Patents by Inventor Da Liu

Da Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10108368
    Abstract: The system includes a plurality of storage volumes, a data synchronization module, a space-efficient storage module, and a heat data module. A second storage volume of the plurality of storage volumes includes a backup storage location for a first storage volume. The data synchronization module, coupled to the first storage volume and the second storage volume, provides a backup by synchronizing information from the first storage volume to the second storage volume during a synchronization event. The information includes data chunks, heat map data, and first metadata. The space-efficient storage module receives the information from the data synchronization module and allocates the information to the second storage volume in accordance with a space-efficient storage model. The heat data module reads the first metadata and the heat map data and adjusts a location of the data chunks in the second storage volume based on the heat map data.
    Type: Grant
    Filed: January 9, 2017
    Date of Patent: October 23, 2018
    Assignee: International Business Machines Corporation
    Inventors: Duo Chen, Min Fang, Da Liu, Jinyi Pu
  • Publication number: 20180293004
    Abstract: Embodiments include a load calculator, a workload analyzer, and a decision module. The load calculator generates an input/output (IO) record for an asset. The IO record includes a count of read operations and write operations corresponding to the asset from each of a plurality of sites. The workload analyzer collects the IO record and generates at least one of a write threshold and a read threshold. The decision module generates a request for at least one of a promotion and a copy of the asset in response to a determination that an operation has reached at least one of the write threshold and the read threshold for the asset.
    Type: Application
    Filed: April 6, 2017
    Publication date: October 11, 2018
    Inventors: Duo Chen, Min Fang, Da Liu, Jinyi Pu, Jiang Yu
  • Publication number: 20180196606
    Abstract: The system includes a plurality of storage volumes, a data synchronization module, a space-efficient storage module, and a heat data module. A second storage volume of the plurality of storage volumes includes a backup storage location for a first storage volume. The data synchronization module, coupled to the first storage volume and the second storage volume, provides a backup by synchronizing information from the first storage volume to the second storage volume during a synchronization event. The information includes data chunks, heat map data, and first metadata. The space-efficient storage module receives the information from the data synchronization module and allocates the information to the second storage volume in accordance with a space-efficient storage model. The heat data module reads the first metadata and the heat map data and adjusts a location of the data chunks in the second storage volume based on the heat map data.
    Type: Application
    Filed: January 9, 2017
    Publication date: July 12, 2018
    Inventors: Duo Chen, Min Fang, Da Liu, Jinyi Pu
  • Patent number: 9252233
    Abstract: The present disclosure relates to a method of forming a FinFET device having sidewalls spacers comprising an air gap that provides for a low dielectric constant, and an associated apparatus. In some embodiments, the method is performed by forming a fin of semiconductor material on a semiconductor substrate. A gate structure, having a gate dielectric layer and an overlying gate material layer, is formed at a position overlying the fin of semiconductor material. Sidewall spacers are formed at positions abutting opposing sides of the gate structure. Respective sidewall spacers have a first layer of insulating material abutting the gate structure and a second layer of insulating material separated from the first layer of insulating material by an air gap. By forming the FinFET device to have sidewall spacers with air gaps, the parasitic capacitance of the FinFET device and a corresponding RC time delay are decreased.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: February 2, 2016
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ru-Shang Hsiao, Rou-Han Kuo, Ting-Fu Lin, Sheng-Fu Yu, Tzung-Da Liu, Li-Yi Chen
  • Publication number: 20150366011
    Abstract: A controller includes current setting circuitry and voltage regulation circuitry. The current setting circuitry can selectively operate in different states that include a strobe state and an idle state. The current setting circuitry sets a current of a light source to a first current level in the strobe state such that the light source emits light, and sets the current to a second current level that is less than the first current level in the idle state such that the light source disables emission of light. The voltage regulation circuitry regulates an output voltage that powers the light source to be in a voltage range with the current at the first current level in the strobe state such that the light source emits light, and maintains the output voltage at a voltage level in the voltage range in the idle state.
