Patents Examined by Won H. Louie, Jr.
  • Patent number: 4396712
    Abstract: A novel dry image forming material comprising in one or more layers on a support (a) a non-photosensitive organic silver salt oxidizing agent, (b) a reducing agent for silver ions, (c) a silver halide component or a silver halide-forming component, (d) a toning agent and (e) a lipophilic binder, characterized by the inclusion of a specific 2-(2'-hydroxyphenyl)benzotriazole compound having bulky tert-butyl or tert-amyl groups at its ortho- and para-positions relative to the hydroxyl group in a layer containing the component (a). The dry image forming material of the present invention has high storage stability prior to use for image formation.
    Type: Grant
    Filed: May 29, 1981
    Date of Patent: August 2, 1983
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Shozo Kinoshita, Muneaki Kimura, Tetsuo Shiga
  • Patent number: 4396707
    Abstract: New triazoles of the formula ##STR1## are suitable stabilizing agents in photographic materials.
    Type: Grant
    Filed: August 24, 1981
    Date of Patent: August 2, 1983
    Assignee: Agfa-Gevaert Aktiengesellschaft
    Inventors: Anita von Konig, Werner Liebe, Wilhelm Saleck
  • Patent number: 4396711
    Abstract: Derivatives of thiazolidine are used in photographic silver halide emulsions to increase their speed 40% or more with little or no increase in emulsion fog. Lower silver halide coating weights are thus possible.
    Type: Grant
    Filed: March 29, 1982
    Date of Patent: August 2, 1983
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Joseph D. Overman
  • Patent number: 4395481
    Abstract: The invention relates to a method for the manufacture of positive resist structures by means of short-wave UV rays and has the objective to develop such a method in a manner such that increased sensitivity and resolution as well as high thermal stability and, in addition, transparency in the wave-length range above 260 nm can be achieved. According to the invention, it is provided for this purpose to use as the resist material copolymers of 1 to 70 mol % alkylmethacrylate with an alkyl radical having 1 to 4 C atoms, and 99 to 30 mol % of an ethylenically unsaturated monomer with chlorine and/or cyan substituents. The method according to the invention is particularly well suited for producing resist structures about 0.5 to 2 .mu.m thick by means of UV rays in the wave-length range between about 180 to 260 nm.
    Type: Grant
    Filed: September 25, 1981
    Date of Patent: July 26, 1983
    Assignee: Siemens Aktiengesellschaft
    Inventors: Siegfried Birkle, Roland Rubner, Hans Hauschildt, Eva-Maria Rissel
  • Patent number: 4395483
    Abstract: A high contrast, chemically fogged direct positive type silver halide photosensitive material is described containing at least one ammine complex salt selected from those including cobalt, nickel, ruthenium or chromium, by which the contrast in the lower optical density region is improved while retaining superior Dmax and sensitivity.
    Type: Grant
    Filed: February 26, 1982
    Date of Patent: July 26, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Terumi Matsuda, Shoji Ishiguro, Shigenori Moriuchi, Yoshiaki Suzuki
  • Patent number: 4395478
    Abstract: A radiation-sensitive emulsion for use in forming a direct-positive image is disclosed. The emulsion is comprised of core-shell silver halide grains. The shell portions of the grains contain polyvalent metal ions to reduce rereversal.
    Type: Grant
    Filed: November 12, 1981
    Date of Patent: July 26, 1983
    Assignee: Eastman Kodak Company
    Inventor: Harry A. Hoyen
  • Patent number: 4394439
    Abstract: Permanent records of X rays or radiations of shorter wavelengths are formed on a film substrate by direct exposure to the radiation and heat development. The process is not sensitive to visible radiation and can therefore be carried on in daylight. An X ray photosensitive film containing a halogenated photodegradable polymer and an aryl dye promoter reacting to free radicals is exposed to an X ray image and then heated under conditions which allow the free radical generated by the photodegradation of the polymer to migrate and react with the aryl dye promoter to provide the imaging dye. The X ray photosensitive layer of the X ray photosensitive film or paper includes, in addition to the photodegradable polymer and the aryl dye promoter, a heat activable complexing agent and an organic binder. The process can be carried out using currently available X ray equipment with the advantage of handling the film in daylight and eliminating chemical development.
