Abstract: Semiconductor die stacks, and associated methods and systems are disclosed. The semiconductor die stack may include a first die with a memory array and a second die with CMOS circuitry configured to access the memory array. The first die may not have circuitry for accessing the memory array. Further, the first and second dies may be bonded to function as a single memory device, and front surfaces of the first and second dies are conjoined to form electrical connections therebetween. The second die may include a portion uncovered by the first die, where bond pads of the semiconductor die stack are located. The first die may provide a space for bond wires to connect to the bond pads without interfering with another die attached above the semiconductor die stack. Multiple semiconductor die stacks may be stacked on top of and in line with each other.

Abstract: Apparatuses and methods for sense line architectures for semiconductor memories are disclosed. An example apparatus includes a first array region including first portions of a plurality of sense lines and memory cells coupled to the first portions of the plurality of sense lines and further includes a second array region including second portions of the plurality of sense lines and memory cells coupled to the second portions of the plurality of sense lines. An array gap is disposed between the first and second array regions and includes third portions of the plurality of sense lines and does not include any memory cells. Each third portion of the plurality of sense lines includes conductive structures having vertical components configured to couple the first portions and second portions of the plurality of sense lines to provide an electrically continuous sense lines through the first and second array regions and the array gap.

Abstract: Provided is a substrate structure, including a substrate having at least one chamfer formed on a surface thereof, and a plurality of conductive bodies formed to the substrate. Therefore, a stress generated during the packaging process is alleviated through the chamfer, and the substrate structure is prevented from being cracked. An electronic package employing the substrate structure is also provided.

Abstract: In one embodiment, a semiconductor device includes a substrate, a plurality of transistors provided on the substrate. The device further includes a first interconnect layer provided above the transistors and electrically connected to at least one of the transistors, one or more first plugs provided on the first interconnect layer, and a first pad provided on the first plugs. The device further includes a second pad provided on the first pad, one or more second plugs provided on the second pad, and a second interconnect layer provided on the second plugs. The device further includes a memory cell array provided above the second interconnect layer and electrically connected to the second interconnect layer. A number of the second plugs on the second pad is larger than a number of the first plugs under the first pad.

Abstract: A process for fabricating a heterostructure made of semiconductor materials having a crystalline structure of wurtzite type, includes the following steps: structuring a surface of a zinc oxide monocrystalline substrate into mesas; depositing by epitaxy at least one layer of semiconductor materials having a crystalline structure of wurtzite type, forming the heterostructure, on top of the structured surface. Heterostructure obtained by such a process. A process for fabricating at least one electronic or optoelectronic device from such a heterostructure is also provided.

Abstract: A semiconductor memory device includes a substrate having a second region extending in a first direction; a memory block including electrodes; a slit dividing the memory block into first and second electrode structures in the second region; and step-shaped grooves formed in the memory block in the second region, and divided by the slit. In the second region, the first and second electrode structures are adjacently disposed with the slit interposed therebetween, in a second direction intersecting with the first direction. Each of the electrodes of the first electrode structure has a first pad region, each of the electrodes of the second electrode structure has a second pad region, and first and second pad regions of the first and second electrode structures which are positioned in the same step-shaped groove and are disposed at the same layers are adjacently disposed in the second direction with the slit interposed therebetween.

Abstract: Embodiments of structure and methods for forming a three-dimensional (3D) memory device are provided. In an example, a 3D memory device includes a memory stack, a plurality of channel structures, a slit structure, and a source structure. The memory stack may be over a substrate and may include interleaved a plurality of conductor layers and a plurality of insulating layers extending laterally in the memory stack. The plurality of channel structures may extend vertically through the memory stack into the substrate. The slit structure may extend vertically and laterally in the memory stack and divide the plurality of memory cells into at least one memory block. The slit structure may include a plurality of protruding portions and a plurality of recessed portions arranged vertically along a sidewall of the slit structure.

Abstract: Provided are a semiconductor device using, for example, an epoxy molding compound (EMC) wafer support system and a fabricating method thereof, which can, for example, adjust a thickness of the overall package in a final stage of completing the device while shortening a fabricating process and considerably reducing the fabrication cost. An example semiconductor device may comprise a first semiconductor die that comprises a bond pad and a through silicon via (TSV) connected to the bond pad; an interposer comprising a redistribution layer connected to the bond pad or the TSV and formed on the first semiconductor die, a second semiconductor die connected to the redistribution layer of the interposer and positioned on the interposer; an encapsulation unit encapsulating the second semiconductor die, and a solder ball connected to the bond pad or the TSV of the first semiconductor die.

Abstract: A semiconductor structure and a method for forming same are provided, the method including: providing a base including a substrate and a fin protruding from the substrate, the substrate including a P-type logic region and a pull up transistor region; forming a gate layer across the fin; forming a mask spacer covering a side wall of a fin in the pull up transistor region and a side wall of a portion of a fin in the P-type logic region; removing a portion of thicknesses of the fins on both sides of the gate layer using the mask spacer as a mask, to form a groove enclosed by the fin and the mask spacer in the P-type logic region and a straight slot penetrating the fin and the mask spacer in the pull up transistor region along a direction perpendicular to the side wall of the fin; and forming a P-type source/drain doped layer in the groove and the straight slot.

Abstract: A composite semiconductor substrate includes a semiconductor substrate, an oxygen-doped crystalline semiconductor layer and an insulative layer. The oxygen-doped crystalline semiconductor layer is over the semiconductor substrate, and the oxygen-doped crystalline semiconductor layer includes a crystalline semiconductor material and a plurality of oxygen dopants. The insulative layer is over the oxygen-doped crystalline semiconductor layer.

