Patents by Inventor Jianhua Zhou
Jianhua Zhou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11031262Abstract: Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.Type: GrantFiled: April 2, 2020Date of Patent: June 8, 2021Assignee: Applied Materials, Inc.Inventors: Saptarshi Basu, Jeongmin Lee, Paul Connors, Dale R. Du Bois, Prashant Kumar Kulshreshtha, Karthik Thimmavajjula Narasimha, Brett Berens, Kalyanjit Ghosh, Jianhua Zhou, Ganesh Balasubramanian, Kwangduk Douglas Lee, Juan Carlos Rocha-Alvarez, Hiroyuki Ogiso, Liliya Krivulina, Rick Gilbert, Mohsin Waqar, Venkatanarayana Shankaramurthy, Hari K. Ponnekanti
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Patent number: 11022700Abstract: The present application provides a method for navigation and positioning of a receiver, including: receiving basic broadcast messages and correction parameters of a plurality of satellites, and establishing a pseudorange observation equation and a carrier-phase observation equation corresponding to each of satellites respectively; correcting the pseudorange observation equation and the carrier-phase observation equation using the received correction parameters to obtain the corrected pseudorange observation equation and the corrected carrier-phase observation equation; constructing a first observation according to the corrected pseudorange observation equation and the corrected carrier-phase observation equation; constructing a second observation according to the corrected pseudorange observation equation and the corrected carrier-phase observation equation; and jointly solving the obtained first observations and second observations of the plurality of satellites to obtain anoperation result of user positioniType: GrantFiled: December 17, 2018Date of Patent: June 1, 2021Assignees: Shanghai Astronomical Observatory, Chinese Academy, ComNav Technology Ltd.Inventors: Junping Chen, Jianhua Zhou, Yongquan Wang, He Zhao
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Patent number: 11002443Abstract: A lighting system includes a lamp that is configured to illuminate. The lamp is coupled to a fixture. A heat bridge is made of a metallic material and is configured to contact the lamp and the fixture, conduct heat from the lamp to the fixture, and deform in response to at least one governing condition.Type: GrantFiled: November 21, 2018Date of Patent: May 11, 2021Assignee: HONEYWELL INTERNATIONAL INC.Inventors: Jianhua Zhou, Rui Tong
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Publication number: 20210111000Abstract: Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.Type: ApplicationFiled: November 30, 2020Publication date: April 15, 2021Inventors: Zheng John Ye, Abdul Aziz Khaja, Amit Kumar Bansal, Kwangduk Douglas Lee, Xing Lin, Jianhua Zhou, Addepalli Sai Susmita, Juan Carlos Rocha-Alvarez
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Patent number: 10971389Abstract: A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.Type: GrantFiled: October 1, 2018Date of Patent: April 6, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Xing Lin, Bozhi Yang, Jianhua Zhou, Dale R. Dubois, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan
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Patent number: 10950477Abstract: Embodiments of the present disclosure provide an improved electrostatic chuck for supporting a substrate. The electrostatic chuck comprises a chuck body coupled to a support stem, the chuck body having a substrate supporting surface, a plurality of tabs projecting from the substrate supporting surface of the chuck body, wherein the tabs are disposed around the circumference of the chuck body, an electrode embedded within the chuck body, the electrode extending radially from a center of the chuck body to a region beyond the plurality of tabs, and an RF power source coupled to the electrode through a first electrical connection.Type: GrantFiled: July 18, 2016Date of Patent: March 16, 2021Assignee: Applied Materials, Inc.Inventors: Xing Lin, Jianhua Zhou, Zheng John Ye, Jian Chen, Juan Carlos Rocha-Alvarez
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Patent number: 10928520Abstract: The present application provides a satellite positioning method and a satellite positioning system. The system includes a satellite, a base station, an observation station. The observation station is provided with a monitoring terminal and a correction parameters information generating apparatus, the monitoring terminal receiving observation data transmitted from the satellite; the correction parameters information generating apparatus generating a correction parameters based on the observation data, the correction parameters being transmitted to the base station.Type: GrantFiled: December 11, 2018Date of Patent: February 23, 2021Assignees: Shanghai Astronomical Observatory, Chinese Academy of SciencesInventors: Jianhua Zhou, Junping Chen, Bo Tang, Yize Zhang, Yueling Cao
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Patent number: 10910238Abstract: Implementations of the disclosure generally relate to a semiconductor processing chamber and, more specifically, a heated support pedestal for a semiconductor processing chamber. In one implementation, a pedestal assembly is disclosed and includes a substrate support comprising a dielectric material and having a support surface for receiving a substrate, a resistive heater encapsulated within the substrate support, a hollow shaft coupled to a support member of the substrate support at a first end of the shaft, and a thermally conductive material disposed at an interface between the support member and the first end of the shaft.Type: GrantFiled: September 13, 2017Date of Patent: February 2, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Kaushik Alayavalli, Ajit Balakrishna, Sanjeev Baluja, Amit Kumar Bansal, Matthew James Busche, Juan Carlos Rocha-Alvarez, Swaminathan T. Srinivasan, Tejas Ulavi, Jianhua Zhou
