Abstract: A keyswitch with force feedback function includes a vibrating source, a switching circuit and a controller. The vibrating source is connected to a cap of the keyswitch. The switching circuit is switched on according to states of the keyswitch. The controller is electrically connected to the vibrating source and the switching circuit. When the switching circuit is switched on, the controller outputs a first driving signal to the vibrating source, and the vibrating source transmits a pressing vibration to the cap of the keyswitch. A period of the first driving signal is smaller than or equal to a predetermined period, a user can feel vibration of the keyswitch due to the pressing vibration.

Abstract: A resistive memory apparatus is provided. The resistive memory apparatus includes a plurality of memory cell pairs, and each of the memory cell pairs includes an active area, first and second word lines, a source line, first and second resistors and first and second bit lines. The active area is formed on a substrate, and the first and second word lines are formed on the substrate, and intersected with the active area. The source line is formed on the substrate and coupled to the active area. The first and second resistors are disposed on the substrate, and respectively coupled to the active area. The first and second bit lines are formed on the first and second resistors and coupled to the first and second resistors. The first and second bit lines are extended along a first direction which is substantially parallel to the first and second word lines.

Abstract: A high-reliability resistive random access memory (RRAM). A memory cell of a memory cell array is controlled via a word line, a bit line and a source line. The control unit of the RRAM has a word line decoder, a bit line decoder, and a source line decoder and switch circuit. The word line decoder, the bit line decoder and the source line decoder respectively control the voltage applied to the word line, the voltage applied to the bit line, and the voltage applied to the source line. The switch circuit is switched between a first state and a second state to operate the bit line decoder to apply a voltage to the bit line to read the memory cell and to operate the source line decoder to apply a voltage to the source line to read the memory cell alternately.

Abstract: An environmental-friendly composite filament artificial leather includes a composite filament textile and an elastomer film. The composite filament textile is made of composite filament. The composite filament includes at least one core portion and a sheath portion. The at least one core portion is a polyester-type polymer, a polyamide polymer or a polypropylene polymer. The sheath portion sheathes the at least one core portion, and the sheath portion is a thermoplastic elastomer. The elastomer film is bonded with the composite filament textile. The elastomer film is made of one selected from the following materials: thermoplastic polyurethane (TPU), thermoplastic polyester elastomer (TPEE) and thermoplastic polyolefin (TPO). By this way, an environment-friendly artificial leather of lightweight, good abrasion, good touch feeling and well dimentional stability can be manufactured.

Abstract: The subject invention is related to a method for preparing a reflective film, comprising the steps of: (a) providing a first substrate and forming a releasable adhesive layer thereon; (b) applying reflective particles onto the releasable adhesive layer, where the reflective particles are partially embedded in the releasable adhesive layer; (c) applying a pigment onto the reflective particles and the releasable adhesive layer; (d) removing part of the pigment so that the pigment does not completely cover the reflective particles; and (d) forming a reflective layer on the pigment and the reflective particles. The invention further pertains to a method for manufacturing a reflective article by using the reflective film prepared according to the above-mentioned method.

Abstract: A keyboard capable of generating a tactile feedback signal makes use of acceleration change of pressing behavior and releasing behavior of a physical keyswitch during pressing and releasing stages. The acceleration change is modulated according to a touch sensitive frequency response in various ways so that a simulated tactile feedback may be generated on the keyswitches of the keyboard.

Abstract: A keyswitch with force feedback function includes a vibrating source, a switching circuit and a controller. The vibrating source is connected to a cap of the keyswitch. The switching circuit is switched on according to states of the keyswitch. The controller is electrically connected to the vibrating source and the switching circuit. When the switching circuit is switched on, the controller outputs a first driving signal to the vibrating source, and the vibrating source transmits a pressing vibration to the cap of the keyswitch. A period of the first driving signal is smaller than or equal to a predetermined period, a user can feel vibration of the keyswitch due to the pressing vibration.

Abstract: The subject invention is related to a method for preparing a reflective film, comprising the steps of: (a) providing a first substrate and forming a releasable adhesive layer thereon; (b) applying reflective particles onto the releasable adhesive layer, where the reflective particles are partially embedded in the releasable adhesive layer; (c) applying a pigment onto the reflective particles and the releasable adhesive layer; (d) removing part of the pigment so that the pigment does not completely cover the reflective particles; and (d) forming a reflective layer on the pigment and the reflective particles. The invention further pertains to a method for manufacturing a reflective article by using the reflective film prepared according to the above-mentioned method.

Abstract: A method for monitoring a photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together with the product patterns through the photolithography process onto a substrate, and measuring the deviation dimension of the monitor mark formed on the substrate to real-time monitor the focus of the photolithography process.

Abstract: A method of measuring a numerical aperture of an exposure machine is described. A control wafer having vernier marks thereon and an aberration mask having pinholes therein are provided, wherein each pinhole corresponds to a vernier mark in position. A lithography process using the exposure machine and the aberration mask is performed to the control wafer, so as to form over each vernier mark a photoresist pattern having the same shape of the illumination pattern of the light source of the exposure machine. The numerical aperture of the exposure machine is then derived from a graduation of the vernier mark corresponding to an outer edge of the photoresist pattern.

Abstract: A glass lens array module with alignment fixture and a manufacturing method thereof are revealed. A glass lens array is produced by multi-cavity glass molding and alignment members are arranged on a peripheral of non-optical area of the glass lens array. Optical axis of each of two adjacent glass lens arrays is aligned by corresponding alignment members and the glass lens arrays are assembled by glue. A spacer is disposed between the two adjacent glass lens arrays to form a preset interval if needed. Thus a glass lens array module is formed after curing of the glue. Thereby the alignment of the optical axis of the glass lens is achieved easily and optical precision is also attained. Moreover, the manufacturing processes are simplified and the cost is reduced.

