Abstract: A display with a rotatable camera structure has a display region and includes a bezel with a lens and a rear cover connected to the bezel, and the rear cover has an opening. The bezel is disposed around the display region. The rotatable camera structure is between the bezel and the rear cover. The rotatable camera structure includes a dome holder, a camera and a dome cover. The dome holder with an opening is configured on the bezel and covers the lens. The camera is in the dome holder. The dome cover covers the opening of the dome holder, and the dome cover is connected to the camera through the opening of the dome holder. The dome cover has an angle adjustment structure exposed from the opening of the rear cover to adjust the filming angle of the camera for users.

Abstract: A 3D model construction device includes a camera and a wearable display coupled to the camera. The camera obtains multiple first frames, a second frame and depth information. The wearable display includes a display unit, a processing unit, a storage unit and a projection unit. The storage unit stores a first module and a second module. When the first module is performed by the processing unit, the processing unit calculates a first pose of the wearable display. When the second module is performed by the processing unit, the processing unit calculates a 3D model according to the first frames, the depth information, the first pose and calibration parameters, and updates the 3D model according to the second frame. The projection unit projects the 3D model and the second frame onto the display unit according to the first pose for being displayed with a real image on the display unit.

Abstract: Debris is removed from a collector of an extreme ultraviolet light source vessel by applying a suction force through a vacuum opening of a cable. The method for removing debris also includes weakening debris attachment by using a sticky surface or by spreading a solution through a nozzle, wherein the sticky surface and the nozzle are arranged on the cable proximal to the vacuum opening. A borescope system and interchangeable rigid portions of the cable assists in targeting a target area of the collector where the debris is.

Abstract: A heat pipe, a heat pipe assembly and a method for assembling the heat pipe assembly. The heat pipe includes a main body part and an insertion part. The insertion part is connected to the main body part. The main body part and the insertion part together form a single hollow pipe. The insertion part has an outer surface and at least one recessed part formed on the outer surface.

Abstract: An inductor manufacturing method includes making a coil with a wire member, the coil has two end portions, bending a dependent segment from one end portion of the coil, and bending a lateral extension from the dependent segment, bending a bent segment from the second end portion of the coil, and bending a lateral segment from the bent segment, a base member is then engaged into a space between the coil and the lateral extension and the lateral segment of the coil for forming a coil assembly, the coil assembly is then engaged into a mold cavity of a mold device and punched together with an iron powder, the lateral extension and the lateral segment of the coil are electroplated with an electroplating layer.

Abstract: An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.

Abstract: A single-shot metrology for direct inspection of an entirety of the interior of an EUV vessel is provided. An EUV vessel including an inspection tool integrated with the EUV vessel is provided. During an inspection process, the inspection tool is moved into a primary focus region of the EUV vessel. While the inspection tool is disposed at the primary focus region and while providing a substantially uniform and constant light level to an interior of the EUV vessel by way of an illuminator, a panoramic image of an interior of the EUV vessel is captured by way of a single-shot of the inspection tool. Thereafter, a level of tin contamination on a plurality of components of the EUV vessel is quantified based on the panoramic image of the interior of the EUV vessel. The quantified level of contamination is compared to a KPI, and an OCAP may be implemented.

Abstract: Debris is removed from a collector of an extreme ultraviolet light source vessel by applying a suction force through a vacuum opening of a cable. The method for removing debris also includes weakening debris attachment by using a sticky surface or by spreading a solution through a nozzle, wherein the sticky surface and the nozzle are arranged on the cable proximal to the vacuum opening. A borescope system and interchangeable rigid portions of the cable assists in targeting a target area of the collector where the debris is.

Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.

Abstract: Various methods are disclosed herein for reducing (or eliminating) printability of mask defects during lithography processes. An exemplary method includes performing a first lithography exposing process and a second lithography exposing process using a mask to respectively image a first set of polygons oriented substantially along a first direction and a second set of polygons oriented substantially along a second direction on a target. During the first lithography exposing process, a phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the first direction and a third direction that is different than the first direction. During the second lithography exposing process, the phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the second direction and a fourth direction that is different than the third direction.