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Patent number: 10910227Abstract: An apparatus for plasma processing a substrate is provided. The apparatus comprises a processing chamber, a substrate support disposed in the processing chamber, and a lid assembly coupled to the processing chamber. The lid assembly comprises a conductive gas distributor coupled to a power source. A tuning electrode may be disposed between the conductive gas distributor and the chamber body for adjusting a ground pathway of the plasma. A second tuning electrode may be coupled to the substrate support, and a bias electrode may also be coupled to the substrate support.Type: GrantFiled: November 13, 2018Date of Patent: February 2, 2021Assignee: Applied Materials, Inc.Inventors: Juan Carlos Rocha-Alvarez, Amit Kumar Bansal, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan, Mohamad A. Ayoub, Jian J. Chen
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Patent number: 10883174Abstract: Embodiments of the present disclosure generally provide apparatus and methods for a gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising a mounting plate, the mounting plate comprising a hub, a plurality of curved spokes extending from the hub in a radial direction, a gusset portion coupled between the hub and each of the curved spokes, each of the gusset portions having a convex curve disposed in an axial direction, and one or more mounting holes coupled to the curved spokes.Type: GrantFiled: November 27, 2018Date of Patent: January 5, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Allen K. Lau, Hsiang An, Lai Zhao, Jianhua Zhou, Robin L. Tiner
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Patent number: 10879041Abstract: Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.Type: GrantFiled: July 19, 2016Date of Patent: December 29, 2020Assignee: Applied Materials, Inc.Inventors: Zheng John Ye, Abdul Aziz Khaja, Amit Kumar Bansal, Kwangduk Douglas Lee, Xing Lin, Jianhua Zhou, Addepalli Sai Susmita, Juan Carlos Rocha-Alvarez
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Publication number: 20200399756Abstract: A method of processing a substrate according to a PECVD process is described. Temperature profile of the substrate is adjusted to change deposition rate profile across the substrate. Plasma density profile is adjusted to change deposition rate profile across the substrate. Chamber surfaces exposed to the plasma are heated to improve plasma density uniformity and reduce formation of low quality deposits on chamber surfaces. In situ metrology may be used to monitor progress of a deposition process and trigger control actions involving substrate temperature profile, plasma density profile, pressure, temperature, and flow of reactants.Type: ApplicationFiled: September 3, 2020Publication date: December 24, 2020Inventors: Nagarajan RAJAGOPALAN, Xinhai HAN, Michael Wenyoung TSIANG, Masaki OGATA, Zhijun JIANG, Juan Carlos ROCHA-ALVAREZ, Thomas NOWAK, Jianhua ZHOU, Ramprakash SANKARAKRISHNAN, Amit Kumar BANSAL, Jeongmin LEE, Todd EGAN, Edward BUDIARTO, Dmitriy PANASYUK, Terrance Y. LEE, Jian J. CHEN, Mohamad A. AYOUB, Heung Lak PARK, Patrick REILLY, Shahid SHAIKH, Bok Hoen KIM, Sergey STARIK, Ganesh BALASUBRAMANIAN
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Publication number: 20200382740Abstract: A mini LED television control system and method to reduce loss includes a power supply used for supplying power to a backlight board after a voltage is adjusted; a control board connected to the power supply, the control board including an FPGA used for detecting a current value and controlling a power supply output voltage, an analog-to-digital conversion chip used for collecting the voltages of sampling circuits, and a plurality of sampling circuits connected to a plurality of light boards and used for collecting voltages of the light boards; constant current ICs disposed on the light boards and used for providing light bar voltages and sending brightness information; and a mainboard connected to the control board and used for enabling and synchronizing backlight brightness signals. The control board converts brightness information sent by the mainboard and then sends the information to the constant current ICs on corresponding light boards.Type: ApplicationFiled: April 10, 2019Publication date: December 3, 2020Applicant: SHENZHEN SKYWORTH-RGB ELECTRONIC CO., LTDInventors: Jianhua ZHOU, Xiyong SUN
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Publication number: 20200366092Abstract: A method is for analyzing the correlation between different line loss actions, which records, for each individual to which line loss actions occur, all the line loss actions that occur to the individual; and counts, based on two categorization manners: by individual and by line loss action, line loss actions recorded in the database, to obtain line loss action counting results corresponding to respective categorization manners; then, based on the two counting results, collects respective multi-line loss action sequences; and acquires probability data as a data source for probability calculation, to obtain line loss action occurrence conditional probabilities for different line loss actions, so that a targeted a targeted loss reduction plan can be formulated.Type: ApplicationFiled: May 14, 2020Publication date: November 19, 2020Applicant: University of Electronic Science and Technology of ChinaInventors: Jian LI, Qi HUANG, Haotian CHANG, Weihao HU, Dongsheng CAI, Zhenyuan ZHANG, Jianbo YI, Jianhua ZHOU, Zhibin DENG, Xiaofeng HU
