Abstract: A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

Abstract: A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

Abstract: An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: The invention relates to an optical system that particularly allows an improved detection of signal light propagating from a light source (1) through a flat glass substrate (11). SC-modes of this signal light that would normally be totally internally reflected at the backside (10) of the substrate (11) are coupled out by a first diffractive optical element DOE (21). To map all signal light leaving the substrate (11) onto a single target location (51), a focusing lens (31) and a second DOE (41) are disposed in the optical path behind the substrate (11). The DOEs (21, 41) may for example be a ID sinusoidal grating or a 2D blaze grating. The optical system may particularly be applied in an investigation apparatus for detecting multiple spots of a fluorescent sample material.

Abstract: A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

Abstract: A radiation detection system (100) is described comprising a measurement region (104) in a measurement chamber adapted for receiving at least one sample (108) to be examined and adapted for receiving excitation radiation for impingement on the at least one sample (108) and for generating sample radiation. The radiation detection system (100) furthermore comprises at least one detector element (106) for detection of the generated sample radiation. The radiation detection system thereby is a front irradiation system, i.e. the excitation radiation is incident on a first side of the measurement region (104) in a measurement chamber and the at least one detector element (106) is positioned at a second side of the measurement region (104) in a measurement chamber, the second side being opposite to the first side with respect to the measurement region (104) in a measurement chamber, such that detection occurs at the side facing the first side.

Abstract: The present invention provides a luminescence sensor (20) comprising at least one chamber (22) and at least one optical filter formed by at least a first conductive grating (11), the at least first conductive grating (11) comprising a plurality of wires (12), wherein at least one of the wires (12) of the at least first conductive grating (11) is linked to a temperature control device for controlling the temperature of at least one chamber (22) in the sensor.

Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

Abstract: The invention relates to a method and an apparatus for the investigation of a sample material that is stored in the sample chamber (303) of a storage unit (300). A multi-spot generator MSG (100) and a transmission section (200) generate an array of sample light spots (501) within the sample chamber. Input light (504) that leaves the storage unit (300) in forward direction is mapped onto a CCD array (401) and measured as reference. Moreover, fluorescence light (500) that is stimulated in the sample chamber (303) is measured by a second CCD array which is disposed perpendicular to the optical path of the input light (504).

Abstract: A biosensor device (10) for detecting molecules (16) in an analyte (14) comprises a binding element (12) which can be brought into contact with the analyte (14) for binding the molecules (16) thereto. The binding element (12) is an optical waveguide (34) comprising a strip (36) on a first layer (38). Light (17) can be applied to the strip (36). The biosensor device (10) further comprises an optical detection system (22) for detecting luminescent light (20) emitted by the excited molecules (16).

Abstract: A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation. The source includes a chamber in which a plasma is generated, and a mirror configured to reflect radiation emitted by the plasma. The mirror includes a multi-layer structure that includes alternating Mo/Si layers. A boundary Mo layer or a boundary Si layer or a boundary diffusion barrier layer of the alternating layers forms a top layer of the mirror, the top layer facing inwardly with respect to the chamber. A hydrogen radical generator is configured to generate hydrogen radicals in the chamber. The radicals are configured to remove debris generated by the plasma from the mirror. A support is constructed and arranged to support a patterning device configured to pattern the radiation to form a patterned beam of radiation. A projection system is constructed and arranged to project the patterned beam of radiation onto a substrate.

Abstract: The present invention provide a qualitative or quantitative luminescence sensor, for example a bio sensor or chemical sensor, using sub-wavelength aperture or slit structures, i.e. using apertures or slit structures having a smallest dimension smaller than the wavelength of the excitation radiation in the medium that fills the aperture or slit structure. The invention furthermore provides a method for the detection of luminescence radiation generated by one or more luminophores present in aperture or slit structure in such a luminescence sensor.

Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Abstract: A detection system (100, 150, 180, 200, 220, 250) for detecting luminescence from at least one sample (108) when excited by incident excitation radiation. Detecting luminescence may allow to detect, for example, biological, chemical or bio-chemical particles. The detection system (100, 150, 180, 200, 220, 250) comprising at least one optical component (102) with at least a first surface (104). The first surface (104) of the at least one optical component (102) is located to internally reflect incident excitation radiation to create an evanescent field outside the at least one optical component (102) for exciting the at least one sample (108). The detection system also comprises at least one detector element (110) that is in direct contact with the at least one optical component (102) to detect the luminescence from at least one excited sample (108) through the at least one optical component (102).

Abstract: An integrated biosensing device detects emissions from a sample when illuminated. A photo detector (20) is adjacent a site for retaining the sample (40) or receiving excitation radiation for impingement on the sample (40). A reflector (10) deflects the illumination onto the sample site and substantially guides the excitation radiation away from the photo detector. By providing a reflector, a ratio of desired detection of emissions to unwanted detection of the illumination light can be improved. This can be achieved by a reduction in an amount of the illumination reaching the photo detector, and/or by an increase in the amount of illumination of the sample and thus in the amount of emissions reaching the detector. This can be achieved more cost effectively than by using a filter. The illumination can be from above or below if the substrate is transparent.

Abstract: The present invention proposes a sub-wavelength luminescence sensor, such as e.g. a luminescence biosensor or a luminescence chemical sensor, comprising at least two wire grids (1, 2) positioned perpendicular with respect to each other. The luminescence sensor, in which the excitation radiation is efficiently used and the luminescence radiation is efficiently detected, has an improved signal-to-noise ratio and a separated excitation and luminescence radiation.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.