    Type: Grant
    Filed: May 28, 1981
    Date of Patent: July 19, 1983
    Inventor: Jean J. Robillard
  • Patent number: 4394435
    Abstract: A photopolymer elastomeric article designed to be used primarily in a flexographic printing system comprising: a polymer matrix made up of a mixture of syndiotactic 1,2-polybutadiene and cis-1,4-polyisoprene; a photoinitiator, which is a compound, which when irradiated, will initiate polymerization and/or crosslinking; and optionally, 0-3 phr of photopolymerizable, ethylenically unsaturated crosslinking agent, as typified by esters of acrylic or methacrylic acid.
    Type: Grant
    Filed: October 1, 1981
    Date of Patent: July 19, 1983
    Assignee: Uniroyal, Inc.
    Inventors: Milton Farber, John R. Worns
  • Patent number: 4393128
    Abstract: The formation of spots when making a printing plate using a presensitized printing plate comprising a silver halide light-sensitive layer formed on an aluminum support having an aluminum oxide film on the surface directly or over a non-silver light-sensitive intermediate layer is effectively prevented by incorporating a mercapto compound in one of the layers.
    Type: Grant
    Filed: September 4, 1981
    Date of Patent: July 12, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keisuke Shiba, Sho Nakao, Tadao Toyama
  • Patent number: 4391901
    Abstract: The photosensitivity of lead lanthanum zirconate titanate (PLZT) ceramic material used in high resolution, high contrast, and non-volatile photoferroelectric image storage and display devices is enhanced significantly by positive ion implantation of the PLZT near its surface. Implanted ions include H.sup.+, He.sup.+, Ne.sup.+, Ar.sup.+, as well as chemically reactive ions from Fe, Cr, and Al. The positive ion implantation advantageously serves to shift the absorption characteristics of the PLZT material from near-UV light to visible light. As a result, photosensitivity enhancement is such that the positive ion implanted PLZT plate is sensitive even to sunlight and conventional room lighting, such as fluorescent and incandescent light sources. The method disclosed includes exposing the PLZT plate to the positive ions at sufficient density, from 1.times.10.sup.12 to 1.times.10.sup.17, and with sufficient energy, from 100 to 500 KeV, to provide photosensitivity enhancement.
    Type: Grant
    Filed: January 28, 1982
    Date of Patent: July 5, 1983
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Cecil E. Land, Paul S. Peercy
  • Patent number: 4390616
    Abstract: Recording members having excellent light resistance are obtained by using as a dye precursor specific diarylaminofluoran compounds.
    Type: Grant
    Filed: December 1, 1980
    Date of Patent: June 28, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kozo Sato, Ken Iwakura, Akira Igarashi
  • Patent number: 4389482
    Abstract: A photoresist that has strong resistance to reactive ion etching, high photosensitivity to mid- and deep UV-light, and high resolution capability is formed by using as the resist material a copolymer of methacrylonitrile and methacrylic acid, and by baking the resist before the exposure to light for improved photosensitivity, and after exposure to light, development, and prior to treatment with reactive ion etching.
    Type: Grant
    Filed: December 14, 1981
    Date of Patent: June 21, 1983
    Assignee: International Business Machines Corporation
    Inventors: Joachim Bargon, Hiroyuki Hiraoka, Lawrence W. Welsh, Jr.
  • Patent number: 4388399
    Abstract: A light-sensitive image-forming material which comprises a support having provided thereon a first layer comprising at least one alcohol-soluble polyamide resin and, on said first layer, a second layer comprising a light-sensitive photoresist composition, said layer containing said alcohol-soluble polyamide resin containing one or more polymers having one or more of a free carboxy group(s), one or more of a phenolic hydroxy group(s) or a maleic anhydride group in a proportion of about 0.1:9.9 to 6:4 by weight to said polyamide resin.
