Abstract: A method for monitoring at least two microcontrollers using a watchdog is described. The watchdog is associated with a first microcontroller and monitors the communication of a message from the first microcontroller within a time interval of a predefined duration. The message communicated to the watchdog by the first microcontroller contains a contribution which is formed on account of communication between the first microcontroller and a second microcontroller connected to the latter and on the basis of which the watchdog checks the proper method of operation of the second microcontroller. The disclosure also describes a circuit arrangement and a battery with a battery management unit which are configured to carry out the method according to the disclosure.

Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Abstract: The disclosure relates to a computer-implemented method for generating software for a battery management unit. Said method comprises at least the step of: generating a central battery configuration. In addition, the disclosure relates to a battery that can be operated using the software, and to a motor vehicle which comprises such a battery.

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Abstract: A method for monitoring at least two microcontrollers using a watchdog is described. The watchdog is associated with a first microcontroller and monitors the communication of a message from the first microcontroller within a time interval of a predefined duration. The message communicated to the watchdog by the first microcontroller contains a contribution which is formed on account of communication between the first microcontroller and a second microcontroller connected to the latter and on the basis of which the watchdog checks the proper method of operation of the second microcontroller. The disclosure also describes a circuit arrangement and a battery with a battery management unit which are configured to carry out the method according to the disclosure.

Abstract: The present disclosure relates to a method and an arrangement for monitoring at least one battery, to a battery having such an arrangement, and to a motor vehicle having a corresponding battery that is used for safely monitoring the battery condition with a reduced amount of hardware. The at least one battery is monitored by analyzing measured variables of the at least one battery using at least one data processing device. The signals exchanged between the at least one battery and the at least one data processing device via a communication connection are monitored at least once.

Abstract: The present disclosure relates to a method for monitoring the voltage on electrical storage units, to a battery and to a motor vehicle having such a battery that are configured to be used particularly for improved establishment of overvoltages and/or undervoltages on modules of the electrical storage unit. To this end, a method for monitoring the voltage on at least one electrical storage unit includes extracting an idle voltage U_OCV on the at least one electrical storage unit from a voltage U_measured that is measured on the at least one electrical storage unit.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Abstract: A method for determining the power that can be provided or absorbed by a battery includes determining a state variable of the battery. A power that can be provided or absorbed by the battery during a specified load period is determined using a table of power values and the state variable of the battery. The state variable of the battery is used as an access parameter for the table. A load of the battery is measured using an operating parameter of the battery. A load period in which the load of the battery is given is measured. The measured load period is compared with a comparison range that contains the specified load period. A correction routine is carried out if the load period lies in the comparison range. A battery system includes a controller for carrying out the method. A motor vehicle includes the battery system.

Abstract: Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees of freedom can be x-displacement, y-displacement, z-displacement or tilt.

Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Abstract: The invention relates to a steam iron that comprises a housing including a tank (5) above a heating body and a safety device that protects the tank (5) against overpressure, the heating body (3) comprising a vaporization chamber supplied with liquid from the tank (5) by a supply circuit, characterized in that said supply circuit includes a member (93) extending inside the tank (5) and having an opening (12) blocked by a valve (94A), said valve (94A) opening a passage through said opening (12) when the pressure inside the tank (5) reaches a predetermined value.

Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Abstract: System for contactless energy transmission includes a primary side winding and a secondary side winding that is rotatable relative to the primary side winding, a coil core being provided on the primary side winding, whose sectional view in at least one sectional plane containing the axis of rotation is formed as a U shape or C shape around the winding region of the primary side winding.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.