Patents by Inventor Arne W. Ballantine

Arne W. Ballantine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7026065
    Abstract: The invention provides a fuel cell incorporating a thermal management scheme and associated methods of operation. In one aspect, a fuel cell system includes a frame enclosing a fuel cell, a coolant flow circuit and a heat exchanger. The frame has at least one external panel mounted thereon to enclose the fuel cell, a coolant circuit and heat exchanger. The coolant flow circuit is adapted to circulate a coolant through the heat exchanger and across a surface of the fuel cell to provide heat transfer between the fuel cell and the heat exchanger. An inlet orifice and an outlet orifice are coupled to the frame and to the heat exchanger, and are adapted to provide an export flow circuit from the inlet orifice through the heat exchanger to the outlet orifice. An insulating material is fixed to a surface of the external panel.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: April 11, 2006
    Assignee: Plug Power Inc.
    Inventors: Arne W. Ballantine, Ryan Hallum
  • Patent number: 7011903
    Abstract: Fuel cell systems and associated methods of operation are provided whereby application of a fuel cell is coordinated with a fuel processor and a hydrogen separator.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: March 14, 2006
    Assignee: Plug Power Inc.
    Inventors: Glen E. Benson, Arne W. Ballantine, John W. Parks, Wieslaw J. Zielinski, Eric T. White, Robert A. Sinuc
  • Patent number: 7008852
    Abstract: A process for forming at least one interface region between two regions of semiconductor material. At least one region of dielectric material comprising nitrogen is formed in the vicinity of at least a portion of a boundary between the two regions of semiconductor material, thereby controlling electrical resistance at the interface.
    Type: Grant
    Filed: December 2, 2004
    Date of Patent: March 7, 2006
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Douglas D. Coolbaugh, Jeffrey Gilbert, Joseph R. Greco, Glenn R. Miller
  • Patent number: 6984593
    Abstract: A method of forming semiconductor device treating a surface of a substrate to produce a discontinuous growth of a material on the surface through rapid thermal oxidation of the substrate surface at a temperature of less than about 700° C.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: January 10, 2006
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Douglas D. Coolbaugh, Steve S. Williams
  • Patent number: 6979506
    Abstract: The invention provides a reactant delivery system for a dead-headed PEM fuel cell system, comprising a fuel cell, a fuel supply, a purge valve, an inlet orifice, an outlet orifice, and a controller. A first fuel flow circuit is provided, wherein fuel is flowed from the fuel supply to the inlet orifice, through the fuel cell from the inlet orifice, and through the outlet orifice from the fuel cell to the purge valve. A second fuel flow circuit is also provided, wherein fuel is flowed from the fuel supply to the outlet orifice, through the fuel cell from the outlet orifice, and through the inlet orifice from the fuel cell to the purge valve. A valve means is coupled to the controller and adapted to transfer fuel flow between the first flow circuit and the second flow circuit.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: December 27, 2005
    Assignee: Plug Power Inc.
    Inventors: Arne W. Ballantine, Scott K. Lobdell, Sean S. Lyons
  • Patent number: 6958506
    Abstract: Methods of forming front-end-of the line (FEOL) capacitors such as polysilicon-polysilicon capacitors and metal-insulator-silicon capacitors are provided that are capable of incorporating a high-dielectric constant (k of greater than about 8) into the capacitor structure. The inventive methods provide high capacitance/area devices with low series resistance of the top and bottom electrodes for high frequency responses. The inventive methods provide a significant reduction in chip size, especially in analog and mixed-signal applications where large areas of capacitance are used.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: October 25, 2005
    Assignee: International Business Machines Corporation
    Inventors: Evgeni P. Gousev, Harald F. Okorn-Schmidt, Arne W. Ballantine, Douglas A. Buchanan, Eduard A. Cartier, Douglas D. Coolbaugh
  • Patent number: 6939771
    Abstract: A process for forming at least one interface region between two regions of semiconductor material. At least one region of dielectric material comprising nitrogen is formed in the vicinity of at least a portion of a boundary between the two regions of semiconductor material, thereby controlling electrical resistance at the interface.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: September 6, 2005
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Douglas D. Coolbaugh, Jeffrey Gilbert, Joseph R. Greco, Glenn R. Miller
  • Patent number: 6939635
    Abstract: A cogeneration fuel cell system and associated methods of operation are provided that accommodate a demand for heat as well as a demand for electric power. The system is operated among various modes to balance heat and power demand signals. In general, a fuel cell system is coupled to a power sink and a heat sink, and a controller is adapted to respond to data signals from the power sink and the heat sink. As examples, such data signals from the heat sink may include a temperature indication or a heat demand signal (such as from a thermostat), and such data signals from the power sink may include a voltage or current measurement, an electrical power demand signal, or an electrical load.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: September 6, 2005
    Assignee: Plug Power Inc.
