Patents by Inventor Cheng Chen
Cheng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11993561Abstract: The present disclosure discloses an expectorant compound, and specifically discloses compounds represented by formula I and formula II, pharmaceutically acceptable salts or tautomers thereof.Type: GrantFiled: July 1, 2020Date of Patent: May 28, 2024Assignee: HC SYNTHETIC PHARMACEUTICAL CO., LTD.Inventors: Cheng Yang, Sumin Qi, Qiyuan Zhang, Dongxing Li, Tieshan Chen, Xiaodan Zhao
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Patent number: 11994736Abstract: An imaging lens assembly has an optical axis and includes an annular structure located on an object side of the imaging lens assembly and surrounds the optical axis. The annular structure is located on an object side of the imaging lens assembly, surrounds the optical axis, and includes a first through hole, a second through hole, a first frustum surface, a second frustum surface and a third frustum surface. The first through hole is disposed on an object side of the annular structure, and the second through hole is disposed on an image side of the first through hole. The first frustum surface is disposed on the image side of the first through hole. The second frustum surface is disposed on an object side of the second through hole. The third frustum surface is disposed on an image side of the second through hole.Type: GrantFiled: January 8, 2021Date of Patent: May 28, 2024Assignee: LARGAN PRECISION CO., LTD.Inventors: Yu-Chen Lai, Ming-Ta Chou, Cheng-Feng Lin, Ming-Shun Chang
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Patent number: 11993779Abstract: Stevia varieties with high a content of RebD, a high content of RebM, and a high content of RebD and RebM containing various SNP markers and UGT isoforms, are disclosed. Methods of screening for the SNPs are also disclosed as well as for using the SNPs in marker assisted breeding. Further provided are methods for introgressing the disclosed SNPs associated with high RebD and high RebM into Stevia plants by selecting plants comprising for one or more SNPs and breeding with such plants to confer such desirable agronomic phenotypes to plant progeny.Type: GrantFiled: March 18, 2021Date of Patent: May 28, 2024Assignee: PureCircle SDN BHDInventors: Avetik Markosyan, Seong Siang Ong, Yeen Yee Wong, Yu Cheng Bu, Jian Ning Chen
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Patent number: 11996165Abstract: A memory chip includes a first decoding device and a memory device. The first decoding device is configured to generate multiple word line signals. The memory device is configured to generate a third data signal based on a first data signal and a second data signal. The memory device includes a first memory circuit and a second memory circuit. The first memory circuit is configured to generate the first data signal at a first node according to the word line signals during a first period. The second memory circuit is configured to generate the second data signal at a second node different from the first node according to the word line signals during a second period after the first period. A method of operating a memory chip is also disclosed herein.Type: GrantFiled: May 17, 2022Date of Patent: May 28, 2024Assignee: AU OPTRONICS CORPORATIONInventors: Hsiang-Chi Cheng, Shyh-Bin Kuo, Yi-Cheng Lai, Chung-Hung Chen, Shih-Hsien Yang, Yu-Chih Wang, Kuo-Hsiang Chen
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Patent number: 11996483Abstract: The present disclosure provides a semiconductor device that includes a semiconductor fin disposed over a substrate, an isolation structure at least partially surrounding the fin, an epitaxial source/drain (S/D) feature disposed over the semiconductor fin, where an extended portion of the epitaxial S/D feature extends over the isolation structure, and a silicide layer disposed on the epitaxial S/D feature, where the silicide layer covers top, bottom, sidewall, front, and back surfaces of the extended portion of the S/D feature.Type: GrantFiled: December 14, 2022Date of Patent: May 28, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Pei-Hsun Wang, Chih-Chao Chou, Shih-Cheng Chen, Jung-Hung Chang, Jui-Chien Huang, Chun-Hsiung Lin, Chih-Hao Wang
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Patent number: 11997798Abstract: A package substrate and manufacturing method thereof are provided. The package substrate includes a substrate and an electronic component. The substrate includes a cavity. The electronic component is disposed in the cavity. The electronic component includes a first region and a second region, and an optical recognition rate of the first region is distinct from that of the second region.Type: GrantFiled: August 30, 2022Date of Patent: May 28, 2024Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Wu Chou Hsu, Hsing Kuo Tien, Chih-Cheng Lee, Min-Yao Chen
