Patents by Inventor Chung-Hung Lin
Chung-Hung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200105431Abstract: A method for generating extreme ultraviolet (EUV) radiation includes introducing a fuel droplet; applying a first laser beam to strike the fuel droplet at a location to generate EUV radiation and form a movable debris of the fuel droplet; and forming an energy field proximal to the location of the first laser beam strike to trap the movable debris. An EUV radiation source includes a fuel droplet generator, a first laser, a collector and an energy field. The fuel droplet generator is configured to provide a fuel droplet. The first laser is configured to generate a first laser beam to strike the fuel droplet at a location to generate EUV radiation and form a movable debris. The collector is configured to reflect the EUV radiation. The energy field is configured to trap the movable debris, wherein the energy field is proximal to the location of the first laser beam strike.Type: ApplicationFiled: September 27, 2018Publication date: April 2, 2020Inventors: TZU HAN LIU, CHIH-WEI WEN, CHUNG-HUNG LIN
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Patent number: 10274817Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 ?m2 to 60000 ?m2. The second pattern has an area of 0.16 ?m2 to 60000 ?m2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.Type: GrantFiled: March 31, 2017Date of Patent: April 30, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ching-Hung Lai, Chih-Chung Huang, Chih-Chiang Tu, Chung-Hung Lin, Chi-Ming Tsai, Ming-Ho Tsai
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Publication number: 20180284595Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 ?m2 to 60000 ?m2. The second pattern has an area of 0.16 ?m2 to 60000 ?m2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.Type: ApplicationFiled: March 31, 2017Publication date: October 4, 2018Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ching-Hung Lai, Chih-Chung Huang, Chih-Chiang Tu, Chung-Hung Lin, Chi-Ming Tsai, Ming-Ho Tsai
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Patent number: 9312101Abstract: A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop point is reached.Type: GrantFiled: April 2, 2015Date of Patent: April 12, 2016Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chien-Lin Chen, Chih-Wei Wen, Chung-Hung Lin
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Publication number: 20150214006Abstract: A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop point is reached.Type: ApplicationFiled: April 2, 2015Publication date: July 30, 2015Inventors: Chien-Lin Chen, Chih-Wei Wen, Chung-Hung Lin
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Publication number: 20150146186Abstract: A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography mask, a radiation source configured to generate a radiation on the lithography mask, and a process gas source configured to release a process gas onto the lithography mask. The process as reacts with a surface portion of the lithography mask to repair the lithography mask. With the radiation treatment, residue process gas on the lithography mask is removed.Type: ApplicationFiled: January 29, 2015Publication date: May 28, 2015Inventors: Chien-Hsing Lu, Chung-Hung Lin, Chih-Wei Wen
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Patent number: 9040212Abstract: A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop point is reached.Type: GrantFiled: March 8, 2013Date of Patent: May 26, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chien-Lin Chen, Chih-Wei Wen, Chung-Hung Lin
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Patent number: 9030178Abstract: A power converter used in the current control circuit and control method, consisting of a converter, a voltage divider circuit, a current sampling circuit, a first gain circuit, a differential amplifier, a second gain circuit, a multiplier, a saw tooth wave generator, a modulation comparator, and a driver. The invention samples inductor current through the current sampling circuit and generates the current sense signal, then processes again. With the differential amplifier, it compares the feedback voltage from the voltage divider circuit with the reference voltage, and the results along a modulation comparator output a drive signal to control the duty cycle in order to avoid the generation of inrush current. The present invention avoids inrush current caused by the large drive signal and achieves a good response rate and better system stability.Type: GrantFiled: August 26, 2013Date of Patent: May 12, 2015Assignee: Luxmill Electronic Co., Ltd.Inventors: Yu-Cheng Chang, Mao-feng Lan, Chung-hung Lin
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Patent number: 9019085Abstract: An anti-disassembling device for an electronic product includes a case, a linear movement device, a circular movement device and an optical encoder. At least one retractable transmission member is connected to the case. The circular movement device is located in the case and has an encoding disk, which has multiple slots defined therethrough and teeth are defined in the periphery thereof. The at least one retractable transmission member is engaged with the teeth to rotate the encoding disk. The optical encoder has a lighting module which emits light beams through the slots of the encoding disk and a photosensitive module receives the light beams and sends a signal to the storage unit of the electronic product. The retractable device rotates when the electronic product is disassembled.Type: GrantFiled: February 25, 2013Date of Patent: April 28, 2015Assignee: National Cheng Kung UniversityInventor: Chung-Hung Lin
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Patent number: 8999610Abstract: A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography mask, a radiation source configured to generate a radiation on the lithography mask, and a process gas source configured to release a process gas onto the lithography mask. The process as reacts with a surface portion of the lithography mask to repair the lithography mask. With the radiation treatment, residue process gas on the lithography mask is removed.Type: GrantFiled: December 31, 2012Date of Patent: April 7, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chien-Hsing Lu, Chung-Hung Lin, Chih-Wei Wen
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Publication number: 20140255826Abstract: A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop point is reached.Type: ApplicationFiled: March 8, 2013Publication date: September 11, 2014Inventors: Chien-Lin Chen, Chih-Wei Wen, Chung-Hung Lin
