Abstract: Disclosed is an electronic device having a display region and a peripheral region adjacent to the display region. The electronic device includes a first electrode disposed in the display region, a second electrode disposed in the display region, a circuit module disposed in the peripheral region, a first electrical trace, and a second electrical trace electrically insulated from the first electrical trace. The circuit module is electrically connected to the first electrode through the first electrical trace and provides a first driving voltage to the first electrical trace. The circuit module is electrically connected to the second electrode through the second electrical trace and provides a second driving voltage to the second electrical trace, and the first driving voltage is different from the second driving voltage. In a top view, the first electrical trace at least partially overlaps the second electrical trace.

Abstract: An electron beam lithography system and an electron beam lithography process are disclosed herein for improving throughput. An exemplary method for increasing throughput achieved by an electron beam lithography system includes receiving an integrated circuit (IC) design layout that includes a target pattern, wherein the electron beam lithography system implements a first exposure dose to form the target pattern on a workpiece based on the IC design layout. The method further includes inserting a dummy pattern into the IC design layout to increase a pattern density of the IC design layout to greater than or equal to a threshold pattern density, thereby generating a modified IC design layout. The electron beam lithography system implements a second exposure dose that is less than the first exposure dose to form the target pattern on the workpiece based on the modified IC design layout.

Abstract: A method for parking detection and identification of moveable apparatus, comprising following steps of: generating a magnetic field signal containing an unique identifier for identifying the moveable apparatus by a magnetic field generator disposed in the moveable apparatus; measuring magnetic field respectively by two magnetic field sensors of a magnetic field sensing apparatus disposed in a moveable-apparatus parking place or its peripheral area, wherein a first and a second magnetic field measurements are measured; and calculating a magnetic field measurement difference for obtaining the unique identifier, wherein the magnetic field measurement difference is a magnitude of a difference of the first and the second magnetic field measurements, or a magnitude of a difference of a first magnetic field component of the first magnetic field measurement along a characteristic direction and a second magnetic field component of the second magnetic field measurement along the characteristic direction.

Abstract: A display panel and a spliced display are provided. The display panel includes a substrate, a plurality of light-emitting elements, a driving circuit, and an optical sensor. The substrate includes a through hole, and the through hole includes a hole. The plurality of the light-emitting elements are disposed on the substrate. The through hole is located in a region between two of the plurality of the light-emitting elements. The driving circuit is disposed on the substrate and electrically connected to the plurality of the light-emitting elements. The optical sensor is disposed corresponding to the through hole and receives sensing light through the hole. The width W of the hole meets the equation of H?W<D. H is the depth of the hole, and D is the distance between the two of the plurality of the light-emitting elements.

Abstract: A method of manufacturing a semiconductor device includes forming a photoresist layer over a substrate. The photoresist layer includes a photoresist composition includes a polymer. The polymer includes a monomer unit having a pendant sensitizer and crosslinking group, and a monomer unit having a pendant acid labile group. The photoresist layer is selectively exposed to actinic radiation, and the selectively exposed photoresist layer is developed.

Abstract: An electronic device is provided and includes a first voltage trace, a second voltage trace, a first region electrode, a second region electrode, and a voltage source module. The second voltage trace is electrically insulated from the first voltage trace, the first region electrode is electrically connected to the first voltage trace, and the second region electrode is electrically connected to the second voltage trace. The voltage source module provides a first driving voltage to the first voltage trace and provides a second driving voltage to the second voltage trace, in which the first driving voltage is different from the second driving voltage. In a top-view direction of the electronic device, the first voltage trace is separated from the second voltage trace, and the first voltage trace and the second voltage trace are formed of a conductive layer.

Abstract: A multilayer structure for lithography patterning is provided. The multilayer structure includes a substrate, a bottom anti-reflective coating (BARC) layer over the substrate, and a photoresist layer over the BARC layer. The BARC layer includes a polymer and a hydrolysis promoting agent. The photoresist layer includes an organometallic dimer obtained by partial hydrolysis of a precursor organometallic compound comprising hydrolysable ligands.

