Abstract: A multi-view clustering method and system based on matrix decomposition and multi-partition alignment are provided.

Abstract: A late fusion multi-view clustering method and system based on local maximum alignment are provided. The late fusion multi-view clustering method based on local maximum alignment includes the following steps: S1: acquiring a clustering task and a target data sample; S2: initializing a permutation matrix of each view and a combination coefficient of each view, and performing average partition of kernel k-means clustering on an average kernel to obtain a neighbor matrix of each view; S3: calculating basic partition of each view, and establishing a late fusion multi-view clustering objective function based on maximum alignment; S4: acquiring basic partition having local information, and establishing a late fusion multi-view clustering objective function based on local maximum alignment; S5: solving the established late fusion multi-view clustering objective function based on local maximum alignment in a cyclic manner to obtain optimal partition; and S6: performing k-means clustering on the optimal partition.

Abstract: A spliceable and foldable filter element device is provided, which includes a quadrilateral filter element body made of a flexible material. The quadrilateral filter element body is a folding layer having vertical folds. A left frame body and a right frame body are respectively disposed on a left side and a right side of the quadrilateral filter element body, at least one clamping rod is arranged between the left frame body and the right frame body, the clamping rod comprises three or more clamping teeth, the clamping teeth correspond to the folding layer in position, and the clamping rod is clamped with the folding layer through the clamping teeth. The spliceable and foldable filter element device has the advantages of simple structure, low cost, foldability, flexible use, convenience, easy storage and transportation.

Abstract: A plasma system includes a plasma apparatus including: a plasma chamber; a pedestal configured to hold a substrate in the chamber; and a radio frequency (RF) electrode configured to excite plasma in the chamber; an electromagnetic (EM) circuit block coupled to the RF electrode, the EM circuit block including: a function generator configured to output a broadband RF waveform, the waveform having EM power distributed over a range of frequencies; a broadband amplifier coupled to an output of the function generator, an operating frequency range of the amplifier including the range of frequencies; and a broadband impedance matching network having an input coupled to an output of the broadband amplifier and an output coupled to a terminal of the RF electrode, an operating frequency range of the broadband impedance matching network including the range of frequencies; and a controller configured to adjust an input parameter of the EM circuit block.

Abstract: This application provides a communication method, apparatus, and system. A network device sends a first downlink signal to a terminal device through a downlink slot of a first band, and simultaneously, the network device receives a first uplink signal from the terminal device through an uplink slot of a second band, where there is an association relationship between an uplink-downlink slot configuration of the first band and an uplink-downlink slot configuration of the second band.

Abstract: A plasma processing apparatus includes a plasma processing chamber, a substrate holder disposed in the chamber, and a radio frequency (RF) electrode disposed within the chamber, an RF power source configured to supply continuous wave RF power having frequency in the very high frequency range to the RF electrode, and a direct current (DC) power source configured to supply continuous wave DC power to the chamber through an RF choke. The DC power is supplied concurrently with the RF power. The RF power source is electrically coupled to the RF electrode through an impedance matching circuit and is separate from the DC power source. The RF electrode may be an upper electrode or a lower electrode, such as the substrate holder. The DC power may be supplied to an upper or lower electrode, or through a wall of the chamber.

Abstract: A method of performing a plasma process includes generating, at an output of a signal generator, a first RF signal at a first frequency. The signal generator is coupled to a plasma chamber through a matching circuit. Based on a feedback from the first RF signal, variable components of the matching circuit are moved to fixed positions. A second RF signal is generated at a second frequency at the output of the signal generator to ignite a plasma within the plasma chamber. In response to detecting the plasma, the signal generator switches to output a third RF signal at the first frequency to sustain the plasma, which is configured to process a substrate loaded into the plasma chamber while holding the matching circuit at the fixed positions.

Abstract: An exemplary plasma processing system includes a plasma processing chamber, an electrode for powering plasma in the plasma processing chamber, a tunable radio frequency (RF) signal generator configured to output a first signal at a first frequency and a second signal at a second frequency. The second frequency is at least 1.1 times the first frequency. The system includes a broadband power amplifier coupled to the tunable RF signal generator, the first frequency and the second frequency being within an operating frequency range of the broadband power amplifier. The output of the broadband power amplifier is coupled to the electrode. The broadband power amplifier is configured to supply, at the output, first power at the first frequency and second power at the second frequency.

Abstract: The present disclosure provides a system for perceiving an operating state of a large power transformer based on vibro-acoustic integration, including a perception layer, a network layer, and a diagnostic layer, where the perception layer is used for monitoring, in real time, a state parameter for a coupling vibration signal and an acoustic signal of each of a transformer core, a winding, a clamp and a housing, a state parameter of each of a vibration signal and an acoustic signal during a gear position change of an on-load tap changer (OLTC), and preliminarily diagnosing and analyzing monitored data. The system can monitor the operating state of the OLTC online for a long time, flexibly configure the sensor channel and the sensor type according to different application requirements, automatically acquire and identify the gear position change, and correctly identify and process a gear position corresponding to the monitoring signal.

