Abstract: Methods for forming a thin film on an integrated circuit device including providing energy to reactants in a deposition chamber to activate the reactants. The activated reactants are then deposited on the substrate to form a thin film on the substrate. The reactants selected may be selectively activated so that different thin films are formed in a single chamber thereby reducing processing time.

Abstract: In a storage electrode of a semiconductor device, and a method of forming the same, the storage electrode includes an outer cylinder including a first outer cylindrical portion having a first outer diameter, and a second outer cylindrical portion that is formed on the first outer cylindrical portion and having a second outer diameter, which is less than the first outer diameter, the first and second outer cylindrical portions having substantially equal inner diameters, and an inner cylinder formed on inner surfaces of the outer cylinder.

Abstract: Methods for forming a thin film on an integrated circuit device including providing energy to reactants in a deposition chamber to activate the reactants. The activated reactants are then deposited on the substrate to form a thin film on the substrate. The reactants selected may be selectively activated so that different thin films are formed in a single chamber thereby reducing processing time.

Abstract: A capacitor of a semiconductor device includes a cylinder type capacitor lower electrode, a dielectric layer, and an upper electrode. The upper electrode includes a metallic layer on the dielectric layer and a doped polySi1-xGex layer stacked on the metallic layer. Methods of forming these capacitors also are provided.

Abstract: The present invention relates to a new retinyl retinoate, a process for preparing same, a new intermediate which is useful for preparing same, and a cosmetic composition comprising the retinyl retinoate as the active ingredient.

Abstract: The present invention relates to a novel pyrrolo[3,2-c]quinoline derivatives containing haloalkoxy group, represented by Formula I, their pharmaceutically acceptable salts; process for preparation thereof; and pharmaceutical composition thereof for treating gastric ulcer. ##STR1## in which R.sub.1 is haloalkoxy group of C.sub.1 -C.sub.6 including trifluoromethoxy, difluoromethoxy and trifluoroethoxy group.R.sub.2 and R.sub.3, which are the same or different, are each hydrogen, halogen, hydroxy, benzyloxy, alkyl group of C.sub.1 -C.sub.6, alkoxy group of C.sub.1 -C.sub.6.A is --CH.sub.2 --CH.sub.2 -- or --CH.dbd.CH--, andR.sub.4 is hydrogen, halogen, amino, alkylamino group of C.sub.1 -C.sub.6, and NH(CH.sub.2).sub.n OH in which n is 1-6. Pyrrolo[3,2-c]quinoline derivatives having haloalkoxy group, and their pharmaceutically acceptable salts, which reversibly inhibit gastric acid secretion of mammal, are usefully utilized for gastric ulcer therapeutics.