Patents by Inventor Boris Kobrin

Boris Kobrin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8192920
    Abstract: Embodiments of the invention relate to lithography method useful for patterning at sub-micron resolution. This method comprised of deposition and patterning self-assembled monolayer resists using rolling applicator and rolling mask exposure apparatus. Typically the application of these self-assembled monolayers involves contacting substrate materials with a rotatable applicator in the shape of cylinder or cone wetted with precursor materials. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact with self-assembled monolayer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating mask surface comprises metal nano holes or nanoparticles.
    Type: Grant
    Filed: April 24, 2009
    Date of Patent: June 5, 2012
    Assignee: Rolith Inc.
    Inventor: Boris Kobrin
  • Patent number: 8182982
    Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of rotationally symmetric disk materials, like magnetic and optical disks, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cone. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the disk is in contact or close proximity with the disk. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cone surface comprises metal nano holes or nanoparticles.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: May 22, 2012
    Assignee: Rolith Inc
    Inventor: Boris Kobrin
  • Patent number: 8178162
    Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of films/coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: May 15, 2012
    Assignee: Applied Microstructures, Inc.
    Inventors: Boris Kobrin, Romuald Nowak, Richard C. Yi, Jeffrey D. Chinn
  • Publication number: 20120045884
    Abstract: A method of protecting a substrate during fabrication of semiconductor, MEMS devices. The method includes application of a protective thin film which typically has a thickness ranging from 3 angstroms to about 1,000 angstroms, wherein precursor materials used to deposit the protective thin film are organic-based precursors which include at least one fluorine-comprising functional group at one end of a carbon back bone and at least one functional bonding group at the opposite end of a carbon backbone, and wherein the carbon backbone ranges in length from 4 carbons through about 12 carbons. In many applications at least a portion of the protective thin film is removed during fabrication of the devices.
    Type: Application
    Filed: November 1, 2011
    Publication date: February 23, 2012
    Inventors: Jeffrey Chinn, Boris Kobrin, Romuald Nowak
  • Patent number: 8067258
    Abstract: A method of protecting a substrate during fabrication of semiconductor, MEMS, or biotechnology devices. The method includes application of a protective thin film which typically has a thickness ranging from about 3 ? to about 1,000 ?, wherein precursor materials used to deposit the protective thin film are organic-based precursors which include at least one fluorine-comprising functional group at one end of a carbon back bone and at least one functional bonding group at the opposite end of a carbon backbone, and wherein the carbon backbone ranges in length from 4 carbons through about 12 carbons. In many applications at least a portion of the protective thin film is removed during fabrication of the devices.
    Type: Grant
    Filed: June 5, 2006
    Date of Patent: November 29, 2011
    Assignee: Applied Microstructures, Inc.
    Inventors: Jeffrey D. Chinn, Boris Kobrin, Romuald Nowak
  • Publication number: 20110217449
    Abstract: An intraocular lens with a hydrophilic polymer coating composition and method of preparing same are provided. Specifically, a composition suitable for reducing tackiness in intraocular lenses is provided wherein an acrylic intraocular lens is treated by vapor deposition with an alkoxy silyl terminated polyethylene glycol polymer composition.
    Type: Application
    Filed: May 13, 2011
    Publication date: September 8, 2011
    Inventors: Michael D. Lowery, Laurent Hoffmann, Boris Kobrin, Romuald Nowak, Jeffrey Chinn, Richard Yi
  • Publication number: 20110210480
    Abstract: Embodiments of the invention relate to methods of anti-counterfeiting for nanostructures and nanostructured devices. Specifically we describe a method of embedding a coded micro- or nanopatterns in nanostructures fabricated using Near-field rolling mask lithography, where areas of such features can be embedded into a transparent cylindrical or conic frame, or fabricated on the surface of flexible film laminated on the surface of the frame. Alternatively, specific coded nanofeatures distribution can be created using modulation of intensity or wavelength of the light source along the width or length of such cylinder or cone, or modulation of flexible film thickness or contact pressure between the rotatable mask and a substrate.
    Type: Application
    Filed: April 14, 2011
    Publication date: September 1, 2011
    Applicant: ROLITH, INC
    Inventor: Boris Kobrin
  • Patent number: 7955704
    Abstract: An intraocular lens with a hydrophilic polymer coating composition and method of preparing same are provided. Specifically, a composition suitable for reducing tackiness in intraocular lenses is provided wherein an acrylic intraocular lens is treated by vapor deposition with an alkoxy silyl terminated polyethylene glycol polymer composition.
    Type: Grant
    Filed: November 3, 2009
    Date of Patent: June 7, 2011
    Inventors: Michael D. Lowery, Laurent Hoffmann, Boris Kobrin, Romuald Nowak, Jeffrey Chinn, Richard Yi
  • Publication number: 20110126911
    Abstract: This invention provides composite plastic articles and methods of making them. The articles can be fluidic or microfluidic devices having fluidic conduits and, optionally, pneumatic conduits that regulate flow in the fluidic conduits. The articles comprise a first substrate coated with a layer of a material that comprises, or onto which have been introduced, reactive groups. For example, the substrate can be a plastic coated with an oxide or a siloxane onto which hydroxyl groups have been introduced. These articles are covalently bonded with other articles comprising reactive groups on their surfaces, for example, polysiloxanes treated to have silanol groups. Certain articles have specified locations on their surfaces that are not bonded to the other piece. For example, the coating can be removed from these locations before bonding. Such locations can be useful as functional elements of various devices, such as valve seats in valves of microfluidic devices.