Abstract: The present invention provides a wireless communication method of an electronic device, wherein the wireless communication method includes the steps of: determining one link plan from a plurality link plans; using the determined link plan as a current link plan to configure a first link and a second link of the electronic device; determining whether the current link plan satisfies a first condition; in response to the current link plan satisfying the first condition, determining whether performance of another link plan is better than performance of the current link plan; and in response to the performance of another link plan being better than the performance of the current link plan, determining the another as the current link plan to configure the first link and the second link of the electronic device to communicate with the another electronic device.

Abstract: A device model parameter generation system, comprises a user module, for obtaining parameter set configurations and measurement data of devices; a parameter extraction module, for performing parameter extractions on the parameter set configurations and the measurement data, to generate a parameter set; a simulation module, for performing simulations according to the parameter set configurations and the measurement data, to generate a simulation results; an analysis module, for determining whether the devices conform to a trend according to the parameter set, to generate a first determination result, and for determining whether the devices conform to a smoothness according to the first determination result and the parameter set, to generate a second determination result; and a device model parameter generation module, for generating a device model parameters according to the second determination result and the parameter set.

Abstract: A light source device and a manufacturing method of the light source device is provided. The light source device includes a micro light-emitting element layer, a transparent substrate and a wavelength conversion module. The wavelength conversion module includes a first wavelength conversion layer, a second wavelength conversion layer, a light transmission layer, multiple barrier structures, multiple reflection layers and a light cut-off layer. The first wavelength conversion layer, the second wavelength conversion layer, and the light transmission layer are arranged in an arrangement direction. Any two of the first wavelength conversion layer, the second wavelength conversion layer, and the light transmission layer are separated from each other by one of the barrier structures. The reflection layers are located between the barrier structures and any one of a sidewall of the first wavelength conversion layer, a sidewall of the second wavelength conversion layer, and a sidewall of the light transmission layer.

Abstract: A method according to the present disclosure includes providing a substrate, depositing an underlayer over the substrate, depositing a photoresist layer over the underlayer, exposing a portion of the photoresist layer and a portion of the underlayer to a radiation source according to a pattern, baking the photoresist layer and underlayer, and developing the exposed portion of the photoresist layer to transfer the pattern to the photoresist layer. The underlayer includes a polymer backbone, a polarity switchable group, a cross-linkable group bonded to the polymer backbone, and photoacid generator. The polarity switchable group includes a first end group bonded to the polymer backbone, a second end group including fluorine, and an acid labile group bonded between the first end group and the second end group. The exposing decomposes the photoacid generator to generate an acidity moiety that detaches the second end group from the polymer backbone during the baking.

Abstract: A display device including a light source module and a wavelength conversion module is provided. The light source module includes a substrate, a plurality of first LED elements and a second LED element. The first LED elements are configured for providing a plurality of first color lights, and the second LED element is configured for providing a second color light. The wavelength conversion module is overlapped and arranged on the light source module, and the wavelength conversion module includes a wavelength conversion element and at least one dichroic filter layer. The wavelength conversion element is configured to absorb the first color lights emitted by a part of the first LED elements and excite a converted light beam, wherein a color of the converted light beam is different from that of the first color lights and the second color light.

Abstract: A display panel and a spliced display are provided. The display panel includes a substrate, a plurality of light-emitting elements, a driving circuit, and an optical sensor. The substrate includes a through hole, and the through hole includes a hole. The plurality of the light-emitting elements are disposed on the substrate. The through hole is located in a region between two of the plurality of the light-emitting elements. The driving circuit is disposed on the substrate and electrically connected to the plurality of the light-emitting elements. The optical sensor is disposed corresponding to the through hole and receives sensing light through the hole. The width W of the hole meets the equation of H?W<D. H is the depth of the hole, and D is the distance between the two of the plurality of the light-emitting elements.

