Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

Abstract: Systems and methods for plasma processing are disclosed. A method includes applying pulsed power to a plasma processing chamber with an excitation source during a first processing step with a first duty cycle and applying, during the first processing step, an asymmetric periodic voltage waveform to a substrate support to produce a first plasma sheath voltage between a substrate and a plasma. Pulsed power is applied to the plasma processing chamber with the excitation source during a second processing step with a second duty cycle and during the second processing step, a different asymmetric periodic voltage waveform is applied to the substrate support to produce a different plasma sheath voltage between the substrate and the plasma.

Abstract: A magazine-based data storage library in connection with a disk drive-based archive storage system is described that essentially generates parity data for tape formatted data streams (stored to tape cartridges) that do not align by way of data blocks or file marks. Data streams intended for tape storage sent to tape cartridges are also sent to a disk drive storage system via an encoder where parity of the data streams can be generated. More specifically, the encoder digitally formats tape blocks and tape marks (as well as other tape formatted structure) in a digital stream of data that can be added to other encoded digital streams of data to generate parity. To reconstruct a specific tape cartridge from a tape set, the encoded data from each of the tapes in the tape set are subtracted from the parity data and the remaining encoded data is decoded and sent to a designated tape cartridge.

Abstract: A magazine-based data storage library in connection with a disk drive-based archive storage system is described that essentially generates parity data for tape formatted data streams (stored to tape cartridges) that do not align by way of data blocks or file marks. Data streams intended for tape storage sent to tape cartridges are also sent to a disk drive storage system via an encoder where parity of the data streams can be generated. More specifically, the encoder digitally formats tape blocks and tape marks (as well as other tape formatted structure) in a digital stream of data that can be added to other encoded digital streams of data to generate parity. To reconstruct a specific tape cartridge from a tape set, the encoded data from each of the tapes in the tape set are subtracted from the parity data and the remaining encoded data is decoded and sent to a designated tape cartridge.

Abstract: Systems and methods for plasma processing are disclosed. A method includes applying power to a plasma processing chamber during a first processing step and generating, during the first processing step, a first plasma sheath voltage between a substrate and a plasma. During a second processing step (that follows the first processing step), power is applied to the plasma processing chamber and a different plasma sheath voltage is applied between the substrate and the plasma.

Abstract: This disclosure describes systems, methods, and apparatus for controlling ion energy in a plasma processing chamber. In particular, a system for plasma processing includes a plasma processing chamber, a plasma source coupled to the plasma processing chamber, a plasma power supply coupled to the plasma source that is configured to apply power to the plasma processing chamber in periodic pulse envelopes to control a density of a plasma in the plasma processing chamber, and a support within the plasma processing chamber to support a substrate. A bias supply is configured to provide a modified periodic voltage function to the substrate support within each of the periodic pulse envelopes to control an energy of ions impacting the substrate support in the plasma processing chamber.

Abstract: A centralized server, such as in a cloud environment, is provided generally connected to a plurality of clients that independently maintain data that is also maintained in the centralized server. The centralized server possessing an authoritative Bloom filter series comprising at least a plurality of Bloom filters each with successive Bloom filter entries that periodically provide and update a copy of the authoritative Bloom filter series at each of the clients. Each client checks to see if a data file is present locally by searching for a corresponding Bloom filter entry in the copy of the Bloom filter series before seeking the data file in the centralized server.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheath(s) proximate to the bias electrodes.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

Abstract: Systems and methods for plasma processing are disclosed. A method includes applying power to a plasma processing chamber during a first processing step and generating, during the first processing step, a first plasma sheath voltage between a substrate and a plasma. During a second processing step (that follows the first processing step), power is applied to the plasma processing chamber and a different plasma sheath voltage is applied between the substrate and the plasma.

Abstract: Example methods and systems for computing a reaction time from an indexed event occurring in an indexed recording to a reaction signal are described. An example method includes receiving a sample of ambient content of a computing device, determining a position identification of the sample of ambient content into an indexed recording to which the sample of ambient content matches, based on the position identification, synchronizing display of content on a user interface of the computing device to the indexed recording, and computing the reaction time. The reaction signal is generated by the computing device and is indicative of a user's response to the indexed event.

Abstract: A truck assembly for roller skates or a skateboard including a base portion configured to be secured to an underside of a roller skate or skate board, an axle housing for receiving an axle, an axle, at least a first and second pins, at least a first bushing, wherein the axle is housed within the axle housing and the first bushing and the axle is captivity held within the axle housing and the at least a first and second pins are in engagement of the at least two pins with the axle.

Abstract: An impedance matching system includes an impedance matching network coupled between an alternating current (AC) generator and electrodes of a plasma chamber. The AC generator is configured to generate a multi-level pulse signal of cyclically recurring pulse intervals with differing amplitude levels. A controller or other device identifies each recurring pulse interval, and for each pulse interval, determines an impedance mis-match level between the AC generator and the electrodes, adjusts a configuration of the impedance matching network according to the determined impedance mis-match level, and stores information associated with the adjusted configuration.

Abstract: This disclosure describes systems, methods, and apparatuses for generating an ionizing electromagnetic field via a remote plasma source such that the field controllably extends through a field projection portion where the field attenuates, to a plasma processing portion where the field is attenuated but still strong enough to sustain a plasma. The plasma has a low voltage and RF energy and can be used for a variety of semiconductor and thin film processing operations including chamber cleaning via radical generation, etching, and deposition.

Abstract: This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.

Abstract: A truck assembly for roller skates or a skateboard including a base portion configured to be secured to an underside of a roller skate or skate board, an axle housing for receiving an axle, an axle, at least a first and second pins, at least a first bushing, wherein the axle is housed within the axle housing and the first bushing and the axle is captivity held within the axle housing and the at least a first and second pins are in engagement of the at least two pins with the axle.

Abstract: A pre-prosthetic training device is provided. The device provides an interim prosthetic device that aids in the standing, weight bearing, and balancing exercises during post-surgery rehabilitation therapy that are required before a prosthesis fitting. The device includes a residual limb support for receiving the residual limb of an amputee, an adjustable pylon for adjusting the height of the residual limb support, and a support base including a plurality of support legs for providing support to the pylon and residual limb support. The residual limb support includes a cushion having a recessed portion sized to receive the distal end of the residual limb of an amputee and for providing comfort and stability thereto. The residual limb support further includes an upper open end and a sidewall including a tapering portion that provides vertical and lateral access, respectively, of a residual limb into the residual limb support.

Abstract: Example methods and systems for computing a reaction time from an indexed event occurring in an indexed recording to a reaction signal are described. An example method includes receiving a sample of ambient content of a computing device, determining a position identification of the sample of ambient content into an indexed recording to which the sample of ambient content matches, based on the position identification, synchronizing display of content on a user interface of the computing device to the indexed recording, and computing the reaction time. The reaction signal is generated by the computing device and is indicative of a user's response to the indexed event.

Abstract: An optical system is provided for clinical diagnostics that include methods and apparatus for rapidly detecting and characterizing rare circulating cells such as, but not limited to, circulating tumor cells/circulating stems cells (CTC/CSCs) in a biological sample. The sample is processed for analyses, loaded onto a “capture zone” in the optical system where, and subjected to a two stage optical process for very rapid detection and detailed characterization of detected cells. The detected rare cells are characterized with regards to biomarker profiles using fluorescent tags or chromophores for detection and optical imaging. Isolation of the captured rare cells is anticipated for down-stream assessments including, but not limited to, DNA, RNA, proteomic analyses and culture.