Abstract: Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.

Abstract: This disclosure describes systems, methods, and apparatus for operating a plasma processing chamber. In particular, a periodic voltage function combined with an ion current compensation can be provided as a bias to a substrate support as a modified periodic voltage function. This in turn effects a DC bias on the surface of the substrate that controls an ion energy of ions incident on a surface of the substrate. A peak-to-peak voltage of the periodic voltage function can control the ion energy, while the ion current compensation can control a width of an ion energy distribution function of the ions. Measuring the modified periodic voltage function can provide a means to calculate an ion current in the plasma and a sheath capacitance of the plasma sheath. The ion energy distribution function can be tailored and multiple ion energy peaks can be generated, both via control of the modified periodic voltage function.

Abstract: Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate.

Abstract: This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

Abstract: This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

Abstract: This disclosure describes systems, methods, and apparatus for operating a plasma processing chamber. In particular, a periodic voltage function combined with an ion current compensation can be provided as a bias to a substrate support as a modified periodic voltage function. This in turn effects a DC bias on the surface of the substrate that controls an ion energy of ions incident on a surface of the substrate. A peak-to-peak voltage of the periodic voltage function can control the ion energy, while the ion current compensation can control a width of an ion energy distribution function of the ions. Measuring the modified periodic voltage function can provide a means to calculate an ion current in the plasma and a sheath capacitance of the plasma sheath. The ion energy distribution function can be tailored and multiple ion energy peaks can be generated, both via control of the modified periodic voltage function.

Abstract: A steam cleaner comprising a cleaning head; means for supplying steam to the cleaning head to be emitted thereby; means for supplying a cleaning agent to the cleaning head to be emitted thereby; and control means for controlling the emission of steam and cleaning agent by the cleaning head; wherein the control means is operable to cause or permit the emission of cleaning agent by the cleaning head while the emission of steam from the cleaning head is at least substantially prevented.

Abstract: A surface cleaning head for a steam cleaner, comprising a plurality of steam outlets spaced from one another on the cleaning head, for steam supplied from a steam generator, and a steam distributing device which receives the steam and supplies it to the outlets.

Abstract: An apparatus and associated methodology for a data storage system having a data storage space operably transferring user data via input/output (I/O) commands between the data storage system and another device. The data storage space includes a first memory device operably storing location information for a selected user data set corresponding to one of the I/O commands. The first memory also operably stores a first amount of the selected user data set. The data storage space also includes a second memory device different than the first memory device and operably storing a different second amount of the selected user data set. The data storage system has a controller that interleaves an entirety of the selected user data set from the first and second memory devices during execution of another of the I/O commands.

Abstract: Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement.

Abstract: An apparatus and associated methodology providing a data storage system including a memory having a first addressable storage space and a second differently addressable storage space. A controller selectively accesses stored instructions that when executed store a first amount of a user data set to the first addressable storage space and store a different second amount of the user data set to the second addressable storage space. The controller subsequently calculates an address increment between the stored first and second amounts, and then shifts one of the stored first and second amounts by the address increment.

Abstract: Apparatus and associated methodology contemplating a data storage system having a memory that includes a first addressable storage space and a second differently addressable storage space. A controller selectively accesses stored instructions that when executed transfer some user data sets with the first addressable storage space in accordance with a dense allocation of the first addressable storage space, and transfer other user data sets with the second addressable storage space in accordance with a sparse allocation of the second addressable storage space that allocates a predefined reserved storage capacity between adjacent stored non-sequential user data sets.

Abstract: Provided is a system and method for providing removable data storage elements as a cloud based storage system. More specifically, the method achieves this for at least one embodiment by receiving at least one generally random stream of data objects, each data object having at least one identifiable element. The method directs the selection of at least a first identifiable element. The method then orders the stream of data objects against the first identifiable element and disposes the data objects upon at least one of the removable data storage elements in accordance with the ordered stream of data objects. A system for performing the method is also disclosed.

Abstract: Provided is a system and method for a robotic storage system. The system includes at least a first and second portable data element and at least a first and second data read/write device, structured and arranged to read portable data storage elements. A repository is structured and arranged to store the first and second portable data storage elements. At least one robot is structured and arranged to move a selected data storage element between the repository and a selected data read/write device. The system includes a history of prior commands, each prior command executed by a prior path selected from a group of optional paths. A receiver is structured and arranged to receive a current command for the robotic storage system, and a director is structured and arranged to direct the robotic storage system based on the current command and the history. An associated method is also provided.

Abstract: Systems, methods, and Apparatus for controlling the spatial distribution of a plasma in a processing chamber are disclosed. An exemplary system includes a primary inductor disposed to excite the plasma when power is actively applied to the primary inductor; at least one secondary inductor located in proximity to the primary inductor such that substantially all current that passes through the secondary inductor results from mutual inductance through the plasma with the primary inductor. In addition, at least one terminating element is coupled to the at least one secondary inductor, the at least one terminating element affecting the current through the at least one secondary inductor so as to affect the spatial distribution of the plasma.

Abstract: This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

Abstract: An expandable modular interlocking pallet system comprises a plurality of elongated modules, each including a lattice array for supporting a load. The module includes a first side having two female tracks and a second side opposite the first having two complementary male tracts adapted to interlock with the female tracks of an adjacent module. The module also includes a slam latch nested in the module which may engage a striker positioned on an adjacent module. The striker allows for disassembly of the pallet system as desired. Passageways are provided in each module that allow forks of a lift truck or the like to move the interlocked pallet.

Abstract: Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high frequency instability oscillations are present in the plasma; and altering, based upon whether high or low frequency instability oscillations are present, an impedance of a load that is experienced by the power amplifier, the load experienced by the power amplifier including at least an impedance of the plasma.

Abstract: Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

Abstract: Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate.