Abstract: Implementations described herein generally relate to materials and coatings, and more specifically to materials and coatings for aluminum and aluminum-containing chamber components. In one implementation, a process is provided. The process comprises exposing an aluminum-containing component to a moisture thermal treatment process and exposing the aluminum-containing component to a thermal treatment process. The moisture thermal treatment process comprises exposing the aluminum-containing component to an environment having a moisture content from about 30% to about 100% at a first temperature from about 30 to about 100 degrees Celsius. The thermal treatment process comprises heating the aluminum-containing component to a second temperature from about 200 degrees Celsius to about 550 degrees Celsius to form an alumina layer on the at least one surface of the aluminum-containing component.

Abstract: A redundant array of independent disks (RAID) management method includes, when detecting that a component in a storage medium fails, recovering, based on a RAID policy, data stored in the failed component, saving the recovered data into a pre-defined redundant space of the RAID, and mapping an address of the failed component with the address of the redundant space, converting, according to the mapping, an address of to-be-accessed data comprised in an accessing request into an address within the redundant space, and accessing the to-be-accessed data from the redundant space according to the address within the redundant space.

Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.

Abstract: A water-based viscosity reducer for emulsifying ultra-heavy oil and a preparation method thereof is provided, where the viscosity reducer includes the following components (based on 100 parts by weight): 0.7 to 4 parts of surfactant, 0 to 10 parts of oil phase, and the balance being a water phase; and the preparation method thereof is stirring the surfactant, the oil phase, and the water phase at room temperature for mixing evenly, to form the water-based viscosity reducer for emulsifying ultra-heavy oil. The invention greatly improves the overall surface activity by using the synergistic effect generated by the compounding of surfactants, and can significantly reduce oil-water interfacial tension. It is especially suitable for emulsifying viscosity reduction of alkali-sensitive stratum, has characteristics such as low cost, safety, and simple preparation, and can effectively enhance heavy oil recovery.

Abstract: A first storage node is connected to a host by using a first network interface card of the first storage node, and is connected to a second storage node by using a second network interface card. The first storage node receives a data processing request from the host, wherein the data processing request carries a target storage address of to-be-processed data, determines the second storage node based on the target storage address of the to-be-processed data, and sends the data processing request to the second storage node by using the second network interface card, wherein the data processing request instructs the second storage node to process the to-be-processed data.

Abstract: Embodiments of the present disclosure generally relate to a substrate support assembly in a semiconductor processing chamber. The semiconductor processing chamber may be a PECVD chamber including a substrate support assembly having a substrate support and a stem coupled to the substrate support. An RF electrode is embedded in the substrate support and a rod is coupled to the RF electrode. The rod is made of titanium (Ti) or of nickel (Ni) coated with gold (Au), silver (Ag), aluminum (Al), or copper (Cu). The rod made of Ti or of Ni coated with Au, Ag, Al or Cu has a reduced electrical resistivity and increased skin depth, which minimizes heat generation as RF current travels through the rod.

Abstract: An organic light-emitting diode (OLED) drive power device and OLED television, OLED drive power device comprising power board connected to motherboard and OLED screen logic board, power board having power supply circuit, first conversion module, second conversion module, changeover switch and power factor correction (PFC) circuit thereon; after powered, power supply circuit starts PFC circuit to output high-voltage direct current (HVDC) according to on-off signal output by motherboard, first conversion module converts HVDC into first voltage and second voltage to power motherboard, and first voltage is converted to power OLED screen logic board; after preset time period, HVDC is converted to power OLED screen logic board to light OLED screen. Redesigning architecture of power board eliminates need for standby circuit and streamlines circuits, meets power output stability and timing requirements of OLED, reduces power board size, reduces power cost and benefits OLED popularization.

Abstract: Embodiments of the present disclosure generally provide apparatus and methods for a gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising a mounting plate, the mounting plate comprising a hub, a plurality of curved spokes extending from the hub in a radial direction, a gusset portion coupled between the hub and each of the curved spokes, each of the gusset portions having a convex curve disposed in an axial direction, and one or more mounting holes coupled to the curved spokes.

Abstract: A lighting system includes a lamp that is configured to illuminate. The lamp is coupled to a fixture. A heat bridge is made of a metallic material and is configured to contact the lamp and the fixture, conduct heat from the lamp to the fixture, and deform in response to at least one governing condition.

