Abstract: Embodiments of the present invention disclose an interleaved polarized multi-beam antenna, including: at least one dual-polarized antenna element, where the dual-polarized antenna element includes a +45-degree-polarized first antenna element and a ?45-degree-polarized second antenna element; and a first Butler matrix and a second Butler matrix, where the first Butler matrix is connected to the first antenna element so that the first antenna element transmits a first target beam, and the second Butler matrix is connected to the second antenna element so that the second antenna element transmits a second target beam. The first target beam and the second target beam in the embodiments are alternately arranged, and any two adjacent first target beam and second target beam have different polarization characteristics; therefore, complexity, a loss, and costs of implementation of a Butler matrix can be effectively reduced, and interference between adjacent multiplexed beams can be effectively decreased.

Abstract: A system and method for using plasma to treat a substrate are described. The system includes a substrate holder disposed within a plasma processing system, and arranged to support a substrate, a first signal generator for coupling a first signal at a first frequency to plasma in the plasma processing system, and a second signal generator for coupling a second signal at a second frequency to plasma in the plasma processing system, wherein the second frequency being less than the first frequency. The system further includes an amplitude modulation circuit for modulating the first signal between a high amplitude state and a low amplitude state in response to an amplitude modulation signal, and a timing circuit configured to define the amplitude modulation signal that synchronizes the amplitude modulation of the first signal with a target phase for each cycle of the second signal.

Abstract: The present invention discloses an antenna system, where the antenna system includes an antenna module, configured to: receive and/or transmit at least one first radio frequency signal, and at least one second radio frequency signal; a power-split phase-shift network module, configured to control an amplitude and a phase of each radio frequency signal in the antenna module, where control parameters for controlling an amplitude and a phase of each first radio frequency signal are configured according to a beam pointing direction and a beam width that are required by a three-dimensional building region, and control parameters for controlling an amplitude and a phase of each second radio frequency signal are configured according to a beam pointing direction and a beam width that are required by a ground region. Therefore, a problem of high costs and difficulty in obtaining an antenna site and maintaining an antenna is resolved.

Abstract: The present invention relates to a method for preparing a gene knock-out canine with use of somatic cell cloning technology, in particular relates to a method for preparing a gene knock-out canine with use of somatic cell cloning technology using a fusion liquid of low osmotic pressure together with autologous embryo transplanting.

Abstract: The present invention relates to a method for preparing a canine model of atherosclerosis, in particular, relates to a method for preparing an apolipoprotein E (APOE) gene knock-out disease canine model with the use of gene knock-out technology.

Abstract: An antenna system and a signal transmission method are provided. The antenna system includes: an antenna array and a matching network, where an S parameter matrix of the matching network matches an S parameter matrix of the antenna array and the matching network is configured to perform pre-distortion on a to-be-transmitted signal or de-distortion on a received signal, and the antenna array is configured to transmit the pre-distorted to-be-transmitted signal. According to the antenna system and the signal transmission method provided in this application, pre-distortion may be performed on a signal that needs to be transmitted by the antenna array or de-distortion may be performed on a signal received by the antenna array, so as to configure energy that is coupled from each antenna array element to an adjacent antenna array element, thereby reducing a coupling effect between antenna array elements.

Abstract: According to a communication method and a base station that are provided in embodiments of the present invention, the base station transmits a broad beam that covers a sector of the base station and narrow beams whose coverage areas completely fall within a coverage area of the broad beam, which implements that under a premise that a coverage area of the sector of the base station maintains unchanged by using the broad beam, enhanced coverage of the sector is further achieved by using the narrow beams, thereby improving spectral efficiency. In the solutions, a sector coverage area of the broad beam transmitted by the base station still maintains unchanged, and therefore, a coverage relationship between sectors is not affected. In addition, neither an additional site backhaul resource nor additional standardization support is required in the solutions.

