Abstract: Disclosed is a package and methods for making same. A package includes: a substrate having a first region comprising N number of metallization layers and a second region comprising M number of metallization layers, where M is less than N; a passive component located within the second region on a first surface of the substrate; and a die located within the second region on a second surface of the substrate opposite the first surface of the substrate, the die being electrically coupled to the passive component by at least one of the M number of metallization layers within the second region.

Abstract: A substrate that includes a core layer, at least one first dielectric layer located over a first surface of the core layer, at least one second dielectric layer located over a second surface of the core layer, a plurality of first interconnects located over a surface of the at least one first dielectric layer, a plurality of second interconnects located over the surface of the at least one first dielectric layer, a plurality of third interconnects located over the surface of the at least one first dielectric layer, and a solder resist layer located over the surface of the at least one second dielectric layer. The plurality of third interconnects and the plurality of second interconnects are co-planar to the plurality of first interconnects. The solder resist layer includes a first portion, a second portion, and a third portion.

Abstract: An integrated circuit (IC) package is described. The IC package includes a package substrate, composed of a substrate core, a first power rail on a first surface of the substrate core, and a second power rail on a second surface of the substrate core. The IC package includes a logic die supported by the second power rail on the second surface of the substrate core. The IC package includes passive devices within the substrate core. Each of the passive devices has a first terminal and a second terminal opposite the first terminal. The first terminal of each of the passive devices is directly coupled to the first power rail, and the second terminal of each of the plurality of the passive devices is directly coupled to the second power rail. The IC package includes package bumps on the second power rail on the second surface of the substrate core.

Abstract: An integrated circuit (IC) package is described. The IC package includes back-end-of-line layers on a substrate. The IC package also includes a nested interconnect structure on the back-end-of-line layers on the substrate. The nested interconnect structure is composed of an inner core pad and an outer ring pad in a concentric arrangement. The IC package further includes a redistribution layer on the nested interconnect structure. The IC package also includes an under bump metallization layer on the redistribution layer to support package balls.

Abstract: A substrate that includes at least one dielectric layer, a plurality of first interconnects located in the at least one dielectric layer, at least one photo-imageable dielectric layer coupled to the at least one dielectric layer, and a plurality of second interconnects located in the at least one photo-imageable dielectric layer. The plurality of second interconnects includes at least one pair of adjacent interconnects having a centroid to centroid distance that is less than a pitch between the pair of interconnects. The pair of adjacent interconnects may include a pair of adjacent via interconnects and/or a pair of pad interconnects. The substrate may include a coreless substrate or a cored substrate.

Abstract: Terminal connection routing on top of a substrate surface connects to component terminals to and from PMIC devices and provides a novel structure to connect surface mount technology (SMT) passive device terminals on an SMT layer (such as a Cu bar mesh) that uses the 3D space available near to components to lower resistance/lower inductive path and provides a shorter path, SIP form factor reduction, a component placement density increase, creates an additional PDN layer for connectivity and, if the routing is encapsulated in a mold, protects the metal in the connection from oxidation.

Abstract: A package comprising a substrate, an integrated device, and an interconnect structure. The substrate includes a first surface and a second surface. The substrate further includes a plurality of interconnects for providing at least one electrical connection to a board. The integrated device is coupled to the first surface of the substrate. The interconnect structure is coupled to the first surface of the substrate. The integrated device, the interconnect structure and the substrate are coupled together in such a way that when a first electrical signal travels between the integrated device and the board, the first electrical signal travels through at least the substrate, then through the interconnect structure and back through the substrate.

Abstract: A package that includes a substrate and an integrated device. The substrate includes a core portion, a first substrate portion and a second substrate portion. The core portion includes a core layer and core interconnects. The first substrate portion is coupled to the core portion. The first substrate portion includes at least one first dielectric layer coupled to the core layer, and a first plurality of interconnects located in the at least one first dielectric layer. The second substrate portion is coupled to the core portion. The second substrate includes at least one second dielectric layer coupled to the core layer, and a second plurality of interconnects located in the at least one second dielectric layer. The core portion and the second substrate portion include a cavity. The integrated device is coupled to the first substrate portion through the cavity of the second substrate portion and the core portion.

Abstract: A substrate that includes a core layer comprising a first surface and a second surface, at least one first dielectric layer located over a first surface of the core layer, at least one second dielectric layer located over a second surface of the core layer, high-density interconnects located over a surface of the at least one second dielectric layer, interconnects located over the surface of the at least one second dielectric layer, and a solder resist layer located over the surface of the at least one second dielectric layer. A first portion of the solder resist layer that is touching the high-density interconnects includes a first thickness that is equal or less than a thickness of the high-density interconnects. A second portion of the solder resist layer that is touching the interconnects includes a second thickness that is greater than a thickness of the interconnects.