    Inventors: Arne W. Ballantine, Ryan Hallum, John W. Parks, Dustan L. Skidmore
  • Patent number: 6893948
    Abstract: Polysilicon electrical depletion in a polysilicon gate electrode is reduced by depositing the polysilicon under controlled conditions so as to vary the crystal grain size through the thickness of the polysilicon. The resulting structure may have two or more depth-wise contiguous regions of respective crystalline grain size, and the selection of grain size is directed to maximize dopant activation in the polysilicon near the gate dielectric, and to tailor the resistance of the polysilicon above that first region and more distant from the gate dielectric. This method, and the resulting structure, are advantageously employed in forming FETs, and doped polysilicon resistors.
    Type: Grant
    Filed: July 11, 2003
    Date of Patent: May 17, 2005
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Kevin K. Chan, Jeffrey D. Gilbert, Kevin M. Houlihan, Glen L. Miles, James J. Quinlivan, Samuel C. Ramac, Michael B. Rice, Beth A. Ward
  • Patent number: 6862799
    Abstract: A method for changing an electrical resistance of a resistor. Initially, the resistor is provided, wherein the resistor has a length L and an electrical resistance R1. A portion of the resistor is exposed to a laser radiation, wherein the portion includes a fraction F of the length L of the resistor. After the resistor has been exposed to the laser radiation, the resistor has an electrical resistance R2, wherein R2 is unequal to R1.
    Type: Grant
    Filed: August 7, 2003
    Date of Patent: March 8, 2005
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Cyril Cabral, Jr., Daniel C. Edelstein, Anthony K. Stamper
  • Patent number: 6853032
    Abstract: A process of forming a nitride film on a semiconductor substrate including exposing a surface of the substrate to a rapid thermal process to form the nitride film.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: February 8, 2005
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Donna K. Johnson, Glen L. Miles
  • Patent number: 6835483
    Abstract: A cogeneration fuel cell system and associated methods of operation are provided that accommodate a demand for heat as well as a demand for electric power. The system is operated among various modes to balance heat and power demand signals. In general, a fuel cell system is coupled to a power sink and a heat sink, and a controller is adapted to respond to data signals from the power sink and the heat sink. As examples, such data signals from the heat sink may include a temperature indication or a heat demand signal (such as from a thermostat), and such data signals from the power sink may include a voltage or current measurement, an electrical power demand signal, or an electrical load.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: December 28, 2004
    Assignee: Plug Power, Inc.
    Inventors: Arne W. Ballantine, Ryan Hallum, John W. Parks, Dustan L. Skidmore
  • Patent number: 6821664
    Abstract: A method includes (1) operating a fuel processing reactor to convert a hydrocarbon into reformate; (2) flowing reformate through a first pressure regulator to reduce the pressure of the reformate; (3) supplying reformate from the first pressure regulator to a fuel cell to generate electrical power; (4) flowing a portion of the reformate from the fuel processor to a second pressure regulator to reduce the pressure of the reformate while generating the electrical power with the fuel cell; and (5) supplying reformate from the second pressure regulator to the hydrogen purification system while generating the electrical power with the fuel cell.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: November 23, 2004
    Assignee: Plug Power, Inc.
