Abstract: A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.

Abstract: A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.

Abstract: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract: A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams.

Abstract: According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.

Abstract: Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.

Abstract: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.

Abstract: A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.

Abstract: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.

Abstract: Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.

Abstract: An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens.

Abstract: A method for locating, forming, or both locating and forming, bumps of material on a substrate having a plurality of devices, the method includes receiving data which indicates the number and location of the devices on the substrate, then using a flip-chip bumping apparatus to locate, form, or both locate and form, bumps of material on the devices, the positions of the devices being determined using the data.

Abstract: A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of the substrate. The substrate table includes a support member having an upper support surface for supporting at least part of the target portion of the substrate on a fluid cushion. The apparatus further includes a fluid supply system arranged to supply fluid to the upper support surface so as to provide the cushion, and an actuator system arranged to act on the support member. The actuator system is controllable to provide adjustment of a topography of the upper support surface relative to a reference plane. Compensation can thus be made for substrate thickness irregularities, to achieve correct focusing of the beam onto the target surface.

Abstract: Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.

Abstract: A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.

Abstract: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.

Abstract: A lithographic apparatus comprises a substrate table that supports a substrate having alignment marks on a surface thereof. The apparatus further comprises a frame moveable relative to the substrate to provide for a scanning or stepping mode of operation. An array of projection systems is disposed across the frame for projecting respective patterned beams onto a target portion of the substrate. A plurality of alignment mark detectors are attached to the frame and are moveable with respect to the frame using respective linear drive mechanisms. A position sensor is associated with each alignment mark detector for determining the position of the detector relative to the frame. A control system is responsible for both initial positioning of the detectors above alignment mark patterns on the substrate, and for dynamic alignment of the frame and substrate during a lithographic process.