Abstract: A method according to the present disclosure includes providing a substrate, depositing an underlayer over the substrate, depositing a photoresist layer over the underlayer, exposing a portion of the photoresist layer and a portion of the underlayer to a radiation source according to a pattern, baking the photoresist layer and underlayer, and developing the exposed portion of the photoresist layer to transfer the pattern to the photoresist layer. The underlayer includes a polymer backbone, a polarity switchable group, a cross-linkable group bonded to the polymer backbone, and photoacid generator. The polarity switchable group includes a first end group bonded to the polymer backbone, a second end group including fluorine, and an acid labile group bonded between the first end group and the second end group. The exposing decomposes the photoacid generator to generate an acidity moiety that detaches the second end group from the polymer backbone during the baking.

Abstract: An electron beam lithography system and an electron beam lithography process are disclosed herein for improving throughput. An exemplary method for increasing throughput achieved by an electron beam lithography system includes receiving an integrated circuit (IC) design layout that includes a target pattern, wherein the electron beam lithography system implements a first exposure dose to form the target pattern on a workpiece based on the IC design layout. The method further includes inserting a dummy pattern into the IC design layout to increase a pattern density of the IC design layout to greater than or equal to a threshold pattern density, thereby generating a modified IC design layout. The electron beam lithography system implements a second exposure dose that is less than the first exposure dose to form the target pattern on the workpiece based on the modified IC design layout.

Abstract: An electronic device having a peripheral area and a non-peripheral area adjacent to the peripheral area is provided. The electronic device includes a flexible substrate, a first conductive layer disposed on the flexible substrate and disposed in the peripheral area and the non-peripheral area, an organic layer disposed in the non-peripheral area and on the first conductive layer, a second conductive layer disposed on the first conductive layer, and an organic structure disposed between the first conductive layer and the second conductive layer in the peripheral area. The organic layer and the organic structure are the same material layer.

Abstract: In an embodiment, a system includes: a cassette comprising a slit opening configured to house a wafer; a blade configured to move the wafer to and from the slit opening by extending into the slit opening, wherein a blade thickness of the blade is at most ? of a height of the slit opening and wherein the blade is configured to secure the wafer within a pocket on the blade that is at least ? of a wafer thickness of the wafer.

Abstract: An electronic device is provided. The electronic device includes a supporting substrate, a flexible substrate disposed on the supporting substrate, a first conductive layer disposed on the flexible substrate, a second conductive layer disposed on the first conductive layer, a plurality of organic elements disposed between the first conductive layer and the second conductive layer, and an opening passing through the supporting substrate and exposing a portion of the flexible substrate. The first conductive layer alternately contacts the second conductive layer and the plurality of organic elements.

Abstract: A near magnetic field variation detection method comprises following steps of: measuring magnetic field by a first magnetic field sensor and a second magnetic field sensor respectively; and calculating a magnetic field measurement difference, wherein the magnetic field measurement difference is (1) a magnitude of a difference of a first-magnetic-field-measurement measured by the first magnetic field sensor and a second-magnetic-field-measurement measured by the second magnetic field sensor, or (2) a magnitude of a difference of a first-magnetic-field-measurement-component measured by the first magnetic field sensor along a characteristic direction and a second-magnetic-field-measurement-component measured by the second magnetic field sensor along the characteristic direction; wherein a near magnetic field variation is occurred when (a) the magnetic field measurement difference is continuously greater than a characteristic-threshold within a characteristic-time-period, or (b) an average value of the magnetic f

Abstract: The present invention is related to an active substance of Hericium erinaceus having a pain-relieving effect, and a pharmaceutical composition including the active substance. The active substance is prepared using the following steps: (a) inoculating a mycelium of H. erinaceus on an agar plate and incubating at 15-32° C. for 8-16 days; (b) inoculating the incubated H. erinaceus mycelia from step (a) into a medium in a flask and incubating at 20-30° C. and pH 4.5-6.5 for 3-5 days; (c) inoculating the incubated H. erinaceus mycelia from step (b) into a medium in a fermentation tank and incubating at 24-32° C. and pH 4.5-5.5 for 8-16 days to obtain a fermented medium of the H. erinaceus mycelia; and (d) desiccating the fermented medium of the H. erinaceus mycelia from step (c) to obtain the powder of the H. erinaceus mycelia, which is further purified and isolated to obtain a novel compound of H. erinaceus.