Abstract: An electrophoretic display device is constituted by a first substrate and a second substrate which are disposed with a spacing therebetween, a partition wall disposed in the spacing, electrophoretic particles sealed in a closed space defined by the first and second substrates and the partition wall, a first electrode disposed a side surface of the closed space, and a second electrode disposed at a bottom surface of the closed space. In the electrophoretic display device, a distribution state of the electrophoretic particles is changed to effect display, and the first electrode has an area substantially equal to or larger than an area of the second electrode.

Abstract: Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks.

Abstract: A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carrying out the wafer; and a heating plates 44, 45 provided in the heating chamber 4 such that the wafer W can be heated from both above and below. A cooling plate 3 is provided in the housing 20 located in the vicinity of the opening of the heating chamber 4, for cooling the wafer W after being heated by the heating plates 44, 45. Additionally, a carrying means is provided in the housing 20 for carrying the wafer W between an upper position of the cooling plate 3 and the interior of the heating chamber 4 such that a heat treatment for the wafer W can be performed with the wafer W being held in the heating chamber 4.

Abstract: A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

Abstract: A terminal fitting (10) is formed to be mountable into a resin housing (30). A metal lock (11) is formed by cutting and bending in a bottom plate (14) of the terminal fitting (10) and is resiliently engageable with an engaging portion (34) in the housing (30) to lock the terminal fitting (10). This metal lock (11) has a base (11A) in the form of a flat plate. An extended portion (11B) is at the leading end of the base (11A) and bulges out in thickness or width direction, thereby increasing an area of engagement with the engaging portion (34) when the terminal fitting (10) is pulled in withdrawing direction. Accordingly, the terminal fitting (10) has a terminal holding force enhanced by the presence of the extended portion (11B).

Abstract: A terminal fitting (10) is formed to be mountable into a resin housing (30). A metal lock (11) is formed by cutting and bending in a bottom plate (14) of the terminal fitting (10) and is resiliently engageable with an engaging portion (34) in the housing (30) to lock the terminal fitting (10). This metal lock (11) has a base (11A) in the form of a flat plate. An extended portion (11B) is at the leading end of the base (11A) and bulges out in thickness or width direction, thereby increasing an area of engagement with the engaging portion (34) when the terminal fitting (10) is pulled in withdrawing direction. Accordingly, the terminal fitting (10) has a terminal holding force enhanced by the presence of the extended portion (11B).

Abstract: A tab (20) has first and second plates (21, 22). A bulge (23) of the first plate (21) is spaced from the second plate (22). Supports (25) project from the bulge (23) and contact with the second plate (22). Thus, a sufficient strength is secured for the tab (20). The supports (25) are in contact with the second plate (22) at positions displaced toward side edges from the free ends (28a). Thus, there is no danger that the supports (25) will thrust themselves between the free ends (28a) to separate the free ends (28a) when the first plate (21) is pressed, thereby preventing the tab (20) from being deformed.

Abstract: A tab (20) has first and second plates (21, 22). A bulge (23) of the first plate (21) is spaced from the second plate (22). Supports (25) project from the bulge (23) and contact with the second plate (22). Thus, a sufficient strength is secured for the tab (20). The supports (25) are in contact with the second plate (22) at positions displaced toward side edges from the free ends (28a). Thus, there is no danger that the supports (25) will thrust themselves between the free ends (28a) to separate the free ends (28a) when the first plate (21) is pressed, thereby preventing the tab (20) from being deformed.

Abstract: A jewelry holder for holding a piece of jewelry having a tapered portion including a jewelry mount base on which the piece of jewelry is mounted, and a frame portion including plural lower frames extending from the jewelry mount base so as to surround the piece of jewelry and form a swing space in which the piece of jewelry is freely swingable, and plural upper frames joined to the lower frames. The jewelry mount base has a recess portion in which the tip portion of the tapered portion of the piece of jewelry is mounted, and the piece of jewelry is swingable in any direction in the jewelry holder with the tip portion thereof as the center of the swing motion.