Abstract: A method for adjusting over provisioning space and a flash device are provided. The flash device includes user storage space for storing user data and over provisioning space for garbage collection within the flash device. The flash device receives an operation instruction, and then performs an operation on user data stored in the user storage space based on the operation instruction. Further, the flash device identifies a changed size of user data after performing the operation. Based on the changed size of data, a target adjustment parameter is identified. Further, the flash device adjusts the capacity of the over provisioning space according to the target adjustment parameter. According to the method, the over provisioning ratio can be dynamically adjusted, thereby, a life of the flash device can be prolonged.

Abstract: Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.

Abstract: The present invention discloses an emulsion-type water-based detergent for oily sludge, and a preparation method and use method thereof. The emulsion-type water-based detergent includes components in the following mass percentage contents: 2-10 parts of surfactant, 3-10 parts of oil-soluble component and the balance being aqueous phase, based on 100 parts by weight. The preparation method includes: stirring the surfactant, the oil-soluble component and the aqueous phase to mix uniformly to obtain a homogeneous and stable emulsion-type water-based detergent at room temperature. During use, the oily sludge is first mixed with the emulsion-type water-based detergent and stirred under a certain temperature; mixture is subjected to oil-water-solid three-phase separation after the washing is completed; and at last, solid phase is rinsed with hot water under the same temperature.

Abstract: A zone correction-based method for improving positioning accuracy in a satellite-based augmentation system, including: dividing an area to be observed into a plurality of observation areas, and configuring a plurality of monitoring stations in each observation area; acquiring residual of each monitoring station by processing observation data; acquiring mean clock error value of each monitoring station according to observation residual; acquiring ambiguity reduction value of each observation area according to residual data; acquiring zone corrections of each observation area according to residual data and ambiguity reduction value data; and providing a user with a zone corrections calling service by means of a network or a satellite link. The method carries out wide-range area configuration to monitoring stations and calculates the zone corrections for use in network and satellite-based broadcasts on the basis of the monitoring stations to refine error correction in user positioning.

Abstract: Implementations described herein generally relate to methods for leveling a component above a substrate. In one implementation, a test substrate is placed on a substrate support inside of a processing chamber. A component, such as a mask, is located above the substrate. The component is lowered to a position so that the component and the substrate are in contact. The component is then lifted and the particle distribution on the test substrate is reviewed. Based on the particle distribution, the component may be adjusted. A new test substrate is placed on the substrate support inside of the processing chamber, and the component is lowered to a position so that the component and the new test substrate are in contact. The particle distribution on the new test substrate is reviewed. The process may be repeated until a uniform particle distribution is shown on a test substrate.

Abstract: A method and apparatus for a pedestal is provided. In one embodiment, the pedestal includes a body comprising a ceramic material having a flange, one or more heating elements embedded in the body, a first shaft coupled to the flange, and a second shaft coupled to the first shaft; wherein the second shaft includes a plurality of fluid channels formed therein that terminate in the second shaft.

Abstract: The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) chamber. In one embodiment, a lid assembly is provided that includes a multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and a flow guide coupled to opposing sides of the multi-channel showerhead, each of the flow guides being fluidly coupled to the plurality of second gas channels.

Abstract: A method for adjusting over provisioning space and a flash device are provided. The flash device includes user storage space for storing user data and over provisioning space for garbage collection within the flash device. The flash device receives an operation instruction, and then performs an operation on user data stored in the user storage space according to the operation instruction. Further, the flash device identifies a changed size of user data after performing the operation. Based on the changed size of data, a target adjustment parameter is identified. Further, the flash device adjusts the capacity of the over provisioning space according to the target adjustment parameter. According to the method, the over provisioning ratio can be dynamically adjusted.

Abstract: An apparatus for plasma processing a substrate is provided. The apparatus comprises a processing chamber, a substrate support disposed in the processing chamber, and a lid assembly coupled to the processing chamber. The lid assembly comprises a conductive gas distributor such as a face plate coupled to a power source, and a heater coupled to the conductive gas distributor. A zoned blocker plate is coupled to the conductive gas distributor and a cooled gas cap is coupled to the zoned blocker plate. A tuning electrode may be disposed between the conductive gas distributor and the chamber body for adjusting a ground pathway of the plasma. A second tuning electrode may be coupled to the substrate support, and a bias electrode may also be coupled to the substrate support.

Abstract: The present application provides a satellite positioning method and a satellite positioning system. The system includes a satellite, a base station, an observation station. The observation station is provided with a monitoring terminal and a correction parameters information generating apparatus, the monitoring terminal receiving observation data transmitted from the satellite; the correction parameters information generating apparatus generating a correction parameters based on the observation data, the correction parameters being transmitted to the base station.

Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.