Patents by Inventor Aurelie Humbert

Aurelie Humbert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112944
    Abstract: The present disclosure relates to a temporary wafer bonding process including the steps of: providing a wafer for back processing by laminating a plain protective film on a front surface of the wafer; providing a rigid carrier; bonding the rigid carrier to the plain protective film by the intermediate of a bonding material layer; processing a back surface of the wafer; and separating the rigid carrier and the plain protective film from the wafer.
    Type: Application
    Filed: September 26, 2023
    Publication date: April 4, 2024
    Inventors: Jakob Visker, Lan Peng, Serge Vanhaelemeersch, Aurelie Humbert, Chi Dang Thi Thuy, Evert Visker
  • Patent number: 11944965
    Abstract: A microfluidic device, a diagnostic device including the microfluidic device and a method for making the microfluidic device are provided. The microfluidic device includes: (i) a transparent substrate comprising a cavity, the cavity opening up to a top of the transparent substrate; (ii) a transparent layer covering the cavity, and (iii) a semiconductor substrate over the transparent layer and the transparent substrate, wherein the semiconductor substrate comprises a through hole overlaying the cavity and exposing the transparent layer.
    Type: Grant
    Filed: May 21, 2020
    Date of Patent: April 2, 2024
    Assignee: Imec vzw
    Inventors: Giuseppe Fiorentino, Simone Severi, Aurelie Humbert
  • Patent number: 11676851
    Abstract: According to an aspect of the present inventive concept there is provided a method for manufacturing a fluid sensor device comprising: bonding a silicon-on-insulator arrangement comprising a silicon wafer, a buried oxide, a silicon layer, and a first dielectric layer, to a CMOS arrangement comprising a metallization layer and a planarized dielectric layer, wherein the bonding is performed via the first dielectric layer and the planarized dielectric layer; forming a fin-FET arrangement in the silicon layer, wherein the fin-FET arrangement is configured to function as a fluid sensitive fin-FET arrangement; removing the buried oxide and the silicon wafer; forming a contact to the metallization layer and the fin-FET arrangement, wherein the contact comprises an interconnecting structure configured to interconnect the metallization layer and the fin-FET arrangement; forming a channel comprising an inlet and an outlet, wherein the channel is configured to allow a fluid comprising an analyte to contact the fin-FET a
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: June 13, 2023
    Assignee: IMEC VZW
    Inventors: Aurelie Humbert, Simone Severi
  • Publication number: 20210300752
    Abstract: A method for fabricating a microfluidic device includes providing an assembly that includes a first silicon substrate having a hydrophilic silicon oxide top surface that includes a microfluidic channel and a second silicon substrate having a hydrophilic silicon oxide bottom surface directly bonded on the top surface of the first silicon substrate, the second silicon substrate including fluidic access holes giving fluidic access to the microfluidic channel. The method also includes exposing the assembly to oxidative species including one or more oxygen atoms and to heat so as to form silicon oxide at a surface of the access holes and of the microfluidic channel.
    Type: Application
    Filed: March 16, 2021
    Publication date: September 30, 2021
    Inventors: Giuseppe Fiorentino, Aurelie Humbert, Simone Severi, Benjamin Jones
  • Publication number: 20200406255
    Abstract: A microfluidic device, a diagnostic device including the microfluidic device and a method for making the microfluidic device are provided. The microfluidic device includes: (i) a transparent substrate comprising a cavity, the cavity opening up to a top of the transparent substrate; (ii) a transparent layer covering the cavity, and (iii) a semiconductor substrate over the transparent layer and the transparent substrate, wherein the semiconductor substrate comprises a through hole overlaying the cavity and exposing the transparent layer.
    Type: Application
    Filed: May 21, 2020
    Publication date: December 31, 2020
    Inventors: Giuseppe Fiorentino, Simone Severi, Aurelie Humbert
  • Publication number: 20200350200
    Abstract: According to an aspect of the present inventive concept there is provided a method for manufacturing a fluid sensor device comprising: bonding a silicon-on-insulator arrangement comprising a silicon wafer, a buried oxide, a silicon layer, and a first dielectric layer, to a CMOS arrangement comprising a metallization layer and a planarized dielectric layer, wherein the bonding is performed via the first dielectric layer and the planarized dielectric layer; forming a fin-FET arrangement in the silicon layer, wherein the fin-FET arrangement is configured to function as a fluid sensitive fin-FET arrangement; removing the buried oxide and the silicon wafer; forming a contact to the metallization layer and the fin-FET arrangement, wherein the contact comprises an interconnecting structure configured to interconnect the metallization layer and the fin-FET arrangement; forming a channel comprising an inlet and an outlet, wherein the channel is configured to allow a fluid comprising an analyte to contact the fin-FET a
    Type: Application
    Filed: December 19, 2018
    Publication date: November 5, 2020
    Inventors: Aurelie HUMBERT, Simone SEVERI
  • Patent number: 10197520
    Abstract: Disclosed is an integrated circuit comprising a substrate (10) carrying a plurality of circuit elements; a metallization stack (12, 14, 16) interconnecting said circuit elements, said metallization stack comprising a patterned upper metallization layer comprising a first metal portion (20) and a second metal portion (21); a passivation stack (24, 26, 28) covering the metallization stack; a gas sensor including a sensing material portion (32, 74) on the passivation stack; a first conductive portion (38) extending through the passivation stack connecting a first region of the sensing material portion to the first metal portion; and a second conductive portion (40) extending through the passivation stack connecting a second region of the sensing material portion to the second metal portion. A method of manufacturing such an IC is also disclosed.
