Abstract: The invention relates to a method and an apparatus for the investigation of a sample material by multiple sample light spots (501) generated by evanescent waves. An array of source light spots (510) is generated by a multi-spot generator, e.g. a multi-mode interferometer (106), and mapped onto sample light spots (501) in a sample layer (302) by (micro-)lenses (202, 203) or by the Talbot effect. The input light (504) of the source light spots (510) is shaped such that all of it is totally internally reflected at the interface between a transparent carrier plate (301) and the sample layer (302). Thus the sample light spots (501) consist of evanescent waves only and are restricted to a limited volume. In a preferred application, fluorescence stimulated in the sample light spots (501) is detected with spatial resolution by a CCD array (401).

Abstract: An imaging apparatus is disclosed for combined temperature and luminescence spatial imaging of an object (1), such as a bio-array for detection of biological molecules. Light (5) is separated into a first (10) and a second (20) optical path, where the first optical path (10) guides infrared (IR), and the second optical path (20) guides luminescence light, preferably fluorescence light, from the object (1). Image intensifying means (30) converts infrared light (10a) in the first optical path into intensified light (10b), preferably visible light. Photo detection means (100) are arranged for spatial imaging of the object (1), the photo detection means being arranged for alternately receiving light from the first (10) and the second (20) optical path. Processing means (200) are capable of combining a temperature image (11) with a luminescence image (21) so as to obtain a combined image (25) of the object with a direct spatial correspondence between the two images.

Abstract: A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

Abstract: The present invention provides a luminescence sensor (2), such as e.g. a luminescence biosensor, comprising a multi-layer structure. The multi-layer structure comprises at least a first layer (2a) formed of a first material and a second layer (2b) formed of a second material. The first material has a first binding capacity towards luminophores and the second material has a second binding capacity towards luminophores, the first binding capacity being different from the second binding capacity. The luminescence sensor (2) according to the present invention shows a high sensitivity because it provides preferred binding sites for luminophores at locations where the combined excitation and detection efficiency is the highest.

Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Abstract: A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a hydrogen containing gas and a hydrogen radical source. The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals may reduce Sn oxides (if present) and my form volatile hydrides of Sn deposition and/or carbon deposition. In this way the cleaning arrangement can be used to clean optical elements from Sn and/or C deposition. The EUV source may be used as hydrogen radical source. An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.

Abstract: A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.

Abstract: A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.

Abstract: A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

Abstract: The invention relates to a device for optical excitation, in particular luminescent excitation of biomolecules (40) in a fluid sample, comprising a multiple wavelength generator which generates at least one array of spots (60) with different wavelengths at least one defined area of the device.

Abstract: A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.

Abstract: The present invention provides a sensor and a method for detecting an optically variable molecule (9) in a sample (3). The sensor comprises an excitation radiation source (1) for irradiating the sample (4) and exciting the optically variable molecule (9), thus generating a luminescence signal (7). The sensor furthermore comprises a modulation means (4) for modulating the excitation radiation beam (2) in a direction different from, preferably substantially perpendicular to, a scanning direction of the excitation radiation beam (2) over the sample (3). The method and sensor according to the invention lead to an improved signal-to-noise ratio by reducing and even minimising the background signal in the luminescence signal (7) and to an improved accuracy by minimising signals coming from false-positives.

Abstract: A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

Abstract: A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.

Abstract: The invention provides a bio chip device comprising at least one sample compartment and at least one light sensitive element, the at least one sample compartment being provided on a first side of the at least one light sensitive element, wherein incident light is provided incident from a second side opposite of the first side of the at least one light sensitive element. Further, the invention provides a method for the detection of fluorescent particles within at least one sample compartment of a bio chip device.

Abstract: A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.

Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.

Abstract: The present invention relates to a luminescence sensor (10), such as a luminescence biosensor or a luminescence chemical sensor, comprising at least one aperture (1) having a first lateral dimension larger than the diffraction limit of excitation radiation (3) in a medium the at least one aperture (1) is filled with and a second lateral dimension below the diffraction limit of excitation radiation (3) in a medium the at least one aperture (1) is filled with. The invention furthermore relates to a method for the detection of luminescence radiation (5), e.g. fluorescence radiation, generated by at least one optically variable molecule (2), e.g. fluorophore, in the at least one aperture (1). The excitation radiation (3) is preferably polarised to suppress the excitation radiation (3) in the apertures (1). The luminescence sensor (10) according to the present invention is able to detect relatively low concentrations of optically variable molecules (2), e.g. fluorophores.

Abstract: The invention relates to a device (1) for detection of excitation (110) using a multiple spot arrangement (60), in which a multiple spot generator (50) is matched to the multiple spot arrangement (60) in such a way that light (100) entering the multiple spot generator (50) will be guided to defined areas on the multiple spot arrangement (60).