Abstract: The present invention discloses a multi-beam antenna system, comprising: a one-dimensional multi-beam forming module connected to a radio frequency port, configured to convert a radio frequency signal transmitted by the radio frequency port into M radio frequency signals having different phases; a two-dimensional multi-beam forming module, which includes M first power division units, and a phase shifter is disposed on P output tributaries of each first power division unit; and M×N radiating elements, where the M×N radiating elements form a matrix having N rows and M columns, M columns of radiating elements are respectively connected to the M first power division units, N radiating elements in each column of radiating elements are respectively connected to N output tributaries of one first power division unit, and M×P radiating elements connected to output tributaries disposed with a phase shifter form a matrix having P rows and M columns.

Abstract: A processing system is disclosed, having a power transmission element with an interior cavity that propagates electromagnetic energy proximate to a continuous slit in the interior cavity. The continuous slit forms an opening between the interior cavity and a substrate processing chamber. The electromagnetic energy may generate an alternating charge in the continuous slit that enables the generation of an electric field that may propagate into the processing chamber. The electromagnetic energy may be conditioned prior to entering the interior cavity to improve uniformity or stability of the electric field. The conditioning may include, but is not limited to, phase angle, field angle, and number of feeds into the interior cavity.

Abstract: According to a communication method and a base station that are provided in embodiments of the present invention, the base station transmits a broad beam that covers a sector of the base station and narrow beams whose coverage areas completely fall within a coverage area of the broad beam, which implements that under a premise that a coverage area of the sector of the base station maintains unchanged by using the broad beam, enhanced coverage of the sector is further achieved by using the narrow beams, thereby improving spectral efficiency. In the solutions, a sector coverage area of the broad beam transmitted by the base station still maintains unchanged, and therefore, a coverage relationship between sectors is not affected. In addition, neither an additional site backhaul resource nor additional standardization support is required in the solutions.

Abstract: The invention is an plasma processing system with a plasma chamber for processing semiconductor substrates, comprising: a radio frequency or microwave power generator coupled to the plasma chamber; a low pressure vacuum system coupled to the plasma chamber; and at least one chamber surface that is configured to be exposed to a plasma, the chamber surface comprising: a YxOyFz layer that comprises Y in a range from 20 to 40%, O in a range from greater than zero to less than or equal to 60%, and F in a range of greater than zero to less than or equal to 75%. Alternatively, the YxOyFz layer can comprise Y in a range from 25 to 40%, O in a range from 40 to 55%, and F in a range of 5 to 35% or Y in a range from 25 to 40%, O in a range from 5 to 40%, and F in a range of 20 to 70%.

Abstract: An antenna array, including at least two antenna bays. Operating frequency bands of all of the at least two antenna bays are the same, each antenna bay includes at least one transmit channel or receive channel, and each antenna bay transmits data in a co-frequency co-time full duplex manner. Alternatively, operating frequency bands of two adjacent antenna bays of the at least two antenna bays are adjacent frequency bands or are separated by one or two frequency bands, each antenna bay includes at least one receive channel and at least one transmit channel, and each antenna bay transmits data in an asynchronous manner. An angle value between a line connecting center points of any two adjacent antenna bays of the at least two antenna bays and a horizontal line is acute. By using the present invention, isolation between antenna bays of the antenna array is increased.

Abstract: Techniques disclosed herein include an apparatus for treating substrates with plasma generated within a plasma processing chamber. In one embodiment, dielectric plates, of a plasma system can include structural features configured to assist in generating a uniform plasma. Such structural features define a surface shape, on a surface that faces the plasma. Such structural features can include a set of concentric rings having an approximately non-linear cross section, and protrude into the surface of the dielectric plate. Such structural features may include feature depth, width, and periodic patterns that may vary depth and width along the concentric rings.

