In an example, a 3D memory device includes a substrate, a memory stack on the substrate; and a source contact structure extending vertically through the memory stack. The source contact structure includes a first source contact portion in the substrate and having a conductive material different from the substrate. The source contact structure also includes a second source contact portion above, in contact with, and conductively connected to the first source contact portion.

Abstract: A semiconductor package includes a first semiconductor chip and a second semiconductor chip on a substrate, a barrier layer on the first semiconductor chip and the second semiconductor chip, the barrier layer having an opening through which at least a part of the first semiconductor chip is exposed, and a heat transfer part on the barrier layer, the heat transfer part extending along an upper face of the barrier layer and filling the opening.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate, a gate stack, and an interconnect structure over the gate stack and the semiconductor substrate. The semiconductor device structure also includes a resistive element over the interconnect structure, and the resistive element is directly above the gate stack. The semiconductor device structure further includes a thermal conductive element over the interconnect structure. The thermal conductive element at least partially overlaps the resistive element. In addition, the semiconductor device structure includes a dielectric layer separating the thermal conductive element from the resistive element.

Abstract: A memory device having a vertical structure includes a memory cell array defined in a cell wafer, and having a plurality of word lines extending in a first direction and arranged in a second direction, and having a plurality of bit lines extending in the second direction and arranged in the first direction; and a logic circuit configured to control the memory cell array, and including a page buffer low-voltage circuit, a page buffer high-voltage circuit, a row decoder circuit and a peripheral circuit, wherein the page buffer low-voltage circuit is disposed in a first peripheral wafer and the page buffer high-voltage circuit, the row decoder circuit and the peripheral circuit are disposed in a second peripheral wafer, and wherein the cell wafer overlaps with the first peripheral wafer and the second peripheral wafer in a vertical direction that is perpendicular to a plane formed by the first direction and the second direction.

Abstract: An electronic device including a screen module and a distance sensing module. The screen module includes a light emitting unit and a control circuit conductively connected with the light emitting unit, where when energy received by a photoelectric effect unit of the control circuit is greater than an excitation threshold of the photoelectric effect unit the control circuit is turned on and the light emitting unit emits light. The distance sensing module is arranged below a display area of the screen module and includes an infrared receiver and a plurality of infrared emitters, where emitted energy of any one of the plurality of infrared emitters is less than the excitation threshold and a sum of emitted energies of the plurality of infrared emitters is greater than an operating threshold of the distance sensing module.

Abstract: A method of forming a quilt package nodule includes forming a trench in a microchip substrate, forming a metal layer on the bottom, the first and second sides of the trench, and on a top surface of the microchip substrate proximate the first and second sides. forming a mask layer on the metal layer, removing portions of the mask and metal layers on the bottom of the trench, etching the bottom of the trench to increase the depth of the bottom of the trench, removing remaining portions of the mask layer from the metal layer to define the quilt package nodules that protrude beyond edges of the first and second sides, and removing the remaining portion of the trench bottom thereby separating the first and second sides from each other, whereupon each side includes at least one quilt package nodule protruding from the side.

Abstract: An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and wherein the second section of the metal pillar is formed by depositing metal in a second opening of a second photoresist layer.

Abstract: Embodiments of 3D memory devices and methods for forming the same are disclosed. In an example, a method for forming a 3D memory device is disclosed. A peripheral circuit is formed on a first substrate. A first semiconductor layer is formed on a second substrate. A supporting structure and a second semiconductor layer coplanar with the supporting structure are formed on the first semiconductor layer. A memory stack is formed above the supporting structure and the second semiconductor layer. The memory stack has a staircase region overlapping the supporting structure. A channel structure extending vertically through the memory stack and the second semiconductor layer into the first semiconductor layer is formed. The first substrate and the second substrate are bonded in a face-to-face manner.

Abstract: A chip package assembly and method of fabricating the same are described herein. The chip package assembly generally includes at least one integrated circuit (IC) die that has had the original solder interconnects at least partially replaced to enhance the reliability of a redistribution layer disposed between the IC die and the substrate. In the resulting chip package assembly, at least one IC die includes first and second pillars extending from exposed contact pads through a first mold compound. The second pillars are fabricated from a material that has a composition different than that of the first pillars. A redistribution layer is formed on the first and second pillars. The solder interconnects mechanically couple the redistribution layer to landing pads of a substrate. The solder interconnects also electrically couple circuitry of the substrate to the circuitry of the IC die through the redistribution layer and first and second pillars.

