Abstract: A system and method for integrated circuit fabrication is provided. A wafer holding system includes a wafer carrier that holds the wafer at a specified alignment, and a top ring disposed on a top surface of the wafer and of the wafer carrier. The top ring holds the wafer and the wafer carrier together as a single unit. The wafer carrier includes an alignment mechanism to hold the wafer in the specified alignment.

Abstract: A system and method for improved semiconductor die production is provided. A preferred embodiment provides a method for creating a stackable die, the method includes providing a first substrate, and forming through-silicon vias in the first substrate. The through-silicon vias extend from a first surface of the first substrate, wherein the through-silicon vias connect to a conductive layer on the first surface of the first substrate, and wherein the conductive layer has a planar surface. The conductive layer joins to a carrier substrate with an adhesive. The method continues by joining a second substrate to a second surface of the first substrate, removing the carrier substrate, removing the adhesive layer, and patterning the conductive layer to form contact pads.

Abstract: System and method for bonding semiconductor substrates is presented. A preferred embodiment comprises forming a buffer layer over a surface of a semiconductor substrate while retaining TSVs that protrude from the buffer layer in order to prevent potential voids that might form. A protective layer is formed on another semiconductor substrate that will be bonded to the first semiconductor substrate. The two substrates are aligned and bonded together, with the buffer layer preventing any short circuit contacts to the surface of the original semiconductor substrate.

Abstract: A method provides a first substrate with a conductive pad and disposes layers of Cu, TaN, and AlCu, respectively, forming a conductive stack on the conductive pad. The AlCu layer of the first substrate is bonded to a through substrate via (TSV) structure of a second substrate, wherein a conductive path is formed from the conductive pad of the first substrate to the TSV structure of the second substrate.