Abstract: A method of detecting an organic residue is provided. The method comprises a step of bringing a liquid A into contact with a surface of a base material; a step of measuring the contact angle (i) of a liquid B on the surface with which the liquid A came into contact; a step of heating and drying the base material; a step of measuring the contact angle (ii) of the liquid B on the dried surface; and a step of comparing the contact angle (i) with the contact angle (ii).

Abstract: A method of detecting an organic residue is provided. The method comprises a step of bringing a liquid A into contact with a surface of a base material; a step of measuring the contact angle (i) of a liquid B on the surface with which the liquid A came into contact; a step of heating and drying the base material; a step of measuring the contact angle (ii) of the liquid B on the dried surface; and a step of comparing the contact angle (i) with the contact angle (ii).

Abstract: A method for producing a liquid ejection head including an ejection surface having a cured product of a negative photosensitive resin composition includes the steps of applying the negative photosensitive resin composition to form a coating film, subjecting the coating film to exposure, and after the step of subjecting the coating film to exposure, performing heating at 120° C. or higher, in which the negative photosensitive resin composition contains a polymer (A) containing a unit originating from an epoxy group-containing acrylic ester and at least one selected from a unit originating from acrylic acid and a unit originating from an acrylic ester capable of being deprotected at 120° C. or higher.

Abstract: A photosensitive negative resin composition including (a) an epoxy-group-containing compound, (b) a first onium salt including a cation moiety structure represented by formula (b1) and an anion moiety structure represented by formula (b2), and (c) a second onium salt including a cation moiety structure represented by formula (c1) and an anion moiety structure represented by formula (c2).

Abstract: Provided is a liquid-ejecting head, including a member having opened therein an ejection orifice configured to eject a liquid, in which the liquid-ejecting head has, on a side being positioned on the member and having opened therein the ejection orifice, a cured layer of a mixture containing: (a) a condensate of hydrolyzable silane compounds containing a hydrolyzable silane compound having 20 or more fluorine atoms and a hydrolyzable silane compound having a cationically polymerizable group; (b) a fluorine atom-containing nonionic surfactant; and (c) an epoxy resin.

Abstract: Provided is a liquid-ejecting head, including a member having opened therein an ejection orifice configured to eject a liquid, in which the liquid-ejecting head has, on a side being positioned on the member and having opened therein the ejection orifice, a cured layer of a mixture containing: (a) a condensate of hydrolyzable silane compounds containing a hydrolyzable silane compound having 20 or more fluorine atoms and a hydrolyzable silane compound having a cationically polymerizable group; (b) a fluorine atom-containing nonionic surfactant; and (c) an epoxy resin.

Abstract: A photosensitive negative resin composition containing a resin (a) having at least three cyclohexene oxide skeletons in its molecule, an onium salt (b) composed of a cation moiety structure represented by the formula b1 defined in the description and an anion moiety structure represented by the formula b2 defined in the description, a silane compound (c) and an organic solvent (d). A fine structure using the resin composition, a production process of the fine structure and a liquid ejection head.

Abstract: A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin that exhibits an increased solubility in an alkali developer when acted on by an acid, and (B) at least two types of sulfonic acid generators that generate a sulfonic acid when exposed to actinic rays or radiation, wherein the two types of sulfonic acid generators (B) consist of sulfonic acid generators (B1) and (B2) satisfying the following requirements, namely the sulfonic acid generator (B1) generates a sulfonic acid composed of 9 to 20 elements with an acid strength (pKa) satisfying the relationship pKa<?3.50, and the sulfonic acid generator (B2) generates an acid composed of 17 or more elements with an acid strength (pKa) satisfying the relationship ?2.00>pKa??3.50, provided that no hydrogen atom is included in the number of elements of the generated acids.

Abstract: The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).

Abstract: A print head includes an energy generating element, a chamber for accommodating liquid, and an ejection opening for ejecting liquid from the chamber, thus applying the energy to the liquid in the chamber from the energy generating element to eject the liquid from the ejection opening, wherein the ejection opening includes at least two projections convex to an inside of the ejection opening in a cross section perpendicular to a liquid ejecting direction and has a tapered angle ?1 in regard to the liquid ejecting direction, enabling a meniscus of the liquid to be formed therebetween at the liquid ejecting time, and an outer edge portion has a tapered angle ?2 in regard to the liquid ejecting direction, wherein the tapered angles ?1 and ?2 are defined to meet a formula of 0°??1?10° and a formula of ?2>?1.

Abstract: A photosensitive negative resin composition containing a resin (a) having at least three cyclohexene oxide skeletons in its molecule, an onium salt (b) composed of a cation moiety structure represented by the formula b1 defined in the description and an anion moiety structure represented by the formula b2 defined in the description, a silane compound (c) and an organic solvent (d). A fine structure using the resin composition, a production process of the fine structure and a liquid ejection head.

Abstract: A photosensitive negative resin composition including (a) an epoxy-group-containing compound, (b) a first onium salt including a cation moiety structure represented by formula (b1) and an anion moiety structure represented by formula (b2), and (c) a second onium salt including a cation moiety structure represented by formula (c1) and an anion moiety structure represented by formula (c2).

Abstract: A liquid ejection head is manufactured by forming a dent representing a substantially spherical profile so as to include a position for forming an ejection port on a surface of a photosensitive resin layer, then forming a latent image of the ejection port in the dent by an exposure treatment using a projection lens system, and developing the latent image. The center of the top surface of the latent image is shifted to the incoming side of the beam of exposure light from the lowest point of the dent.

Abstract: A print head includes an energy generating element, a chamber for accommodating liquid, and an ejection opening for ejecting liquid from the chamber, thus applying the energy to the liquid in the chamber from the energy generating element to eject the liquid from the ejection opening, wherein the ejection opening includes at least two projections convex to an inside of the ejection opening in a cross section perpendicular to a liquid ejecting direction and has a tapered angle ?1 in regard to the liquid ejecting direction, enabling a meniscus of the liquid to be formed therebetween at the liquid ejecting time, and an outer edge portion has a tapered angle ?2 in regard to the liquid ejecting direction, wherein the tapered angles ?1 and ?2 are defined to meet a formula of 0°??1?10° and a formula of ?2>?1.

Abstract: A liquid ejection head is manufactured by forming a dent representing a substantially spherical profile so as to include a position for forming an ejection port on a surface of a photosensitive resin layer, then forming a latent image of the ejection port in the dent by an exposure treatment using a projection lens system, and developing the latent image. The center of the top surface of the latent image is shifted to the incoming side of the beam of exposure light from the lowest point of the dent.

Abstract: The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).

Abstract: A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

Abstract: A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

Abstract: A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.