Abstract: In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.

Abstract: An optical fiber cable comprising an optical fiber, and a jacketing layer including at least two or more layers of a jacketing inner layer and a jacketing outer layer formed in this order concentrically, wherein the jacketing layer comprises at least two or more layers of a jacketing inner layer and a jacketing outer layer formed in this order concentrically; a material constituting the jacketing inner layer is composed of a resin material having an oxygen permeability of 2.0 cc·20 ?m/(m2·day·atm) or less; a material constituting the jacketing outer layer comprises at least one selected from a polyolefin-based resin, a polybutylene terephthalate-based resin, and a fluorine-based resin containing no chlorine atom in its structure; and the following general formula (i) and (ii) are satisfied when an outer diameter of the optical fiber is denoted by A (?m), an outer diameter of the optical fiber cable is denoted by B (?m), and a thickness of the jacketing outer layer is denoted by c (?m): 900?A?1100??(i) 0.

Abstract: There is provided a plastic optical fiber including a core and at least one layer of a clad formed on an outer circumferential surface of the core, wherein a transmission band is 100 MHz or wider, as measured under conditions of a wavelength of 650 nm and a launch NA=0.65; and a transmission loss is 350 dB/km or less, as measured under conditions of a wavelength of 650 nm and a launch NA=0.1, after exposure to an environment of a temperature of 105° C. for 1000 hours.

Abstract: An optical fiber cable comprising an optical fiber, and a jacketing layer including at least two or more layers of a jacketing inner layer and a jacketing outer layer formed in this order concentrically, wherein the jacketing layer comprises at least two or more layers of a jacketing inner layer and a jacketing outer layer formed in this order concentrically; a material constituting the jacketing inner layer is composed of a resin material having an oxygen permeability of 2.0 cc·20 ?m/(m2·day·atm) or less; a material constituting the jacketing outer layer comprises at least one selected from a polyolefin-based resin, a polybutylene terephthalate-based resin, and a fluorine-based resin containing no chlorine atom in its structure; and the following general formula (i) and (ii) are satisfied when an outer diameter of the optical fiber is denoted by A (?m), an outer diameter of the optical fiber cable is denoted by B (?m), and a thickness of the jacketing outer layer is denoted by c (?m): 900?A?1100??(i) 0.

Abstract: The present invention provides a plastic optical fiber comprising a core and a sheath consisting of at least one layer, the plastic optical fiber having a transmission loss of 120 dB/km or less as measured by a 25 m-1 m cutback method under conditions of a wavelength of 525 nm and an excitation of NA=0.45, and satisfying either one of the following conditions when a thickness of the innermost sheath layer is 0.5 ?m to 4.5 ?m, an amount of foreign matter having a size of 2 ?m or greater contained in the innermost sheath layer is 2000/cm3 or less, or a size X (?m) of foreign matter contained in the innermost sheath layer and an amount Y of the foreign matter (number/cm3) satisfy formula (1) below: Y?1200 X e(?0.067×X) (1). Such optical fibers have a low transmission loss of green light (in particular, light having a wavelength of 525 nm), enabling longer distance communication.

Abstract: There is provided a plastic optical fiber including a core and at least one layer of a clad formed on an outer circumferential surface of the core, wherein a transmission band is 100 MHz or wider, as measured under conditions of a wavelength of 650 nm and a launch NA=0.65; and a transmission loss is 350 dB/km or less, as measured under conditions of a wavelength of 650 nm and a launch NA=0.1, after exposure to an environment of a temperature of 105° C. for 1000 hours.

Abstract: In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.

Abstract: The present invention provides a plastic optical fiber comprising a core and a sheath consisting of at least one layer, the plastic optical fiber having a transmission loss of 120 dB/km or less as measured by a 25 m-1 m cutback method under conditions of a wavelength of 525 nm and an excitation of NA=0.45, and satisfying either one of the following conditions when a thickness of the innermost sheath layer is 0.5 ?m to 4.5 ?m, an amount of foreign matter having a size of 2 ?m or greater contained in the innermost sheath layer is 2000/cm3 or less, or a size X (?m) of foreign matter contained in the innermost sheath layer and an amount Y of the foreign matter (number/cm3) satisfy formula (1) below: Y?1200 X e(?0.067×X) (1). Such optical fibers have a low transmission loss of green light (in particular, light having a wavelength of 525 nm), enabling longer distance communication.

Abstract: Provided is an optical fiber which has exceptional heat resistance and is highly safe. This optical fiber has a core, and a sheath of a least one layer around the outside circumference of the core, the sheath including a polymer that contains a repeating unit (A) derived from a fluoroalkyl (meth)acrylate having a specific structure.

Abstract: Provided is an optical fiber which has exceptional heat resistance and is highly safe. This optical fiber has a core, and a sheath of a least one layer around the outside circumference of the core, the sheath including a polymer that contains a repeating unit (A) derived from a fluoroalkyl (meth)acrylate having a specific structure.