    Type: Grant
    Filed: July 24, 2012
    Date of Patent: February 5, 2019
    Assignee: ams International AG
    Inventors: Matthias Merz, Aurelie Humbert, Roel Daamen, David Tio Castro
  • Patent number: 9865647
    Abstract: An integrated circuit and a method of making the same. The integrated circuit includes a semiconductor substrate having a major surface. The integrated circuit also includes a thermal conductivity based gas sensor having an electrically resistive sensor element located on the major surface for exposure to a gas to be sensed. The integrated circuit further includes a barrier located on the major surface for inhibiting a flow of the gas across the sensor element.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: January 9, 2018
    Assignee: AMS INTERNATIONAL AG
    Inventors: Aurelie Humbert, Roel Daamen, Viet Nguyen Hoang
  • Patent number: 9818905
    Abstract: Disclosed is an integrated circuit comprising a substrate (10); and an optical CO2 sensor comprising: first and second light sensors (12, 12?) on said substrate, said second light sensor being spatially separated from the first light sensor; and a layer portion (14) including an organic compound comprising at least one amine or amidine functional group over the first light sensor; wherein said integrated circuit further comprises a signal processor (16) coupled to the first and second light sensor for determining a difference in the respective outputs of the first and second light sensor. An electronic device comprising such a sensor and a method of manufacturing such an IC are also disclosed.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: November 14, 2017
    Assignee: NXP B.V.
    Inventors: Aurelie Humbert, Roel Daamen, Youri Victorovitch Ponomarev
  • Patent number: 9683099
    Abstract: Disclosed is an integrated circuit (100) comprising a semiconductor substrate (110) carrying a plurality of circuit elements (111); and a carbon dioxide sensor (120) over said semiconductor substrate, said sensor comprising a pair of electrodes (122, 124) laterally separated from each other; and a carbon dioxide (CO2) permeable polymer matrix (128) at least partially covering the pair of electrodes, said matrix encapsulating a liquid (126) comprising an organic alcohol and an organic amidine or guanidine base. A composition for forming such a CO2 sensor on the IC and a method of manufacturing such an IC are also disclosed.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: June 20, 2017
    Assignee: AMS INTERNATIONAL AG
    Inventors: Rafael Sablong, Aurelie Humbert, Bjorn Tuerlings, Cornelis Bastiaansen, Dirk Gravesteijn, Dimitri Soccol, Jan Kolijn
  • Patent number: 9632049
    Abstract: Disclosed is an integrated circuit comprising an electrode arrangement for detecting the presence of a liquid, said electrode arrangement comprising a first electrode and a second electrode, wherein, prior to exposure of the electrode arrangement to said liquid, a surface of at least one of the first electrode and second electrode is at least partially covered by a compound that is soluble in the liquid; the electrical properties of the electrode arrangement being dependent on the amount of the compound covering said surface. An package and electronic device comprising such an IC and a method of manufacturing such an IC are also disclosed.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: April 25, 2017
    Assignee: AMS INTERNATIONAL AG
    Inventors: Matthias Merz, Roel Daamen, Aurelie Humbert, Youri Victorovitch Ponomarev
  • Patent number: 9546884
    Abstract: A sensor comprising a silicon substrate having a first and a second surface, integrated circuitry provided on the first surface of the silicon substrate, and a sensor structure provided on the second surface of the silicon substrate. The sensor structure and the integrated circuitry are electrically coupled to each other.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: January 17, 2017
    Assignee: NXP B.V.