    Type: Grant
    Filed: February 10, 1982
    Date of Patent: June 14, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomizo Namiki, Tomoaki Ikeda
  • Patent number: 4388351
    Abstract: A printed circuit board is formed by forming a negative resist pattern over the surface of a substrate, etching the surface, sensitizing and catalyzing the surface, stripping the negative mask and catalytic layer thereover leaving a positive catalytic circuit pattern on the substrate and electrolessly plating copper over the catalytic image. A preferred variation of this method includes flash plating a thin porous electroless deposit over the catalyzed substrate prior to stripping the resist layer.
    Type: Grant
    Filed: December 15, 1981
    Date of Patent: June 14, 1983
    Assignee: Western Electric Company, Inc.
    Inventor: Ernest W. Sawyer
  • Patent number: 4388387
    Abstract: A process for forming color images which comprises providing a light absorbing dye layer or a dye containing layer on a base, at least the surface of which is composed of a transparent dye accepting polymer through which dyes are capable of thermally diffusing, imagewise exposing the dye layer or the dye containing layer to light having a high energy density such that a dye image is formed in the dye accepting polymer in the exposed area by thermal diffusion of the dye, and thereafter removing the dye or the dye containing layer in the unexposed areas.
    Type: Grant
    Filed: March 26, 1980
    Date of Patent: June 14, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masayoshi Tsuboi
  • Patent number: 4386116
    Abstract: A process is provided for making a multilayer integrated circuit substrate having improved via connection. A first layer M1 of chrome-copper-chrome is applied to a ceramic substrate and the circuits etched. A polyimide layer is then applied, cured, and developed and etched to provide via holes in the polyimide down to the M1 circuitry. The top chrome is now etched to expose the M1 copper in the via holes. A second layer M2 of copper-chrome is evaporated onto the polyimide at a high substrate temperature to provide a copper interface at the base of the vias having no visable grain boundaries and a low resistance. M2 circuitization is then carried out.
    Type: Grant
    Filed: December 24, 1981
    Date of Patent: May 31, 1983
    Assignee: International Business Machines Corporation
    Inventors: Krishna K. Nair, Keith A. Snyder
  • Patent number: 4386154
    Abstract: A thermally developable imaging system comprises a leuco dye, nitrate ion, and a spectrally sensitized compound selected from (1) aromatic iodonium salts and (2) compounds of photolyzable halogen atoms.
    Type: Grant
    Filed: March 26, 1981
    Date of Patent: May 31, 1983
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: George H. Smith, Peter M. Olofson
  • Patent number: 4383029
    Abstract: Disclosed in this invention is a recording medium characterized by forming on the support a recording layer containing a metastable sensitive substance which is an intermediate product of a reaction between a first colorless or light-colored material containing the S atoms released by light irradiation and a second colorless or light-colored material which develops color as it is sulfurized by said S atoms.
    Type: Grant
    Filed: May 27, 1982
    Date of Patent: May 10, 1983
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Noboru Yamada, Mutsuo Takenaga, Kenichi Nishiuchi
  • Patent number: 4383030
    Abstract: The sensitivity of a gelatino-silver halide emulsion is improved by adding glutaraldehyde bisulfite in combination with benzene sulfinic acid during the preparation of the silver halide, viz. when a silver salt is mixed with a halide to precipitate a silver halide.
    Type: Grant
    Filed: April 27, 1981
    Date of Patent: May 10, 1983
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Allan R. Schoenberg
  • Patent number: 4379837
    Abstract: Silver halide emulsions are prepared by precipitating a silver halide emulsion I on a more sparingly soluble silver halide emulsion II in the presence of a silver halide solvent wherein the emulsion I has been prepared in the presence of a compound inhibiting grain growth.
    Type: Grant
    Filed: May 20, 1981
    Date of Patent: April 12, 1983
    Assignee: Agfa-Gevaert Aktiengesellschaft
    Inventors: Otto Lapp, Harald von Rintelen, Franz Moll, Lothar Endres