    Type: Application
    Filed: June 13, 2014
    Publication date: December 17, 2015
    Inventors: Da LIU, Horia UDREA-SPENEA
  • Publication number: 20150263122
    Abstract: The present disclosure relates to a method of forming a FinFET device having sidewalls spacers comprising an air gap that provides for a low dielectric constant, and an associated apparatus. In some embodiments, the method is performed by forming a fin of semiconductor material on a semiconductor substrate. A gate structure, having a gate dielectric layer and an overlying gate material layer, is formed at a position overlying the fin of semiconductor material. Sidewall spacers are formed at positions abutting opposing sides of the gate structure. Respective sidewall spacers have a first layer of insulating material abutting the gate structure and a second layer of insulating material separated from the first layer of insulating material by an air gap. By forming the FinFET device to have sidewall spacers with air gaps, the parasitic capacitance of the FinFET device and a corresponding RC time delay are decreased.
    Type: Application
    Filed: March 12, 2014
    Publication date: September 17, 2015
    Inventors: Ru-Shang Hsiao, Rou-Han Kuo, Ting-Fu Lin, Sheng-Fu Yu, Tzung-Da Liu, Li-Yi Chen
  • Patent number: 8830159
    Abstract: A method according to one embodiment may include supplying power to an LED array having at least a first string of LEDs and a second string of LEDs coupled in parallel, each of the strings includes at least two LEDs. The method of this embodiment may also include comparing a first feedback signal from the first string of LEDs and a second feedback signal from the second string of LEDs. The first feedback signal is proportional to current in said first string of LEDs and said second feedback signal is proportional to current in said second string of LEDs. The method of this embodiment may also include controlling a voltage drop of at least the first string of LEDs to adjust the current of the first string of LEDs relative to the second string of LEDs, based on, at least in part, the comparing of the first and second feedback signals. Of course, many alternatives, variations, and modifications are possible without departing from this embodiment.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: September 9, 2014
    Assignee: O2Micro International Limited
    Inventors: Da Liu, Yung-Lin Lin
  • Patent number: 8711119
    Abstract: A display system includes a touch screen and a driving circuit. The touch screen includes touch sensors and a light source. A converter of the driving circuit receives an input voltage and provides a first output voltage to the light source according to a driving signal. A controller of the driving circuit converts the first output voltage to a second output voltage to drive the touch sensors, compares a voltage feedback signal indicating whether the second output voltage reaches a desired voltage level with a current feedback signal indicating whether a current through the light source reaches a desired current level, selects a feedback signal from the voltage feedback signal and the current feedback signal according to the comparison, and generates the driving signal to adjust the first output voltage according to the selected feedback signal.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: April 29, 2014
    Assignee: O2Micro, Inc.
    Inventors: Da Liu, Horia Udrea Spenea
  • Patent number: 8621907
    Abstract: A method for making a metallic casing includes providing an apparatus comprising a first mold and a second mold, placing a preform into a rectangular depression of first mold, moving the first mold to the second mold so that each sharp edge is substantially coplanar with a corresponding cutting edge, moving the first mold to the second mold so that the cutting edges are beyond the corresponding sharp edges of the first mold to complete a partial cut procedure, and moving the first mold to the second mold so that the secondary-cutting edge moves beyond the corresponding sharp edge and completely cuts the excess off the side wall.
    Type: Grant
    Filed: September 27, 2012
    Date of Patent: January 7, 2014
    Assignees: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd., Hong Hai Precision Industry Co., Ltd.
    Inventor: Zhi-Da Liu
  • Patent number: 8613770
    Abstract: An artificial cervical vertebrae composite joint is composed of two upper and lower fixing members disposed vertically symmetrically, a cervical vertebrae body member, and two connection members, the cervical vertebrae body member being connected between the fixing members through the connection members. The fixing members each have an L shape and comprise a front wing part and a base part. A locking screw hole is formed in the front wing part, and a skidproof groove provided with an inverted tooth and a protrusion is disposed on a middle portion of the base part. A bone grafting hole is transversely disposed through a middle portion of the cervical vertebrae body member, and two cavities are disposed on both upper and lower sides of the cervical vertebrae body member at an axial center of the cervical vertebrae body member to mount the connection members.