    Inventors: Roel Daamen, Aurelie Humbert, Matthias Merz, Youri Victorovitch Ponomarev
  • Patent number: 9523651
    Abstract: An integrated circuit and a method of making the same. The integrated circuit includes a semiconductor substrate. The integrated circuit also includes an electrical impedance based gas sensor located on the substrate. The sensor includes first and second electrically conductive sensor electrodes. Each sensor electrode is enclosed in an electrically conductive corrosion protection material. The sensor also includes a gas sensitive material located between the sensor electrodes. The impedance of the gas sensitive material is sensitive to a gas to be sensed.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: December 20, 2016
    Assignee: AMS INTERNATIONAL AG
    Inventors: Aurelie Humbert, Roel Daamen
  • Patent number: 9453807
    Abstract: In one example, a thermal conductivity gas sensor is disclosed. The sensor includes a sensing element and an amplification material coupled to the sensing element. The amplification material has a target gas dependent thermal diffusivity. The sensing element measures the thermal diffusivity of the amplification material to determine a target gas concentration.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: September 27, 2016
    Assignee: AMS INTERNATIONAL AG
    Inventors: Aurelie Humbert, Dimitri Soccol, Roel Daamen, Annelies Falepin
  • Patent number: 9372166
    Abstract: An integrated circuit and a method of making the same. The integrated circuit includes a semiconductor substrate. The integrated circuit also includes a relative humidity sensor on the substrate. The relative humidity sensor includes a first sensor electrode, a second sensor electrode, and a humidity sensitive layer covering the first and second electrodes. The integrated circuit further includes a thermal conductivity based gas sensor on the substrate. The thermal conductivity based gas sensor has an electrically resistive sensor element located above the humidity sensitive layer.
    Type: Grant
    Filed: October 7, 2013
    Date of Patent: June 21, 2016
    Assignee: AMS INTERNATIONAL AG
    Inventors: Roel Daamen, Aurelie Humbert, Pascal Bancken
  • Publication number: 20160163766
    Abstract: An integrated circuit and a method of making the same. The integrated circuit includes a semiconductor substrate having a major surface. The integrated circuit also includes a thermal conductivity based gas sensor having an electrically resistive sensor element located on the major surface for exposure to a gas to be sensed. The integrated circuit further includes a barrier located on the major surface for inhibiting a flow of the gas across the sensor element.
    Type: Application
    Filed: February 11, 2016
    Publication date: June 9, 2016
    Inventors: Aurelie HUMBERT, Roel DAAMEN, Viet Hoang NGUYEN
  • Patent number: 9263500
    Abstract: An integrated circuit and a method of making the same. The integrated circuit includes a semiconductor substrate having a major surface. The integrated circuit also includes a thermal conductivity based gas sensor having an electrically resistive sensor element located on the major surface for exposure to a gas to be sensed. The integrated circuit further includes a barrier located on the major surface for inhibiting a flow of the gas across the sensor element.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: February 16, 2016
    Assignee: ams International AG
    Inventors: Aurelie Humbert, Roel Daamen, Viet Hoang Nguyen
  • Publication number: 20160043265
    Abstract: Disclosed is an integrated circuit comprising a substrate (10); and an optical CO2 sensor comprising: first and second light sensors (12, 12?) on said substrate, said second light sensor being spatially separated from the first light sensor; and a layer portion (14) including an organic compound comprising at least one amine or amidine functional group over the first light sensor; wherein said integrated circuit further comprises a signal processor (16) coupled to the first and second light sensor for determining a difference in the respective outputs of the first and second light sensor. An electronic device comprising such a sensor and a method of manufacturing such an IC are also disclosed.
    Type: Application
    Filed: October 14, 2015
    Publication date: February 11, 2016
    Inventors: Aurelie Humbert, Roel Daamen, Youri Victorovitch Ponomarev
  • Patent number: 9244031
    Abstract: A gas sensor on a semiconductor substrate. The gas sensor includes an elongate sensor element extending across an opening and has first and second opposed surfaces exposed for contact with a gas to be sensed. The first surface faces away from a major surface of the substrate. The second surface faces toward said major surface. The electrical conductivity of the elongate sensor element is sensitive to a composition and/or concentration of said gas to which the opposed first and second surfaces are exposable. The gas sensor further includes a support structure arranged to increase the mechanical robustness of the gas sensor by supporting the elongate sensor element in the opening.
    Type: Grant
    Filed: July 24, 2012
    Date of Patent: January 26, 2016
    Assignee: NXP, B.V.
    Inventors: Aurelie Humbert, David Tio Castro
  • Patent number: 9188540
    Abstract: Disclosed is an integrated circuit comprising a substrate (10); and an optical CO2 sensor comprising: first and second light sensors (12, 12?) on said substrate, said second light sensor being spatially separated from the first light sensor; and a layer portion (14) including an organic compound comprising at least one amine or amidine functional group over the first light sensor; wherein said integrated circuit further comprises a signal processor (16) coupled to the first and second light sensor for determining a difference in the respective outputs of the first and second light sensor. An electronic device comprising such a sensor and a method of manufacturing such an IC are also disclosed.
    Type: Grant
    Filed: January 3, 2014
    Date of Patent: November 17, 2015
    Assignee: NXP B.V.
    Inventors: Aurelie Humbert, Roel Daamen, Youri Victorovitch Ponomarev