Abstract: Provided is a multi-core optical fiber which is capable of achieving the same level of light receiving capacity as that of a single-core plastic optical fiber, while being reduced in bending loss. A multi-core optical fiber according to the present invention has a plurality of cores and sea portions that are formed around each core. This multi-core optical fiber satisfies at least condition (1) or condition (2) below: (Condition 1): The occupancy rate of the total cross-sectional area of cores is 80˜95% of the outer region in the cross section of a multicore optical fiber. (Condition 2): The occupancy rate of the total cross-sectional area of cores is 82˜93% of the cross section of a multicore optical fiber.

Abstract: A method for manufacturing a plastic optical fiber includes a treatment step for moist heat treatment of a plastic optical fiber with a relative humidity of 35-100% or hot water treatment thereof under conditions of a treatment temperature in a range of 15-57° C. and treatment time in a range of 5-5000 hours.

Abstract: A plasma processing apparatus includes a sample stage in a processing chamber in a vacuum container having a placement surface on which a wafer to be processed by using the plasma is placed, a discharge pump connected to a discharge port disposed below the sample stage, and an adjuster that adjusts the amount of discharged gas, in which a first process step of supplying a first processing gas from above the placement surface into the processing chamber and supplying a second processing gas from below the placement surface into the processing chamber to process the wafer by using the first processing gas and a second process step where the first processing gas and the second processing gas are reversed are repeatedly switched over therebetween, and the adjuster adjusts a pressure in the processing chamber to a predetermined value during the processing.

Abstract: Provided is a multi-core optical fiber which is capable of achieving the same level of light receiving capacity as that of a single-core plastic optical fiber, while being reduced in bending loss. A multi-core optical fiber according to the present invention has a plurality of cores and sea portions that are formed around each core. This multi-core optical fiber satisfies at least condition (1) or condition (2) below: (Condition 1): The occupancy rate of the total cross-sectional area of cores is 80˜95% of the outer region in the cross section of a multicore optical fiber. (Condition 2): The occupancy rate of the total cross-sectional area of cores is 82˜93% of the cross section of a multicore optical fiber.

Abstract: In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.

Abstract: A vacuum processing apparatus includes a robot connected to a vacuum container to carry a wafer on one of its two arms to or from a processing chamber; a unit to detect an amount of deviation of the wafer from a predetermined wafer mounting position on the arm that may occur when the robot carries the wafer into or out of the processing chamber; and an adjusting device to adjust the operation of the robot based on the detected amount of deviation. The adjusting device adjusts the robot operation based on the result of a teaching operation performed in advance. After being subjected to the initial teaching operation, the robot again undergoes a second teaching operation according to the information on the amount of wafer position deviation that is detected by moving the wafer in a predetermined transfer pattern, before the wafer processing is performed.

Abstract: A plasma processing apparatus includes a sample stage disposed at a lower part of a processing chamber, a bell jar made of an insulative material constituting an upper portion of a vacuum vessel, a coil antenna disposed outside and around the bell jar to which electric power is supplied so as to generate the plasma in a plasma generating space inside of the bell jar, and a Faraday shield mounted on the bell jar and disposed between an external surface of the bell jar and the coil antenna. A ring shaped member made of an electric conductive material is disposed inside of an inner surface of a ring portion of the processing chamber located below a skirt portion of the bell jar and constitutes a part of the processing chamber. The ring shaped member extends upwardly so as to cover a portion of an inner surface of the bell jar.

Abstract: A vacuum processing apparatus includes a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas, and a mass flow controller unit interposed between two of the processing chambers for supplying gas to the chambers.

Abstract: A vacuum processing apparatus includes a robot connected to a vacuum container to carry a wafer on one of its two arms to or from a processing chamber; a unit to detect an amount of deviation of the wafer from a predetermined wafer mounting position on the arm that may occur when the robot carries the wafer into or out of the processing chamber; and an adjusting device to adjust the operation of the robot based on the detected amount of deviation. The adjusting device adjusts the robot operation based on the result of a teaching operation performed in advance. After being subjected to the initial teaching operation, the robot again undergoes a second teaching operation according to the information on the amount of wafer position deviation that is detected by moving the wafer in a predetermined transfer pattern, before the wafer processing is performed.

Abstract: The invention provides a plasma processing apparatus and a method for purging the apparatus, capable of preventing damage of components caused by pressure difference during purging operation of a vacuum reactor, and capable of preventing residual processing gas from remaining in the vacuum reactor. Inert gas is introduced through an inert gas feed port 233 on a side wall of a depressurized processing chamber (V1) 226 of a plasma processing apparatus, and the interior of the processing chamber (V1) 226 is brought to predetermined pressure by the inert gas, and thereafter, the inert gas is supplied to processing gas supply paths 213 and 216 (V2) communicated to a plurality of through holes 224 for introducing processing gas, so as to introduce the inert gas through the plurality of through holes 224 into the processing chamber (V1) 226.