Abstract: A substrate that includes at least one dielectric layer, a plurality of first interconnects located in the at least one dielectric layer, at least one photo-imageable dielectric layer coupled to the at least one dielectric layer, and a plurality of second interconnects located in the at least one photo-imageable dielectric layer. The plurality of second interconnects includes at least one pair of adjacent interconnects having a centroid to centroid distance that is less than a pitch between the pair of interconnects. The pair of adjacent interconnects may include a pair of adjacent via interconnects and/or a pair of pad interconnects. The substrate may include a coreless substrate or a cored substrate.

Abstract: Certain aspects of the present disclosure provide an asymmetric antenna structure. An example antenna device generally includes a first antenna element, a second antenna element, and a flexible coupling element asymmetrically positioned between surfaces of the first and second antenna elements and electrically coupling the first antenna element to the second antenna element.

Abstract: Disclosed is an apparatus and methods for making same. The apparatus includes a first insulating layer, a first metal layer disposed on a surface of the first insulating layer, and a metallization structure embedded in the first insulating layer. The metallization structure occupies only a portion of a volume of the first insulating layer. The metallization structure has a line density greater than a line density of the first metal layer.

Abstract: Examples herein include die to metallization structure connections that eliminate the solder joint to reduce the resistance and noise on the connection. In one example, a first die is attached to a metallization layer by a plurality of copper interconnections and a second is attached to the metallization layer opposite the first die through another plurality of copper interconnections. In this example, the copper interconnects may connect the respective die to a metallization structure in the metallization layer.

Abstract: An integrated circuit (IC) package is described. The IC package includes a die. The die including an active layer on a substrate and through substrate vias (TSVs) coupled to the active layer and extending through the substrate to a backside surface of the die. The IC package also includes integrated passive devices (IPDs) on the backside surface of the die and coupled to the active layer through the TSVs. The IC package further includes back-end-of-line (BEOL) layers on the active layer. The IC package also includes a metallization structure on the BEOL layers. The IC package also includes an under bump metallization layer on the metallization structure. The IC package further includes package bumps on the first under bump metallization layer.

Abstract: An integrated circuit (IC) package is described. The IC package includes a package substrate, composed of a substrate core, a first power rail on a first surface of the substrate core, and a second power rail on a second surface of the substrate core. The IC package includes a logic die supported by the second power rail on the second surface of the substrate core. The IC package includes passive devices within the substrate core. Each of the passive devices has a first terminal and a second terminal opposite the first terminal. The first terminal of each of the passive devices is directly coupled to the first power rail, and the second terminal of each of the plurality of the passive devices is directly coupled to the second power rail. The IC package includes package bumps on the second power rail on the second surface of the substrate core.

Abstract: Conventional package problems may be overcome with a hybrid metallization and laminate structure that avoids warpage problems and size reduction problems. One example structure may include a metallization structure directly attached to an active side of a logic die stack in a core substrate (on one or both sides of the substrate) with laminate layers built-up on top of the metallization structures for a symmetrical package structure.

Abstract: Integrated circuit (IC) packages employing split, double-sided IC metallization structures to facilitate a semiconductor die module employing stacked dice, and related fabrication methods are disclosed. Multiple IC dice in the IC package are stacked and bonded together in a back-to-back, top and bottom IC die configuration in an IC die module, which can minimize the height of the IC package. The metallization structure is split between separate top and bottom metallization structures adjacent to respective top and bottom surfaces of the IC die module to facilitate die-to-die and external electrical connections to the dice. The top and bottom metallization structures can be double-sided by exposing substrate interconnects on respective inner and outer surfaces for respective die and external electrical interconnections. In other aspects, a compression bond is included between the IC dice mounted together in a back-to-back configuration to further minimize the overall height of the IC package.

Abstract: A substrate that includes a core layer comprising a first surface and a second surface, a plurality of core interconnects located in the core layer, a high-density interconnect portion located in the core layer, a first dielectric layer coupled to the first surface of the core layer, a first plurality of interconnects located in the first dielectric layer, a second dielectric layer coupled to the second surface of the core layer, and a second plurality of interconnects located in the second dielectric layer. The high-density interconnect portion includes a first redistribution dielectric layer and a first plurality of high-density interconnects located in the first redistribution dielectric layer. The high-density interconnect portion may provide high-density interconnects.

Abstract: A semiconductor device includes a die having one or more trenches on a back side of the die. The semiconductor device also includes a layer of thermally conductive material deposited on the back side of the die to fill the one or more trenches to form one or more plated trenches. The size (e.g., surface area or thickness (Z-height)) or location of the plated trenches may be determined based on one or more heat generating elements such as logic devices (CPU or GPU, for example) on an active side of the die. The thermally conductive material, which may be a metal such as copper (Cu) or silver (Ag), has a heat dissipation coefficient that is greater than a heat dissipation coefficient of a substrate of the die.

Abstract: Various package configurations and methods of fabricating the same are disclosed. In some aspects, a package may include a core layer and a first layer directly attached to a first side of the core layer, where a first device is embedded in the first layer. A second layer can be directly attached to a second side of the core layer opposite the first side, where a second passive device is embedded in the second layer. A first build-up layer can be directly attached to the first layer opposite the core layer, and a second build-up layer can be directly attached to the second layer opposite the core layer.