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Patent number: 11996467Abstract: A semiconductor device includes first and second semiconductor fins extending from a substrate and a source/drain region epitaxially grown in recesses of the first and second semiconductor fins. A top surface of the source/drain region is higher than a surface level with top surfaces of the first and second semiconductor fins. The source/drain region includes a plurality of buffer layers. Respective layers of the plurality of buffer layers are embedded between respective layers of the source/drain region.Type: GrantFiled: May 15, 2023Date of Patent: May 28, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Tzu-Hsiang Hsu, Ting-Yeh Chen, Wei-Yang Lee, Feng-Cheng Yang, Yen-Ming Chen
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Patent number: 11996772Abstract: The present invention provides a voltage control method for controlling a power supply. The voltage control method comprises the following steps: obtaining a present output voltage value associated with a present gain value; obtaining a predetermined output voltage value associated with a predetermined duty ratio; calculating a target gain value, corresponding to the predetermined duty ratio, according to a gain value formula; performing a weight calculation on the present gain value and the target gain value for generating a buffer gain value; and setting an output voltage command according to the buffer gain value. Wherein the buffer gain value is between the present gain value and the target gain value.Type: GrantFiled: December 27, 2021Date of Patent: May 28, 2024Assignee: Chroma ATE Inc.Inventors: Szu-Chieh Su, Wei-Chin Tseng, Chih-Hsien Wang, His-Ping Tsai, Wen-Chih Chen, Guei-Cheng Hu
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Patent number: 11996482Abstract: A device includes a semiconductor substrate, a channel layer, a gate structure, source/drain epitaxial structures, and a dielectric isolation layer. The channel layer is over the semiconductor substrate. The gate structure is over the semiconductor substrate and surrounds the channel layer. The source/drain epitaxial structures are connected to the channel layer and arranged in a first direction. The dielectric isolation layer is between the gate structure and the semiconductor substrate. The dielectric isolation layer is wider than the gate structure but narrower than the channel layer in the first direction.Type: GrantFiled: March 13, 2023Date of Patent: May 28, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Zhi-Chang Lin, Shih-Cheng Chen, Jung-Hung Chang, Lo-Heng Chang, Chien-Ning Yao
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Patent number: 11995471Abstract: A resource integration method includes the following steps: a receiving module receives access information from a guest operating system on the host device; the access information is used to determine whether the frame rate is lower than a frame rate threshold; when the receiving module determines that the frame rate is lower than the frame rate threshold, the receiving module transmits an external resource request signal to the receiving module; after the receiving module receives the external resource request signal, a resource management module (which is located in the bridge module) selects an optimal external device from a specific category (among a plurality of categories in a candidate list), and a calculation operation or a storage operation corresponding to the specific category is transmitted to the optimal external device for calculation or storage by the bridge module.Type: GrantFiled: May 19, 2021Date of Patent: May 28, 2024Assignee: ACER INCORPORATEDInventors: Kuan-Ju Chen, Wen-Cheng Hsu, Hung-Ming Chang, Chih-Wen Huang, Chao-Kuang Yang
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Publication number: 20240168484Abstract: An accuracy measurement method of an autonomous mobile vehicle, a calculating device, and an autonomous mobile vehicle are provided. The accuracy measurement method includes a distance calculating step, a regression center calculating step, and an average calculating step. The distance calculating step includes a controlling step, a light beam emitting step, an image capturing step, an image analyzing step, and a converting step. The regression center calculating step is performed after the distance calculating step is repeatedly performed by at least two times. The accuracy measurement method is performed to obtain an X-axis offset in an X-axis direction, a Y-axis offset in a Y-axis direction, and an angle deflection of an autonomous mobile vehicle.Type: ApplicationFiled: February 6, 2023Publication date: May 23, 2024Inventors: PO-CHENG CHEN, KAO-PIN LIN, LIANG-CHIN WANG