    Type: Grant
    Filed: July 19, 2010
    Date of Patent: December 24, 2013
    Inventors: Wei Lei, Baojun Han, Zixiang Wu, Da Liu, Yabo Yan, Jiangjun Zhou, Xiong Zhao, Suochao Fu
  • Patent number: RE45165
    Abstract: A method for forming a semiconductor device and a device made using the method are provided. In one example, the method includes forming a hard mask layer on a semiconductor substrate and patterning the hard mask layer to form multiple openings. The substrate is etched through the openings to form forming a plurality of trenches separating multiple semiconductor mesas. The trenches are partially filled with a dielectric material. The hard mask layer is removed and multiple-gate features are formed, with each multiple-gate feature being in contact with a top surface and sidewalls of at least one of the semiconductor mesas.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: September 30, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hung-Wei Chen, Tang-Xuan Zhong, Sheng-Da Liu, Chang-Yu Chang, Ping-Kun Wu, Chao-Hsiung Wang, Fu-Liang Yang
  • Patent number: RE45180
    Abstract: A method for forming a semiconductor device and a device made using the method are provided. In one example, the method includes forming a hard mask layer on a semiconductor substrate and patterning the hard mask layer to form multiple openings. The substrate is etched through the openings to form forming a plurality of trenches separating multiple semiconductor mesas. The trenches are partially filled with a dielectric material. The hard mask layer is removed and multiple-gate features are formed, with each multiple-gate feature being in contact with a top surface and sidewalls of at least one of the semiconductor mesas.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: October 7, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hung-Wei Chen, Tang-Xuan Zhong, Sheng-Da Liu, Chang-Yun Chang, Ping-Kun Wu, Chao-Hsiung Wang, Fu-Liang Yang
  • Patent number: RE45944
    Abstract: A method for forming a semiconductor device and a device made using the method are provided. In one example, the method includes forming a hard mask layer on a semiconductor substrate and patterning the hard mask layer to form multiple openings. The substrate is etched through the openings to form forming a plurality of trenches separating multiple semiconductor mesas. The trenches are partially filled with a dielectric material. The hard mask layer is removed and multiple-gate features are formed, with each multiple-gate feature being in contact with a top surface and sidewalls of at least one of the semiconductor mesas.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: March 22, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hung-Wei Chen, Tang-Xuang Zhong, Sheng-Da Liu, Chang-Yun Chang, Ping-Kun Wu, Chao-Hsiung Wang, Fu-Liang Yang
  • Patent number: D787013
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 16, 2017
    Assignee: Rapala VMC Corp.
    Inventors: Stephen Gibson, Jeremy Grayson, Meng Da Liu
  • Patent number: D787014
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 16, 2017
    Assignee: Rapala VMC Corp.
    Inventors: Stephen Gibson, Jeremy Grayson, Meng Da Liu
  • Patent number: D787015
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 16, 2017
    Assignee: Rapala VMC Corporation
    Inventors: Stephen Gibson, Jeremy Grayson, Meng Da Liu
  • Patent number: D803977
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: November 28, 2017
    Assignee: Rapala VMC Corporation
    Inventors: Jeremy Grayson, Meng Da Liu
  • Patent number: D803978
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: November 28, 2017
    Assignee: Rapala VMC Corporation
    Inventors: Jeremy Grayson, Meng Da Liu
  • Patent number: D803979
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: November 28, 2017
    Assignee: Rapala VMC Corporation
    Inventors: Jeremy Grayson, Meng Da Liu
  • Patent number: D835484
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: December 11, 2018
    Assignee: Rapala VMC Corporation
    Inventor: Meng Da Liu