Abstract: A method for determining native threshold voltage of nonvolatile memory includes following steps. A memory cell including a control gate, a charge storage layer, a source region, and a drain region is provided. A programming operation is performed on the memory cell by using F-N tunneling effect to obtain a programming curve of time versus threshold voltage. In the programming operation, a positive voltage is applied to the control gate. An erase operation is performed on the memory cell by using F-N tunneling effect to obtain an erasure curve of time versus threshold voltage. In the erase operation, a negative voltage is applied to the control gate. The absolute values of the positive voltage and the negative voltage are the same. The native threshold voltage of memory cell is determined from the cross point of the programming curve and the erasure curve.

Abstract: A stacked optical glass lens array, a stacked lens module and a manufacturing method thereof are disclosed. The stacked optical glass lens array includes at least two optical glass lens arrays whose optical axis are aligned and then stacked with each other by cement glue in glue grooves. A stacked optical glass lens element can be singularized by cutting along with the alignment notches of stacked optical glass lens array. The stacked lens module is formed by a single stacked optical glass lens element and related optical element mounted in a lens holder. Thereby the optical axis of the lenses of the stacked lens module are aligned precisely, the manufacturing processes are simplified and the production cost is reduced.

Abstract: A method for determining native threshold voltage of nonvolatile memory includes following steps. A memory cell including a control gate, a charge storage layer, a source region, and a drain region is provided. A programming operation is performed on the memory cell by using F-N tunneling effect to obtain a programming curve of time versus threshold voltage. In the programming operation, a positive voltage is applied to the control gate. An erase operation is performed on the memory cell by using F-N tunneling effect to obtain an erasure curve of time versus threshold voltage. In the erase operation, a negative voltage is applied to the control gate. The absolute values of the positive voltage and the negative voltage are the same. The native threshold voltage of memory cell is determined from the cross point of the programming curve and the erasure curve.

Abstract: A molding glass lens and a mold thereof are disclosed. The molding glass lens consists of an upper optical surface, a lower optical surface, two outers surrounding the optical surfaces and at least three grooves arranged in the form of a circle disposed on the lower outer and/or the upper outer. The disposition of the grooves has no affecting in original size of the outers as well as assembling with other mechanical parts in les group. The mold of the lens includes an upper molding unit and a lower molding unit. Cavity of each molding unit is composed of a central part for forming an optical surface of the lens and an outer circular part for forming outer of the lens. At least three protrudent parts with the same height are disposed in the form of a circle on the outer circular of the lower molding unit and/or the upper molding unit. Thus the air in the mold cavity is easy to exhaust through the gap formed by protrudent parts and glass preform.

Abstract: A glass lens array module with alignment fixture and a manufacturing method thereof are revealed. A glass lens array is produced by multi-cavity glass molding and alignment members are arranged on a peripheral of non-optical area of the glass lens array. Optical axis of each of two adjacent glass lens arrays is aligned by corresponding alignment members and the glass lens arrays are assembled by glue. A spacer is disposed between the two adjacent glass lens arrays to form a preset interval if needed. Thus a glass lens array module is formed after curing of the glue. Thereby the alignment of the optical axis of the glass lens is achieved easily and optical precision is also attained. Moreover, the manufacturing processes are simplified and the cost is reduced.

Abstract: A method of measuring a numerical aperture of an exposure machine is described. A control wafer having vernier marks thereon and an aberration mask having pinholes therein are provided, wherein each pinhole corresponds to a vernier mark in position. A lithography process using the exposure machine and the aberration mask is performed to the control wafer, so as to form over each vernier mark a photoresist pattern having the same shape of the illumination pattern of the light source of the exposure machine. The numerical aperture of the exposure machine is then derived from a graduation of the vernier mark corresponding to an outer edge of the photoresist pattern.

Abstract: A molding glass lens and a mold thereof are disclosed. The molding glass lens consists of an upper optical surface, a lower optical surface, two outers surrounding the optical surfaces and at least three grooves arranged in the form of a circle disposed on the lower outer and/or the upper outer. The disposition of the grooves has no affecting in original size of the outers as well as assembling with other mechanical parts in les group. The mold of the lens includes an upper molding unit and a lower molding unit. Cavity of each molding unit is composed of a central part for forming an optical surface of the lens and an outer circular part for forming outer of the lens. At least three protrudent parts with the same height are disposed in the form of a circle on the outer circular of the lower molding unit and/or the upper molding unit. Thus the air in the mold cavity is easy to exhaust through the gap formed by protrudent parts and glass preform.

Abstract: A method for monitoring a photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together with the product patterns through the photolithography process onto a substrate, and measuring the deviation dimension of the monitor mark formed on the substrate to real-time monitor the focus of the photolithography process.

Abstract: A rectangular monobloc optical lens and a manufacturing method thereof are disclosed. A monobloc optical lens includes a rectangular surround and a central mirror-surface area. The rectangular surround is mounted inside a clipping part of a lens holder. The central mirror-surface area consists of a convex aspherical surface and a concave aspherical surface while the convex aspherical surface faces an image side and the concave aspherical surface faces an object side. The manufacturing method includes the steps of: cutting a sheet made from glass material into a plurality of rectangular sheet units; then setting the rectangular sheet unit into a mold for lens for hot pressing. Thereby, the manufacturing process is simplified and the cost is reduced. Moreover, the lens has high resolution and the volume of the lens is effectively reduced so as to increase the applications of the lens.