Abstract: A method of forming a carbon hard mask includes generating a radio frequency plasma including carbon-based ions by supplying continuous wave radio frequency power to a plasma processing chamber. The carbon-based ions have a first average ion energy. The method further includes adjusting the first average ion energy of the carbon-based ions to a second average ion energy by supplying continuous wave direct current power to the plasma processing chamber concurrently with the continuous wave radio frequency power and forming a carbon hard mask at a substrate within the plasma processing chamber by delivering the carbon-based ions having the second average ion energy to the substrate.

Abstract: Embodiments of this application disclose a radio frequency unit, an antenna, and a signal processing method. The method includes: receiving an uplink signal in a downlink slot, where the uplink signal includes signals of N frequency bands; filtering and amplifying the signals of the N frequency bands; converting the uplink signal into a digital intermediate frequency signal; and then processing the digital intermediate frequency signal.

Abstract: This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. The plasma processing system may include a plasma chamber that can receive and process the substrate using plasma for etching the substrate, doping the substrate, or depositing a film on the substrate. This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. In one embodiment, the plasma density may be controlled by reducing the rate of loss of ions to the chamber wall during processing. This may include biasing a dual electrode ring assembly in the plasma chamber to alter the potential difference between the chamber wall region and the bulk plasma region.

Abstract: A method of nitridation includes cyclically performing the following steps in situ within a processing chamber at a temperature less than about 400° C.: directing an energy flux to a localized region of an unreactive surface of a substrate to convert the localized region of the unreactive surface to a localized reactive region: and selectively nitridating the localized reactive region using a nitrogen-based gas to convert the localized reactive region to a nitride layer.

Abstract: A method of plasma processing that includes: flowing a first gas and a second gas into a plasma processing chamber including a substrate, the second gas including a film precursor; at a first time instance, while maintaining the flow of the first gas, shutting off the flow of the second gas into the plasma processing chamber; and at a second time instance after the first time instance, powering an electrode of the plasma processing chamber to generate a plasma within the plasma processing chamber, the surface of the substrate being exposed to the generated plasma to form a film over the substrate.

Abstract: A method of nitridation includes cyclically performing the following steps in situ within a processing chamber at a temperature less than about 400° C.: treating an unreactive surface of a substrate in the processing chamber to convert the unreactive surface to a reactive surface by exposing the unreactive surface to an energy flux, and nitridating the reactive surface using a nitrogen-based gas to convert the reactive surface to a nitride layer including a subsequent unreactive surface.

Abstract: The present disclosure relates to a curved conformal frequency selective surface (FSS) radome. The radome includes a dielectric radome and a curved conformal FSS array arranged on an outer wall of the dielectric radome, where the dielectric radome includes a dome, a circular truncated cone and a hollow cylinder which are integrally formed from top to bottom, and the curved conformal FSS array is formed by periodically arraying foldable FSS units on an outer surface of the dielectric radome, the foldable FSS unit being of an axially symmetrical and centrally symmetrical gap structure, and having an overall shape consisting of foldable gaps on a left side, an upper side, a right side and a lower side, the four foldable gaps being sequentially connected in a square shape, and remaining parts of the foldable FSS unit except for the four foldable gaps being all metal patches.

Abstract: A movable contact mechanism of a double-breakpoint circuit breaker comprises a front static contact having a first contact point at the rear end, a rear contact assembly having a connecting plate with a rear static contact at the front end, and a movable contact which are placed in the horizontal direction, wherein an insertion slot is formed in the front end of the rear static contact the front contact end of the movable static is equipped with a second contact point matched with the first contact point, and the rear insertion end of the movable contact is inserted into or separated from the insertion slot and the opening or closing stroke of the first contact point and the second contact point is greater than the stroke that the rear insertion end of the movable contact is inserted into or separated from the insertion slot.

Abstract: An exemplary apparatus includes a chamber that includes a first window and a second window; a substrate holder configured to hold a substrate in the processing chamber; an infrared light (IR) source configured to generate a collimated IR beam; a first optical assembly configured to transmit the collimated IR beam into the chamber through the first window and direct the collimated IR beam at an incident angle of Brewster's angle with a front side of the substrate; and a second optical assembly configured to receive the collimated IR beam reflected at a back side of the substrate through the second window and direct the collimated IR beam to an optical sensor system.

Abstract: Provided is a method for preparing a diabetic dog model by means of gene editing technology, a diabetic dog model prepared therefrom, as well as cells and issues thereof. The method comprises the following steps: (1) obtaining a dog fertilized egg cell, which comprises a point mutation in GCK gene, for a diabetic dog model by means of gene editing; and (2) transplanting the dog fertilized egg cell into one fallopian tube of a female dog, in which both fallopian tubes have been flushed, to prepare a diabetic dog model comprising a point mutation in GCK gene.

Abstract: The present disclosure provides a system for perceiving an operating state of a large power transformer based on vibro-acoustic integration, including a perception layer, a network layer, and a diagnostic layer, where the perception layer is used for monitoring, in real time, a state parameter for a coupling vibration signal and an acoustic signal of each of a transformer core, a winding, a clamp and a housing, a state parameter of each of a vibration signal and an acoustic signal during a gear position change of an on-load tap changer (OLTC), and preliminarily diagnosing and analyzing monitored data. The system can monitor the operating state of the OLTC online for a long time, flexibly configure the sensor channel and the sensor type according to different application requirements, automatically acquire and identify the gear position change, and correctly identify and process a gear position corresponding to the monitoring signal.