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Publication number: 20240169376Abstract: An approach is disclosed that receives an incoming data record, the data record including a number of data fields. The approach determines a current Real-Time Resources Score (RTRS). The RTRS being a forecast of the information handling system's ability to handle incoming data transmissions. When the RTRS is lower than a current data accumulation rate, a subset of the data record is sent based on field priorities. The approach assigns priorities to each of the data fields included in the data record based on a priority assessment of the respective data fields. The approach then sends, to a data receiver, a subset of the plurality of data fields based on the assigned priority.Type: ApplicationFiled: November 23, 2022Publication date: May 23, 2024Inventors: LING MA, Cheng Fang Wang, Jing Yan ZZ Zhang, Bing Qian, Wen Wen Guo, Bo Chen Zhu
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Publication number: 20240170709Abstract: A motion synchronized multi-tier pallet rack and a battery formation apparatus are provided. The pallet rack includes a fixation rack, two movable frames, and two actuators. The movable frames are coupled to two corresponding sides of the fixation rack and each includes telescopic arms, a motor, and a drive rod. The actuators are disposed on other the two corresponding sides of the fixation rack to drive the movable frames to move toward or away from each other. The telescopic arms are kinematically connected to the motor through the drive rod to extend from or retract into the movable frame. The battery formation apparatus includes a motion synchronized multi-tier pallet rack, a conveyor module, a formation cabinet, and a controller. The conveyor module carries a battery module. The controller controls the pallet rack to obtain the battery module from the conveyor module and place the battery module in the formation cabinet.Type: ApplicationFiled: September 27, 2023Publication date: May 23, 2024Applicant: CHROMA ATE INC.Inventors: Ming-Cheng Huang, Jiun-Ren Chen, Chao-Cheng Wu, Yi-Sheng Hsu
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Publication number: 20240170339Abstract: In a method of manufacturing a semiconductor device, an n-type source/drain epitaxial layer and a p-type source/drain epitaxial layer respectively formed, a dielectric layer is formed over the n-type source/drain epitaxial layer and the p-type source/drain epitaxial layer, a first opening is formed in the dielectric layer to expose a part of the n-type source/drain epitaxial layer and a second opening is formed in the dielectric layer to expose a part of the p-type source/drain epitaxial layer, and the n-type source/drain epitaxial layer and the p-type source/drain epitaxial layer respectively recessed. A recessing amount of the n-type source/drain epitaxial layer is different from a recessing amount of the p-type source/drain epitaxial layer.Type: ApplicationFiled: March 2, 2023Publication date: May 23, 2024Inventors: Te-Chih Hsiung, Yun-Hua Chen, Yang-Cheng Wu, Sheng-Hsun Fu, Wen-Kuo Hsieh, Chih-Yuan Ting, Huan-Just Lin, Bing-Sian Wu, Yi-Hsuan Chiu
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Publication number: 20240170556Abstract: A method for forming a semiconductor structure is provided. The method includes forming a spacer layer along a first fin structure and a second fin structure, etching a first portion of the spacer layer and the first fin structure to form first fin spacers and a first recess between the first fin spacers, etching a second portion of the spacer layer and the second fin structure to form second fin spacers and a second recess between the second fin spacers, and forming a first source/drain feature in the first recess and a second source/drain feature in the second recess. The second fin structure is wider than the first fin structure. The first fin spacers have a first height, and the second fin spacers have a second height that is greater than the first height.Type: ApplicationFiled: February 20, 2023Publication date: May 23, 2024Inventors: Shih-Cheng CHEN, Zhi-Chang LIN, Jung-Hung CHANG, Chien-Ning YAO, Tsung-Han CHUANG, Kuo-Cheng CHIANG