Abstract: A liquid crystal display device, or more particularly, an active matrix type liquid crystal display device having a pixel electrode formed in a pixel field defined on one of two transparent substrates opposed to each other with a liquid crystal layer between them. The pixel electrode is overlapped a signal line, which is formed in a portion of the one transparent substrate coincident with a black matrix, with a dielectric between them. The width of the overlap is set to a value satisfying a condition that an electric field induced between the signal line and pixel electrode will not invade into the pixel field defined with the black matrix. Owing to the structure, inhomogeneous luminance caused by a source electrode of a thin film transistor can be avoided. Moreover, inhomogeneous luminance caused by a capacitive element can be avoided.

Abstract: A liquid crystal display device which is free of luminance irregularity includes, in each of pixels on a liquid-crystal-side surface of a substrate disposed in opposition to a liquid crystal, a thin film transistor to be driven by supply of a scanning signal from a gate signal line, a pixel electrode to be supplied with a video signal from a drain line via the thin film transistor, and a counter electrode which generates an electric field having a component parallel to the pixel electrode and the substrate. In the liquid crystal display device, a UXGA display area is constituted by an assembly of the pixels, and the scanning signal has a delay time set to 3.8 &mgr;s or less at the pixel in the display area that is located on a terminal side of the gate signal line which is opposite to an input side thereof.

Abstract: A movable mold is movable toward and away from a fixed mold so as to close and open the mold. The fixed mold includes an intermediate plate facing a movable-side mold plate. This intermediate plate has a retainer-molding recess which cooperates with the movable-side mold plate to form a retainer-molding cavity, and a core pin, which cooperates with a housing-molding recess to form a housing-molding cavity, is mounted on the intermediate plate. A retainer, molded in the molding cavity, is moved downward by an ejector pin into a position where the retainer is disposed coaxial with a housing. Then, the two molds are again closed together, so that the housing and the retainer are connected together, and then this assembled product is taken out.

Abstract: A connector is provided that retains a terminal fitting when a retainer is attached to a connector housing from the side. The connector housing has a cavity into which a terminal fitting is inserted and a retainer insertion hole. The retainer is attached to the connector housing from the side through the retainer insertion hole. The retainer insertion hole extends entirely through the connector housing and penetrates from opposing outer side walls of the connector housing. The retainer is displaced between a provisional engaging position and a complete engagement position in which the terminal fitting is locked. The retainer preferably has a same height as the height between the opposing outer side walls.

Abstract: A panel mount connector comprising male and female connector housings (10,20) is shown in FIG. 3. A lever arm (30) pivotally connected to the male connector housing (10) co-operates with pins on the female connector housing (20) to draw the housings (10,20) together, in use. A snap fit projection (18) enables the male connector housing (10) to be fitted to an aperture (H) in a panel (P). Sealing members (16,27) prevent the ingress of moisture.

Abstract: Under the condition that the stationary metallic mold and the movable metallic mold are closed, the housing is molded into a shape having the retainer insertion hole by the existence of the sliding mold. At same time, a retainer is also molded in the below portion. First, when only the rear metallic mold is opened, the core pin is withdrawn, and at the same time the sliding mold is withdrawn along the advancing and withdrawing passage in the longitudinal direction by the cam action of the angular pin, so that the molding portion is withdrawn from the retainer insertion hole. Successively, when the metallic mold is opened, the sliding mold is relatively drawn out to the front of the advancing and withdrawing passage together with the stationary metallic mold, and the advancing and withdrawing passage becomes open. Next, the auxiliary sliding mold is advanced, and the retainer held by the auxiliary sliding mold is inserted into the retainer insertion hole and temporarily assembled to the housing.

Abstract: An easily produced connector is provided with a partial engagement preventing function. A movable member 30 movably provided in a male connector housing along an engagement direction is biased by coil springs 40 toward a front end position with respect to the engagement direction. When the engagement is stopped when connector housings 10, 20 are partly engaged, the connector housings 10, 20 are separated away from each other by the forces of the coil springs 40, thereby informing an operator that the connector housings 10, 20 were partly engaged. The movable member 30 is formed with an engaging hole 31 which extends in a direction normal to its moving direction and is engageable with a lock arm 12 provided on the female connector housing 10.