Abstract: A processing system is disclosed, having a power transmission element with an interior cavity that propagates electromagnetic energy proximate to a continuous slit in the interior cavity. The continuous slit forms an opening between the interior cavity and a substrate processing chamber. The electromagnetic energy may generate an alternating charge in the continuous slit that enables the generation of an electric field that may propagate into the processing chamber. The electric field may interact with process gas in the processing chamber to generate plasma for treating the substrate. The interior cavity may be isolated from the process chamber by a dielectric component that covers the continuous slit. The power transmission element may be used to control plasma density within the process chamber, either by itself or in combination with other plasma sources.

Abstract: A processing system is disclosed, having a power transmission element with an interior cavity that propagates electromagnetic energy proximate to a continuous slit in the interior cavity. The continuous slit forms an opening between the interior cavity and a substrate processing chamber. The electromagnetic energy may generate an alternating charge in the continuous slit that enables the generation of an electric field that may propagate into the processing chamber. The electromagnetic energy may be conditioned prior to entering the interior cavity to improve uniformity or stability of the electric field. The conditioning may include, but is not limited to, phase angle, field angle, and number of feeds into the interior cavity.

Abstract: A processing system is disclosed, having a power transmission element with an interior cavity that propagates electromagnetic energy proximate to a continuous slit in the interior cavity. The continuous slit forms an opening between the interior cavity and a substrate processing chamber. The electromagnetic energy may generate an alternating charge in the continuous slit that enables the generation of an electric field that may propagate into the processing chamber. The electromagnetic energy may be conditioned prior to entering the interior cavity to improve uniformity or stability of the electric field. The conditioning may include, but is not limited to, phase angle, field angle, and number of feeds into the interior cavity.

Abstract: Embodiments of the present invention provide a method for communication through a distributed antenna array system and an array system. The antenna array system includes a number of antenna units, a baseband resource pool, a radio frequency resource pool, and a controller. The controller is configured to monitor a signal state of a user equipment under a coverage area of a macrocell, to determine an antenna unit that provides a service to the user equipment, and, according to a capability of the user equipment, determine whether to perform coordinated transmission of a plurality of antennas and a corresponding transmission mode for the user equipment, and then to configure an antenna resource for the user equipment, so that the baseband resource pool and the radio frequency resource pool control the configured antenna resource to provide a communication service for the user equipment.

Abstract: This disclosure relates to a plasma processing system and methods for high precision etching of microelectronic substrates. The system may include a plasma chamber that may generate plasma to remove monolayer(s) of the substrate. The plasma process may include a two-step process that uses a first plasma to form a thin adsorption layer on the surface of the microelectronic substrate. The adsorbed layer may be removed when the system transitions to a second plasma or moves the substrate to a different location within the first plasma that has a higher ion energy. In one specific embodiment, the transition between the first and second plasma may be enabled by changing the position of the substrate relative to the source electrode with no or relatively small changes in plasma process conditions.

Abstract: A method and apparatus is provided for obtaining a low average electron energy flux onto a substrate in a processing chamber. A processing chamber includes a substrate support therein for chemical processing. An energy source induced plasma, and ion propelling means, directs energetic plasma electrons toward the substrate support. A dipole ring magnet field is applied perpendicular to the direction of ion travel, to effectively prevent electrons above an acceptable maximum energy level from reaching the substrate holder. Rotation of the dipole magnetic field reduces electron non-uniformities.

Abstract: Embodiments of the present invention disclose an interleaved polarized multi-beam antenna, including: at least one dual-polarized antenna element, where the dual-polarized antenna element includes a +45-degree-polarized first antenna element and a ?45-degree-polarized second antenna element; and a first Butler matrix and a second Butler matrix, where the first Butler matrix is connected to the first antenna element so that the first antenna element transmits a first target beam, and the second Butler matrix is connected to the second antenna element so that the second antenna element transmits a second target beam. The first target beam and the second target beam in the embodiments are alternately arranged, and any two adjacent first target beam and second target beam have different polarization characteristics; therefore, complexity, a loss, and costs of implementation of a Butler matrix can be effectively reduced, and interference between adjacent multiplexed beams can be effectively decreased.