Abstract: A package substrate has a dielectric layer and a redistribution metal layer. The dielectric layer has a first dielectric material and a second dielectric material. The first dielectric material is different than the second dielectric material. The second dielectric material may have a dielectric constant that is either greater than or less than the dielectric constant of the first dielectric material. The second dielectric may be selected based on a specific target application such as single-ended signal routing or serializer/deserializer (SERDES) routing.

Abstract: A package comprising a first substrate, a first integrated device coupled to the first substrate, and a second substrate, and a plurality of solder interconnects coupled to the first substrate and the second substrate. The first substrate comprises at least one first dielectric layer; a first plurality of interconnects, wherein the first plurality of interconnects include a first plurality of post interconnects; and a first solder resist layer coupled to a first surface of the first substrate. The second substrate comprises a first surface and a second surface; at least one second dielectric layer; a second plurality of interconnects, wherein the second plurality of interconnects comprises a second plurality of post interconnects; and a second solder resist layer coupled to the second surface of the second substrate. The second surface of the second substrate faces the first substrate. The second solder resist layer includes a cavity.

Abstract: A package that includes a substrate and an integrated device. The substrate includes at least one dielectric layer, a plurality of interconnects comprising a first material, and a plurality of surface interconnects coupled to the plurality of interconnects. The plurality of surface interconnects comprises a second material. A surface of the plurality of surface interconnects is planar with a surface of the substrate. The integrated device is coupled to the plurality of surface interconnects of the substrate through a plurality of pillar interconnects and a plurality of solder interconnects.

Abstract: Aspects disclosed herein include a device including a first antenna substrate including one or more antennas. The device also includes a metallization structure. The device also includes a first spacer disposed between the first antenna substrate and the metallization structure, configured to maintain a constant distance between the first antenna substrate and the metallization structure. The device also includes a first plurality of conductive elements, disposed within the first spacer, configured to electrically couple the first antenna substrate to the metallization structure. The device also includes where the first spacer is configured to enclose all the conductive elements, electrically coupled to the first antenna substrate, and is configured to form an air gap between the first antenna substrate and the metallization structure. The device also includes where the first plurality of conductive elements is separated by air in the air gap.

Abstract: Disclosed is a stack via structure in which a plurality of vias are stacked over each other. At least one via is a via that has a recess formed from a top surface thereof. Another via above the via is formed such that a bottom portion of the another via is in the recess of the via. In this way, no capture pad is needed between the via and the another via. Also, contact area between the via and the another via is enhanced.

Abstract: Integrated circuit (IC) packages employing added metal for embedded metal traces in an ETS-based substrate for reduced signal path impedance. An IC package includes a package substrate and an ETS metallization layer disposed on the package substrate. To mitigate or offset an increase in impedance in longer signal paths between die circuitry and the package substrate that can result in decreased signaling speed and/or increased signal loss, added metal interconnects are coupled to embedded metal traces in the ETS metallization layer. Thus, embedded metal traces of the ETS metallization layer coupled to signal/ground signal paths of the die are increased in metal surface area. Increasing metal surface area of embedded metal traces coupled to the signal/ground signal paths of a die increases capacitance of such signal/ground signal paths. Increasing capacitance of signal/ground signal paths decreases impedance of the signal/ground signal paths to mitigate or reduce signaling delay and/or loss.

Abstract: Multi-sided antenna modules employing antennas on multiple sides of a package substrate for enhanced antenna coverage, and related antenna module fabrication methods. The multi-sided antenna module includes an integrated circuit (IC) die(s) disposed on a first side of the package substrate. The multi-sided antenna module further includes first and second substrate antenna layers disposed on respective first and second sides of the package substrate. The first substrate antenna layer includes a first antenna(s) disposed on the first side of the package substrate adjacent to the IC die(s). The second substrate antenna layer includes a second antenna(s) disposed on the second side of the package substrate opposite of the first side of the package substrate. In this manner, the multi-sided antenna module, including antennas on multiple sides of the package substrate, provides antenna coverage that extends from both sides of the package substrate to provide multiple directions of coverage.

Abstract: Disclosed is an apparatus and methods for making same. The apparatus includes a first insulating layer, a first metal layer disposed on a surface of the first insulating layer, and a metallization structure embedded in the first insulating layer. The metallization structure occupies only a portion of a volume of the first insulating layer. The metallization structure has a line density greater than a line density of the first metal layer.

Abstract: Disclosed is an apparatus including a molded multi-die high density interconnect including: a bridge die having a first plurality of interconnects and second plurality of interconnects. The apparatus also includes a first die having a first plurality of contacts and a second plurality of contacts, where the second plurality of contacts is coupled to the first plurality of interconnects of the bridge die. The apparatus also includes a second die having a first plurality of contacts and a second plurality of contacts, where the second plurality of contacts is coupled to the second plurality of interconnects of the bridge die. The coupled second plurality of contacts and interconnects have a smaller height than the first plurality of contacts of the first die and second die.

Abstract: A device comprising a first package and a second package coupled to the first package. The first package includes a first substrate, at least one gradient interconnect structure coupled to the first substrate, and a first integrated device coupled to the first substrate. The second package includes a second substrate and a second integrated device coupled to the second substrate. The second substrate is coupled to the at least one gradient interconnect structure.