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Publication number: 20140186750Abstract: A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography mask, a radiation source configured to generate a radiation on the lithography mask, and a process gas source configured to release a process gas onto the lithography mask. The process as reacts with a surface portion of the lithography mask to repair the lithography mask. With the radiation treatment, residue process gas on the lithography mask is removed.Type: ApplicationFiled: December 31, 2012Publication date: July 3, 2014Inventors: Chien-Hsing Lu, Chung-Hung Lin, Chih-Wei Wen
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Publication number: 20140145752Abstract: An anti-disassembling device for an electronic product includes a case, a linear movement device, a circular movement device and an optical encoder. At least one retractable transmission member is connected to the case. The circular movement device is located in the case and has an encoding disk, which has multiple slots defined therethrough and teeth are defined in the periphery thereof. The at least one retractable transmission member is engaged with the teeth to rotate the encoding disk. The optical encoder has a lighting module which emits light beams through the slots of the encoding disk and a photosensitive module receives the light beams and sends a signal to the storage unit of the electronic product. The retractable device rotates when the electronic product is disassembled.Type: ApplicationFiled: February 25, 2013Publication date: May 29, 2014Applicant: NATIONAL CHENG KUNG UNIVERSITYInventor: CHUNG-HUNG LIN
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Publication number: 20140119076Abstract: A power converter used in the current control circuit and control method, consisting of a converter, a voltage divider circuit, a current sampling circuit, a first gain circuit, a differential amplifier, a second gain circuit, a multiplier, a saw tooth wave generator, a modulation comparator, and a driver. The invention samples inductor current through the current sampling circuit and generates the current sense signal, then processes again. With the differential amplifier, it compares the feedback voltage from the voltage divider circuit with the reference voltage, and the results along a modulation comparator output a drive signal to control the duty cycle in order to avoid the generation of inrush current. The present invention avoids inrush current caused by the large drive signal and achieves a good response rate and better system stability.Type: ApplicationFiled: August 26, 2013Publication date: May 1, 2014Applicant: Luxmill Electronic Co., LtdInventors: Yu-Cheng CHANG, Mao-feng LAN, Chung-hung LIN
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Patent number: 8703364Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.Type: GrantFiled: May 7, 2012Date of Patent: April 22, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kun-Lung Hsieh, Chung-Hung Lin, Min-An Yang, Chih Wei Wen, Wu Hung Ko
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Publication number: 20130295494Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.Type: ApplicationFiled: May 7, 2012Publication date: November 7, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Kun-Lung Hsieh, Chung-Hung Lin, Min-An Yang, Chih Wei Wen, Wu Hung Ko
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Publication number: 20130166558Abstract: The present invention discloses a method and system for classifying articles. The present invention can be not only capable of distinguishing the type of the article but also novelty to generate an overview article automatically in accordance with the initial prepared keyword combination or articles. Furthermore, the overview article described above comprises a representative topic corresponding to the content of the initial prepared articles, wherein the representative topic is also able to identify the field of the articles. Accordingly, by the said overview article, the present invention is capable of decreasing the time required to understand the spirit and the technical aspect of the articles so as to solve the long lasted problem of the prior art.Type: ApplicationFiled: July 16, 2012Publication date: June 27, 2013Applicant: National Taiwan University of Science and TechnologyInventors: Hahn-Ming Lee, Shou-Wei Ho, Chung-Hung Lin, Ya-Huei Lin, Kuo-Ping Wu, Jerome Yeh
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Patent number: 8387938Abstract: An electronic device holder is revealed. The electronic device holder includes a base, a top cover and a support member. In use, a control member of the support member is pressed so that a locking shaft is moved inwards to push a shaft part moving into a pivot hole of an assembly block of the base. And a teeth part around the shaft part is released from teeth of a locking hole. Thus the support member can be rotated to the required position. Without any force applied to the control member, the teeth part of the shaft part is engaged with the teeth of the locking hole again due to the elastic member. Thus the support member is locked, the support block is then rotated to the required position and an electronic device is leaning against the support member. Therefore users can use electronics conveniently, without holding them in hands.Type: GrantFiled: April 29, 2011Date of Patent: March 5, 2013Assignee: Jow Tong Technology Co., Ltd.Inventor: Chung-Hung Lin
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Publication number: 20130053145Abstract: A supplementary game controller for tablet computers is revealed. The supplementary game controller for tablet computers includes a universal ball joint disposed between a fixing base and a connection base. The fixing base is fixed on a plane while the connection base is used to hold a tablet computer. Thereby the supplementary game controller is inclined at different angles or rotated in different directions through the universal ball joint while users hold the connection base so as to control characters and movements in games running on the tablet computer.Type: ApplicationFiled: August 30, 2011Publication date: February 28, 2013Applicant: JOW TONG TECHNOLOGY CO., LTD.Inventor: CHUNG-HUNG LIN
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Patent number: D695839Type: GrantFiled: October 5, 2012Date of Patent: December 17, 2013Assignee: Jow Tong Technology Co., Ltd.Inventor: Chung-Hung Lin