    Inventors: John W. Parks, Glen E. Benson, Wieslaw J. Zielinski, Arne W. Ballantine, Richard L. Chartrand
  • Patent number: 6822311
    Abstract: A method for forming a desired junction profile in a semiconductor device. At least one dopant is introduced into a semiconductor substrate. The at least one dopant is diffused in the semiconductor substrate through annealing the semiconductor substrate and the at least one dopant while simultaneously exposing the semiconductor substrate to an electric field.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: November 23, 2004
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, John J. Ellis-Monaghan, Toshihura Furukawa, Jeffrey D. Gilbert, Glenn R. Miller, James A. Slinkman
  • Patent number: 6797553
    Abstract: A shorter gate length FET for very large scale integrated circuit chips is achieved by providing a wafer with multiple threshold voltages. Multiple threshold voltages are developed by combining multiple work function gate materials. The gate materials are geometrically aligned in a predetermined pattern so that each gate material is adjacent to other gate materials. A patterned linear array embodiment is developed for a multiple threshold voltage design. The method of forming a multiple threshold voltage FET requires disposing different gate materials in aligned trenches within a semiconductor wafer, wherein each gate material represents a separate work function. The gate materials are arranged to be in close proximity to one another to accommodate small gate length designs.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: September 28, 2004
    Assignee: International Business Machines Corporation
    Inventors: James W Adkisson, Arne W. Ballantine, Ramachandra Divakaruni, Jeffrey B. Johnson, Erin C. Jones, Hon-Sum P. Wong
  • Publication number: 20040144750
    Abstract: In a process using a hot phosphoric acid etchant (12) to etch silicon nitride on a semiconductor wafer (15) submerged in a tank (11) of the etchant (12), a recirculating path is established for the etchant (12). A porous filter (35) is coated with silicon nitride and installed in the recirculating path. As the etchant (12) in the recirculating path flows through the porous filter (35), the silicon nitride on the porous filter (35) dissolves into the etchant (12). In the tank (11), the silicon nitride dissolved in the etchant (12) significantly suppresses the etch of silicon dioxide on the semiconductor wafer (15), thereby enhancing the etch selectivity of the process. Monitoring and maintaining the concentration of the silicon nitride in the etchant (12) stabilizes the etch selectivity of the process.
    Type: Application
    Filed: January 20, 2004
    Publication date: July 29, 2004
    Inventors: Arne W. Ballantine, Scott A. Estes, Emily E. Fisch, Gary Milo, Ronald A. Warren
  • Publication number: 20040140529
    Abstract: A method and structure for increasing an electrical resistance of a resistor that is within a semiconductor structure, by oxidizing or nitridizing a fraction of a surface layer of the resistor with oxygen/nitrogen (i.e., oxygen or nitrogen) particles, respectively. The semiconductor structure may include a semiconductor wafer, a semiconductor chip, and an integrated circuit. The method and structure comprises five embodiments. The first embodiment comprises heating an interior of a heating chamber that includes the oxygen/nitrogen particles as gaseous oxygen/nitrogen-comprising molecules (e.g., molecular oxygen/nitrogen). The second embodiment comprises heating the fraction of the surface layer by a beam of radiation (e.g., laser radiation), or a beam of particles, such that the semiconductor structure is within a chamber that includes the oxygen/particles as gaseous oxygen/nitrogen-comprising molecules (e.g., molecular oxygen/nitrogen).
    Type: Application
    Filed: January 8, 2004
    Publication date: July 22, 2004
    Inventors: Arne W. Ballantine, Daniel C. Edelstein, Anthony K. Stamper
  • Publication number: 20040135214
    Abstract: A process of forming a nitride film on a semiconductor substrate including exposing a surface of the substrate to a rapid thermal process to form the nitride film.
    Type: Application
    Filed: December 8, 2003
    Publication date: July 15, 2004
    Applicant: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Donna K. Johnson, Glen L. Miles
  • Patent number: 6759260
    Abstract: A method, and associated structure, for monitoring temperature and temperature distributions in a heating chamber for a temperature range of 200 to 600° C., wherein the heating chamber may be used in the fabrication of a semiconductor device. A copper layer is deposited over a surface of a semiconductor wafer. Next, the wafer is heated in an ambient oxygen atmosphere to a temperature in the range of 200-600° C. The heating of the wafer oxidizes a portion of the copper layer, which generates an oxide layer. After being heated, the wafer is removed and a sheet resistance is measured at points on the wafer surface. Since the local sheet resistance is a function of the local thickness of the oxide layer, a spatial distribution of sheet resistance over the wafer surface reflects a distribution of wafer temperature across the wafer surface during the heating of the wafer.
    Type: Grant
    Filed: April 23, 2003
    Date of Patent: July 6, 2004
    Assignee: International Business Machines Corporation
    Inventors: Arne W. Ballantine, Edward C. Cooney, III, Jeffrey D. Gilbert, Robert G. Miller, Amy L. Myrick, Ronald A. Warren
  • Patent number: 6740437
    Abstract: A cogeneration fuel cell system and associated methods of operation are provided that accommodate a demand for heat as well as a demand for electric power. The system is operated among various modes to balance heat and power demand signals. In general, a fuel cell system is coupled to a power sink and a heat sink, and a controller is adapted to respond to data signals from the power sink and the heat sink. As examples, such data signals from the heat sink may include a temperature indication or a heat demand signal (such as from a thermostat), and such data signals from the power sink may include a voltage or current measurement, an electrical power demand signal, or an electrical load.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: May 25, 2004
    Assignee: Plug Power Inc.
    Inventors: Arne W. Ballantine, Ryan Hallum, John W. Parks, Dustan L. Skidmore