    Type: Application
    Filed: November 18, 2010
    Publication date: June 2, 2011
    Applicant: IntegenX Inc., a California Corporation
    Inventors: Boris Kobrin, Iuliu I. Blaga, William Nielsen, Shize D. Qi, Ezra Van Gelder
  • Publication number: 20110052808
    Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based layer is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied.
    Type: Application
    Filed: November 4, 2010
    Publication date: March 3, 2011
    Inventors: Boris Kobrin, Jeffrey D. Chinn, Romuald Nowak, Richard C. Yi
  • Patent number: 7879396
    Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biotechnologically functional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, oxide coatings providing hydrophilicity or oxide/polyethylene glycol coatings providing hydrophilicity can be deposited by the present method, over the interior surfaces of small wells in a plastic micro-plate in order to increase the hydrophilicity of these wells. Filling these channels with a precise amount of liquid consistently can be very difficult. This prevents a water-based sample from beading up and creating bubbles, so that well can fill accurately and completely, and alleviates spillage into other wells which causes contamination.
    Type: Grant
    Filed: January 31, 2005
    Date of Patent: February 1, 2011
    Assignee: Applied Microstructures, Inc.
    Inventors: Boris Kobrin, Jeffrey D. Chinn, Romuald Nowak, Richard C. Yi
  • Publication number: 20100303687
    Abstract: This invention provides fluidic devices, in particular microfluidic devices, with diaphragm valves having low failure rates. Low failure rates are achieved by inhibiting sticking of the diaphragm to functional surfaces such as valve seats, valve chamber and fluidic channels and conduits. One way to implement this is to provide exposed surfaces facing the diaphragm, particularly valve seats, with a low energy material, such as a noble metal, a perfluorinated polymer, a self-assembled monolayer, hard diamond, diamond-like carbon or a metal oxide. In other embodiments, the valves are provided with ridges and the diaphragm is adhered to the fluidic or actuation layer with an adhesive material.
    Type: Application
    Filed: May 27, 2010
    Publication date: December 2, 2010
    Applicant: IntegenX Inc.
    Inventors: Iuliu I. BLAGA, Stevan B. Jovanovich, Boris Kobrin, Ezra Van Gelder
  • Publication number: 20100304132
    Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.
    Type: Application
    Filed: July 29, 2010
    Publication date: December 2, 2010
    Inventors: Boris Kobrin, Jeffrey D. Chinn, Romuald Nowak, Richard C. Yi
  • Patent number: 7776396
    Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: August 17, 2010
    Assignee: Applied Microstructures, Inc.
    Inventors: Boris Kobrin, Jeffrey D. Chinn, Romuald Nowak, Richard C. Yi
  • Publication number: 20100173494
    Abstract: We suggest a method of anisotropic etching of the substrates, where ultra-thin and conformable layers of materials are used to passivate sidewalls of the etched features. According to an exemplary embodiment such sidewall passivation layer is a Self-assembled monolayer (SAM) material deposited in-situ etching process from a vapor phase. According to another exemplary embodiment such sidewall passivation layer is an inorganic-based material deposited using Atomic Layer Deposition (ALD) method. SAM or ALD layers deposition can be carried out in a pulsing regime alternating with an sputtering and/or etching processes using process gasses with or without plasma. Alternatively, SAM deposition process is carried out continuously, while etch or sputtering process turns on in a pulsing regime. Alternatively, SAM deposition process and etch or sputtering processes are carried out continuously.
    Type: Application
    Filed: October 1, 2009
    Publication date: July 8, 2010
    Applicant: ROLITH, INC
    Inventor: Boris Kobrin
  • Publication number: 20100137984
    Abstract: An intraocular lens with a hydrophilic polymer coating composition and method of preparing same are provided. Specifically, a composition suitable for reducing tackiness in intraocular lenses is provided wherein an acrylic intraocular lens is treated by vapor deposition with an alkoxy silyl terminated polyethylene glycol polymer composition.
    Type: Application
    Filed: November 3, 2009
    Publication date: June 3, 2010
    Applicant: Abbott Medical Optics Inc.
    Inventors: Michael D. Lowery, Laurent Hoffman, Boris Kobrin, Romuald Nowak, Jeffrey Chinn, Richard Yi
  • Publication number: 20100123885
    Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.
    Type: Application
    Filed: April 1, 2009
    Publication date: May 20, 2010
    Applicant: ROLITH, INC
    Inventor: Boris Kobrin
  • Patent number: 7695775
    Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, a siloxane substrate surface is treated using a combination of ozone and UV radiation to render the siloxane surface more hydrophilic, and subsequently a functional coating is applied in-situ over the treated surface of the siloxane substrate.
    Type: Grant
    Filed: December 5, 2005
    Date of Patent: April 13, 2010
    Assignee: Applied Microstructures, Inc.
    Inventors: Boris Kobrin, Jeffrey D. Chinn, Romuald Nowak
  • Patent number: 7687110
    Abstract: We have devised an apparatus useful for and a method of removing impurities from vaporous precursor compositions used to generate reactive precursor vapors from which thin films/layers are formed under sub-atmospheric conditions. The method is particularly useful when the layer deposition apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the layer formation process, where the presence of impurities has a significant affect on both the quantity of reactants being charged and the overall composition of the reactant mixture from which the layer is deposited. The method is particularly useful when the vapor pressure of a liquid reactive precursor is less than about 250 Torr at atmospheric pressure.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: March 30, 2010
    Assignee: Applied Microstructures, Inc.
    Inventors: Boris Kobrin, Romuald Nowak, Jeffrey D. Chinn, Richard C. Yi
  • Publication number: 20100075034
    Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of films/coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled.
    Type: Application
    Filed: November 19, 2009
    Publication date: March 25, 2010
    Inventors: Boris Kobrin, Romuald Nowak, Richard C. Yi, Jeffrey D. Chinn