Abstract: A portable electronic device including host body, display body, hinge and heat pipe assembly. The host body includes base and heat source disposed on base. Side of positioning structure is connected to first fixed part. First fixed part is fixed to base. Second fixed part is fixed to metal casing. Heat pipe assembly includes first heat pipe and second heat pipe. End part of first heat pipe has insertion hole. End part of second heat pipe is pivotally inserted into insertion hole of end part of first heat pipe. Another end part of first heat pipe is in thermal contact with heat source. Another end part of second heat pipe is in thermal contact with metal casing. Another side of positioning structure is fixed to end part of first heat pipe so as to keep pivot part and end part of first heat pipe coaxial.

Abstract: A fan module includes a housing, a bearing, a rotating shaft, and a fan wheel. The housing includes a bottom covering plate, a top covering plate, and a side wall connected between the bottom covering plate and the top covering plate and surrounding to form a housing space. The bearing is disposed on the bottom covering plate and includes a supporting pillar. The supporting pillar extends from the bottom covering plate toward the top covering plate. The rotating shaft has a first through hole therein. The rotating shaft is rotatably sleeved onto the supporting pillar by the first through hole. The fan wheel is connected to an outer edge of the rotating shaft.

Abstract: An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.

Abstract: A single-shot metrology for direct inspection of an entirety of the interior of an EUV vessel is provided. An EUV vessel including an inspection tool integrated with the EUV vessel is provided. During an inspection process, the inspection tool is moved into a primary focus region of the EUV vessel. While the inspection tool is disposed at the primary focus region and while providing a substantially uniform and constant light level to an interior of the EUV vessel by way of an illuminator, a panoramic image of an interior of the EUV vessel is captured by way of a single-shot of the inspection tool. Thereafter, a level of tin contamination on a plurality of components of the EUV vessel is quantified based on the panoramic image of the interior of the EUV vessel. The quantified level of contamination is compared to a KPI, and an OCAP may be implemented.

Abstract: An image capturing assembly including a composite circuit board, an image capturing component and a first audio component. The composite circuit board includes a hard board part and a first flexible board part that are directly connected to each other. The image capturing component is disposed on and electrically connected to the hard board part. The first audio component is disposed on and electrically connected to the first flexible board part.

Abstract: Various methods are disclosed herein for reducing (or eliminating) printability of mask defects during lithography processes. An exemplary method includes performing a first lithography exposing process and a second lithography exposing process using a mask to respectively image a first set of polygons oriented substantially along a first direction and a second set of polygons oriented substantially along a second direction on a target. During the first lithography exposing process, a phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the first direction and a third direction that is different than the first direction. During the second lithography exposing process, the phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the second direction and a fourth direction that is different than the third direction.

Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.

Abstract: An insole design method and an insole design system are provided, and the method includes: capturing an uncompressed free foot model by a depth camera and obtaining a free foot model three-dimensional image; capturing a pressed foot model stepped on a transparent pedal by the depth camera and obtaining a pressed foot model three-dimensional image; aligning the free foot model three-dimensional image with the pressed foot model three-dimensional image; calculating and obtaining a plantar deformation quantity according to the aligned free foot model three-dimensional image and the aligned pressed foot model three-dimensional image; and completing the designed insole according to a sole projection plane or a three-dimensional profile of the specific sole and the plantar deformation quantity.

Abstract: A bendable device includes a base housing, a first housing, a second housing, a third housing, and a plurality of first resilient members. The base housing has two sides that are symmetrical to each other. The first housing is pivotally connected to one of the two sides of the base housing by a first pivot. The second housing is pivotally connected to the base housing and the first housing by the first pivot. The third housing is pivotally connected to the base housing, the first and second housings by the first pivot. The first resilient members are pivotally connected to any adjacent two of the base housing, the first, second, and third housings respectively. The first, second, and third housings rotate about the first pivot relative to the base housing to have the bendable device into a folded state or an expanded state selectively.

Abstract: The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.