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Publication number: 20240170543Abstract: A method of fabricating a semiconductor structure includes selective use of a cladding layer during the fabrication process to provide critical dimension uniformity. The cladding layer can be formed before forming a recess in an active channel structure or can be formed after filling a recess in an active channel structure with dielectric material. These techniques can be used in semiconductor structures such as gate-all-around (GAA) transistor structures implemented in an integrated circuit.Type: ApplicationFiled: January 30, 2024Publication date: May 23, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuei-Yu KAO, Shih-Yao LIN, Chen-Ping CHEN, Chih-Han LIN, Ming-Ching CHANG, Chao-Cheng CHEN
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Publication number: 20240169693Abstract: An accuracy measurement kit is provided and includes a marker, at least one light beam device, an image capture device, and a processing device. The marker is disposed on an autonomous mobile vehicle, and at least partially includes a reference pattern. The light beam device is configured to emit a light beam to the autonomous mobile vehicle located at a predetermined position so as to form a light spot on the marker. The processing device is configured to capture the light spot the marker on the autonomous mobile vehicle for generating a to-be-analyzed image. The processing device is configured to obtain an offset of the autonomous mobile vehicle in an X-axis direction and a Y-axis direction by calculating images of the to-be-analyzed image corresponding to the reference pattern and the light spot.Type: ApplicationFiled: February 6, 2023Publication date: May 23, 2024Inventors: PO-CHENG CHEN, KAO-PIN LIN, LIANG-CHIN WANG
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Publication number: 20240170336Abstract: A semiconductor device includes a plurality of semiconductor layers vertically separated from one another. The semiconductor device includes a gate structure that comprises a lower portion and an upper portion, wherein the lower portion wraps around each of the plurality of semiconductor layers. The semiconductor device includes a gate spacer that extends along a sidewall of the upper portion of the gate structure and has a bottom surface. A portion of the bottom surface of the gate spacer and a top surface of a topmost one of the plurality of semiconductor layers form an angle that is less than 90 degrees.Type: ApplicationFiled: January 30, 2024Publication date: May 23, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuei-Yu Kao, Chao-Cheng Chen, Chih-Han Lin, Chen-Ping Chen, Ming-Ching Chang, Shih-Yao Lin, Chih-Chung Chiu
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Publication number: 20240170536Abstract: A method of forming semiconductor devices having improved work function layers and semiconductor devices formed by the same are disclosed. In an embodiment, a method includes depositing a gate dielectric layer on a channel region over a semiconductor substrate; depositing a first p-type work function metal on the gate dielectric layer; performing an oxygen treatment on the first p-type work function metal; and after performing the oxygen treatment, depositing a second p-type work function metal on the first p-type work function metal.Type: ApplicationFiled: January 29, 2024Publication date: May 23, 2024Inventors: Hsin-Yi Lee, Ji-Cheng Chen, Chi On Chui
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Publication number: 20240170225Abstract: This invention describes a packaging structure for roll-type (wound-type) aluminum conductive polymer capacitor element. Two protective substrates are applied to sandwich a roll-type capacitor element in between with an insulating material surrounding the capacitor element also in between the protective substrates. The protective substrates comprise electrically separated anodic conductive pad and cathodic conductive pad on their surfaces and through holes that pass through the conductive pads. The capacitor element is oriented with its axis perpendicular to the two substrates. The anodic and cathodic leads of the capacitor element pass through the through holes. An anodic external terminal is plated over the anodic conductive pad and a cathodic external terminal is plated over the cathodic conductive pad so that the anodic external terminal is electrically connected to the anodic lead and the cathodic external terminal is electrically connected to the cathodic lead.Type: ApplicationFiled: November 22, 2022Publication date: May 23, 2024Inventors: Yu-Peng Chung, Chia-Wei Li, Wen Cheng Hsu, En-Ming Chen, Che-Chih Tsao