Abstract: A semiconductor device with a large storage capacity per unit area can be provided. A memory cell including a first transistor, a second transistor, a third transistor, a fourth transistor, a first capacitor, and a second capacitor includes a stack including a first conductor, a first insulator over the first conductor, a second conductor over the first insulator, a second insulator over the second conductor, and a third conductor over the second insulator; a first oxide arranged in a ring-like shape on a side surface of an opening portion of the second conductor; a fourth conductor arranged in a ring-like shape in contact with an inner wall of the first oxide; a cylindrical third insulator arranged to penetrate the stack, the first oxide, and the fourth conductor; and a second oxide arranged in contact with an inner wall of the third insulator.

Abstract: A semiconductor device according to the present embodiment includes a first chip and a second chip. A first pad is disposed so as to be exposed from a first region on a first surface. A first mark is provided by a first pattern and is disposed so as to be exposed from a second region. The second chip includes a second substrate, a second wire, a second pad, and a second mark. The second wire is disposed on the second substrate. The second pad is disposed so as to be exposed from a third region on a second surface, and is electrically connected to the second wire and the first pad. The second mark is provided by a second pattern corresponding to the first pattern, is disposed so as to be exposed from a fourth region, and has a thinner thickness than the second pad.

Abstract: An electroluminescence display device comprising a through-hole in a display area is discussed. The electroluminescence display device according to one embodiment of the present disclosure comprises a substrate having a display area and a non-display area arranged near the display area; a light emitting diode in the display area; an encapsulation layer on the light emitting diode; a through-hole arranged inside the display area to penetrate the substrate; an inner dam surrounding the through-hole; a trench arranged between the inner dam and the through-hole; and an etch-stopper arranged between the trench and the through-hole on the an insulating layer.

Abstract: A semiconductor structure and the manufacturing method thereof are provided. A semiconductor structure includes a first semiconductor die, a second semiconductor die, an insulating layer, and a first dual-damascene connector electrically connected to the first semiconductor die. The first semiconductor die includes a first bonding surface including a die attaching region and a peripheral region connected to the die attaching region. The second semiconductor die is electrically connected to the first semiconductor die, and a second bonding surface of the second semiconductor die is bonded to the first bonding surface in the die attaching region. The insulating layer disposed on the first bonding surface in the peripheral region extends along sidewalls of the second semiconductor die. The first dual-damascene connector includes a first portion disposed on the insulating layer, and a second portion penetrating through the insulating layer and landing on the first bonding surface in the peripheral region.

Abstract: Disclosed herein is a method for making an apparatus suitable for detecting X-ray, the method comprising: obtaining a wafer and a substrate; wherein the substrate comprises an X-ray absorption layer comprising a first plurality of electrical contacts; wherein the wafer has multiple dies and comprises an electronic layer comprising a second plurality of electrical contacts and an electronic system configured to process or interpret signals generated by X-ray photons incident on the X-ray absorption layer; aligning the first plurality of electrical contacts to the second plurality of electrical contacts; mounting the wafer to the substrate such that the first plurality of electrical contacts are electrically connected to the second plurality of electrical contacts; wherein the substrate further comprises a transmission line electrically bridging at least some of the dies; wherein the second plurality of electrical contacts are configured to feed the signals to the electronic system.

Abstract: A non-volatile memory device includes a first semiconductor layer having a stair area and a cell area having a memory cell array formed therein, and a second semiconductor layer including a page buffer connected to the memory cell array. The first semiconductor layer includes a plurality of word lines, a ground selection line in a layer on the word lines, a common source line in a layer on the ground selection line, a plurality of vertical pass transistors in the stair area, and a plurality of driving signal lines in the same layer as the common source line. The word lines form a stair shape in the stair area, and each of the vertical pass transistors is connected between a corresponding one of the word lines and a corresponding one of the driving signal lines.

Abstract: A semiconductor device having favorable characteristics is provided. A semiconductor device having stable electrical characteristics is provided. An island-shaped insulating layer containing an oxide is provided in contact with a bottom surface of a semiconductor layer containing a metal oxide that exhibits semiconductor characteristics. The insulating layer containing an oxide is provided in contact with a portion of the semiconductor layer to be a channel formation region and is not provided under portions to be low-resistance regions.

Abstract: An electroluminescence display device comprising a through-hole in a display area is discussed. The electroluminescence display device according to one embodiment of the present disclosure comprises a substrate having a display area and a non-display area arranged near the display area; a light emitting diode in the display area; an encapsulation layer on the light emitting diode; a through-hole arranged inside the display area to penetrate the substrate; an inner dam surrounding the through-hole; a trench arranged between the inner dam and the through-hole; and an etch-stopper arranged between the trench and the through-hole on the an insulating layer.