Abstract: A package that includes a second redistribution portion, a die coupled to the second redistribution portion, an encapsulation layer encapsulating the die, and a first redistribution portion coupled to the second redistribution portion. The first redistribution portion is located laterally to the die. The first redistribution portion is located over the second redistribution portion. The first redistribution portion and the second redistribution portion are configured to provide one or more electrical paths for the die.

Abstract: Split die IC packages employing a D2D interconnect structure in a die-substrate standoff cavity (i.e., cavity) to provide D2D connections, and related fabrication methods. To facilitate D2D communications between multiple dies in the split die IC package, the package substrate also includes a D2D interconnect structure (e.g., interconnect bridge) that contains D2D interconnects (e.g., metal interconnects) coupled to the multiple dies to provide D2D signal routing between the multiple dies. The D2D interconnect structure is disposed in a cavity that is formed in a die standoff area between the dies and the package substrate as a result of the die interconnects being disposed between the dies and the package substrate standing off the dies from the package substrate. The D2D interconnect structure can be provided in the cavity in the IC package outside of the package substrate to reserve more area in the package substrate for other interconnections.

Abstract: In an aspect, a semiconductor includes a substrate. The substrate includes a column comprising a conductive paste that passes through a plurality of metal layers, a resin sheath surrounding the column, a ground shield surrounding the resin sheath, and a plurality of sense lines. The plurality of sense lines include a first sense line that is connected to the column comprising the conductive paste and a second sense line that is connected to the ground shield. The resin comprises a dielectric material.

Abstract: A package comprising a substrate comprising a plurality of interconnects, a first integrated device coupled to the substrate, a second integrated device coupled to the substrate, and an interconnect device coupled to the substrate. The first integrated device, the second integrated device, the interconnect device and the substrate are configured to provide an electrical path for an electrical signal between the first integrated device and the second integrated device, that extends through at least the substrate, through the interconnect device and back through the substrate. The electrical path includes at least one interconnect that extends diagonally.

Abstract: Disclosed are apparatus comprising a substrate and techniques for fabricating the same. The substrate may include a first metal layer having signal interconnects on a first side of the substrate. A second metal layer may include ground plane portions on a second side of the substrate. Conductive channels may be formed in the substrate and coupled to the ground plane portions. The conductive channels are configured to extend the ground plane portions towards the signal interconnects to reduce a distance from individual signal interconnects to individual conductive channels. The distance may be in a range of seventy-five percent to fifty percent of a substrate thickness between the first metal layer and the second metal layer.

Abstract: A substrate that includes a core layer comprising a first surface and a second surface, a plurality of core interconnects located in the core layer, a high-density interconnect portion located in the core layer, a first dielectric layer coupled to the first surface of the core layer, a first plurality of interconnects located in the first dielectric layer, a second dielectric layer coupled to the second surface of the core layer, and a second plurality of interconnects located in the second dielectric layer. The high-density interconnect portion includes a first redistribution dielectric layer and a first plurality of high-density interconnects located in the first redistribution dielectric layer. The high-density interconnect portion may provide high-density interconnects.

Abstract: A substrate that includes a core layer comprising a first surface and a second surface, at least one first dielectric layer located over a first surface of the core layer, at least one second dielectric layer located over a second surface of the core layer, high-density interconnects located over a surface of the at least one second dielectric layer, interconnects located over the surface of the at least one second dielectric layer, and a solder resist layer located over the surface of the at least one second dielectric layer. A first portion of the solder resist layer that is touching the high-density interconnects includes a first thickness that is equal or less than a thickness of the high-density interconnects. A second portion of the solder resist layer that is touching the interconnects includes a second thickness that is greater than a thickness of the interconnects.

Abstract: A package that includes a substrate and an integrated device. The substrate includes a core portion, a first substrate portion and a second substrate portion. The core portion includes a core layer and core interconnects. The first substrate portion is coupled to the core portion. The first substrate portion includes at least one first dielectric layer coupled to the core layer, and a first plurality of interconnects located in the at least one first dielectric layer. The second substrate portion is coupled to the core portion. The second substrate includes at least one second dielectric layer coupled to the core layer, and a second plurality of interconnects located in the at least one second dielectric layer. The core portion and the second substrate portion include a cavity. The integrated device is coupled to the first substrate portion through the cavity of the second substrate portion and the core portion.

Abstract: A substrate that includes a core layer, at least one first dielectric layer located over a first surface of the core layer, at least one second dielectric layer located over a second surface of the core layer, a plurality of first interconnects located over a surface of the at least one first dielectric layer, a plurality of second interconnects located over the surface of the at least one first dielectric layer, a plurality of third interconnects located over the surface of the at least one first dielectric layer, and a solder resist layer located over the surface of the at least one second dielectric layer. The plurality of third interconnects and the plurality of second interconnects are co-planar to the plurality of first interconnects. The solder resist layer includes a first portion, a second portion, and a third portion.

Abstract: Some features pertain to a substrate that includes a first portion of the substrate including a first plurality of metal layers, a second portion of the substrate including a second plurality of metal layers, and a plurality of insulating layers configured to separate the first plurality of metal layers and the second plurality of metal layers. A first plurality of posts and a plurality of interconnects are coupled together such that the first plurality of posts and the plurality of interconnects couple the first portion of the substrate to the second portion of the substrate.