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Patent number: 10829244Abstract: A lighting device for a vehicle. The lighting device includes an LED having a central axis. light distribution of light emitted by the LED is substantially symmetric about the central axis. The lighting device also includes a reflector for reflecting at least a portion of the emitted light. The reflector is positioned relative to the LED such that a combined light distribution of the emitted light and reflected light is not symmetric about the central axis and a maximum light intensity direction of the combined light distribution of the emitted light and the reflected light is angled with respect to the central axis. The position of the reflector relative to the light-emitting semiconductor device is adjustable such that an adjustment to the position of the reflector changes a direction of the maximum light intensity direction of the combined light distribution.Type: GrantFiled: February 8, 2018Date of Patent: November 10, 2020Assignee: HONEYWELL INTERNATIONAL INC.Inventors: Jianhua Zhou, Rui Tong
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Patent number: 10811301Abstract: A method and apparatus for a pedestal is provided. In one embodiment, the pedestal includes a body comprising a ceramic material having a flange, one or more heating elements embedded in the body, a first shaft coupled to the flange, and a second shaft coupled to the first shaft; wherein the second shaft includes a plurality of fluid channels formed therein that terminate in the second shaft.Type: GrantFiled: October 22, 2019Date of Patent: October 20, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Xing Lin, Jianhua Zhou, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan
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Patent number: 10793954Abstract: A method of processing a substrate according to a PECVD process is described. Temperature profile of the substrate is adjusted to change deposition rate profile across the substrate. Plasma density profile is adjusted to change deposition rate profile across the substrate. Chamber surfaces exposed to the plasma are heated to improve plasma density uniformity and reduce formation of low quality deposits on chamber surfaces. In situ metrology may be used to monitor progress of a deposition process and trigger control actions involving substrate temperature profile, plasma density profile, pressure, temperature, and flow of reactants.Type: GrantFiled: May 10, 2018Date of Patent: October 6, 2020Assignee: Applied Materials, Inc.Inventors: Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang, Juan Carlos Rocha-Alvarez, Thomas Nowak, Jianhua Zhou, Ramprakash Sankarakrishnan, Amit Kumar Bansal, Jeongmin Lee, Todd Egan, Edward Budiarto, Dmitriy Panasyuk, Terrance Y. Lee, Jian J. Chen, Mohamad A. Ayoub, Heung Lak Park, Patrick Reilly, Shahid Shaikh, Bok Hoen Kim, Sergey Starik, Ganesh Balasubramanian
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Publication number: 20200249875Abstract: This application provides a data writing method and a storage device. The method is applied to a solid-state storage device SSD, and the method includes: receiving a write command, where the write command carries a type of to-be-written data; determining, based on the type of to-be-written data, a type of storage area that is in an SSD and into which the to-be-written data is written, where the SSD includes a plurality of types of storage areas; determining, based on the type of storage area, a target storage area into which the to-be-written data is written; and writing the to-be-written data into the target storage area. In embodiments of this application, data processing efficiency can be improved.Type: ApplicationFiled: April 21, 2020Publication date: August 6, 2020Applicant: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Meng Zhou, Jianhua Zhou
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Publication number: 20200234982Abstract: Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.Type: ApplicationFiled: April 2, 2020Publication date: July 23, 2020Inventors: Saptarshi BASU, Jeongmin LEE, Paul CONNORS, Dale R. DU BOIS, Prashant Kumar KULSHRESHTHA, Karthik Thimmavajjula NARASIMHA, Brett BERENS, Kalyanjit GHOSH, Jianhua ZHOU, Ganesh BALASUBRAMANIAN, Kwangduk Douglas LEE, Juan Carlos ROCHA-ALVAREZ, Hiroyuki OGISO, Liliya KRIVULINA, Rick GILBERT, Mohsin WAQAR, Venkatanarayana SHANKARAMURTHY, Hari K. PONNEKANTI
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Patent number: 10720349Abstract: Embodiments of the present disclosure generally provide apparatus and methods for monitoring one or more process parameters, such as temperature of substrate support, at various locations. One embodiment of the present disclosure provides a sensor column for measuring one or more parameters in a processing chamber. The sensor column includes a tip for contacting a chamber component being measured, a protective tube having an inner volume extending from a first end and second end, wherein the tip is attached to the first end of the protective tube and seals the protective tube at the first end, and a sensor disposed near the tip. The inner volume of the protective tube houses connectors of the sensor, and the tip is positioned in the processing chamber through an opening of the processing chamber during operation.Type: GrantFiled: December 11, 2018Date of Patent: July 21, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Dale R. Du Bois, Bozhi Yang, Jianhua Zhou, Sanjeev Baluja, Amit Kumar Bansal, Juan Carlos Rocha-Alvarez