Abstract: Semiconductor device structures are provided. The semiconductor device structure includes a number of first semiconductor wires over a semiconductor substrate, and the first semiconductor wires are vertically spaced apart from each other. The semiconductor device structure includes a first gate stack partially wrapping the first semiconductor wires, and a spacer element adjacent to the first gate stack. Each of the first semiconductor wires has a first portion directly below the spacer element and a second portion directly below the first gate stack, the first portion has a first width, the second portion has a second width, and the first width is greater than the second width.

Abstract: A semiconductor package includes a first semiconductor chip, a second semiconductor chip on the first semiconductor chip, a first semiconductor structure and a second semiconductor structure that are on the first semiconductor chip and spaced apart from each other across the second semiconductor chip, and a resin-containing member between the second semiconductor chip and the first semiconductor structure and between the second semiconductor chip and the second semiconductor structure. The semiconductor package may be fabricated at a wafer level.

Abstract: A method of forming a FinFET device includes following steps. A substrate is provided with a plurality of fins thereon, an isolation layer thereon covering lower portions of the fins, a plurality of dummy strips across the fins, and a dielectric layer aside the dummy strips. The dummy strips is cut to form a trench in the dielectric layer. A first insulating structure is formed in the trench, wherein first and second groups of the dummy strips are beside the first insulating structure. A dummy strip is removed from the first group of the dummy strips to form a first opening that exposes portions of the fins under the dummy strip. The portions of the fins are removed to form a plurality of second openings below the first opening, wherein each second opening has a middle-wide profile. A second insulating structure is formed in the first and second openings.

Abstract: A semiconductor device includes a semiconductive substrate, a first semiconductive fin and a second semiconductive fin extending upwards from the semiconductive substrate, an isolation structure at least partially between the first semiconductive fin and the second semiconductive fin, a first semiconductive raised portion and a second semiconductive raised portion. The first semiconductive raised portion extends upwards from the semiconductive substrate, is buried under the isolation structure, and is between the first semiconductive fin and the second semiconductive fin. A top surface of the first semiconductive fin is higher than a top surface of the first semiconductive raised portion. The second semiconductive raised portion extends upwards from the semiconductive substrate, is buried under the isolation structure, and is between the first semiconductive raised portion and the second semiconductive fin.

Abstract: A semiconductor structure and a method for forming a semiconductor structure are disclosed. A forming method may include: providing a base, including a first region used to form a well region and a second region used to form a drift region, where the first region is adjacent to the second region; and patterning the base, to form a substrate and fins protruding out of the substrate, where the fins include first fins located at a junction of the first region and the second region and second fins located on the second region, where the quantity of the second fins is greater than the quantity of the first fins. In some implementations of the present disclosure, the quantity of the second fins is increased to correspondingly increase the length of a flow path in which a current flows from a drain region to a source region, thereby reducing a voltage drop in the current flow path, and further improving a breakdown voltage of an LDMOS, to improve the device performance of the LDMOS.

Abstract: A method for manufacturing a semiconductor device includes following operations. A substrate including an active area is received. A plurality of source/drain regions of a plurality of transistor devices are formed in the active area. An isolation region is inserted between two adjacent source/drain regions of two adjacent transistor devices. The isolation region and the two adjacent source/drain regions cooperatively form two diode devices electrically connected in a back to back manner.

Abstract: Package-on-package systems for packaging semiconductor devices. In one embodiment, a package-on-package system comprises a first semiconductor package device and a second semiconductor package device. The first package device includes a base substrate including a first side having a die-attach region and a peripheral region, a first semiconductor die attached to the base substrate at the die-attach region, wherein the first semiconductor die has a front side facing the first side of the base substrate and a backside spaced apart from the first side of the base substrate by a first distance, and a high density interconnect array in the perimeter region of the base substrate outside of the die-attach region. The interconnect array has a plurality of interconnects that extend from the first side of the base substrate by a second distance greater than the first distance. The second semiconductor device package is electrically coupled corresponding individual interconnects.

Abstract: A semiconductor light emitting device (100;200;300;400,400B,400C;500;600;700) may have a reflective side coating (120;220;320;420;520;620;720) disposed on a sidewall (118;215;315;415,435;515) of a semiconductor light emitting device structure. Such a device may be fabricated by dicing a semiconductor structure to separate a semiconductor light emitting device structure and then forming a reflective side coating (120;220;320;420;520;620;720) on a sidewall (118;215;315;415,435;515) of the separated semiconductor light emitting device structure.

Abstract: Semiconductor devices and methods of forming are provided. In some embodiments the semiconductor device includes a substrate, and a dielectric layer over the substrate. A first conductive feature is included in the dielectric layer, the first conductive feature comprising a first number of material layers. A second conductive feature is included in the dielectric layer, the second conductive feature comprising a second number of material layers, where the second number is higher than the first number. A first electrical connector is included overlying the first conductive feature.

Abstract: Spin-Hall (SH) material is provided near free regions of magnetoresistive devices that include magnetic tunnel junctions. Current flowing through such SH material injects spin current into the free regions such that spin torque is applied to the free regions. The spin torque generated from SH material can be used to switch the free region or to act as an assist to spin-transfer torque generated by current flowing vertically through the magnetic tunnel junction, in order to improve the reliability, endurance, or both of the magnetoresistive device. Further, one or more additional regions or manufacturing steps may improve the switching efficiency and the thermal stability of magnetoresistive devices.