Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Abstract: In order to detect the exchange of a module, identified by a serial number, in a microprocessor system, a code number, which is obtained from the serial number by using an encryption method, as well as information required for calculating the serial number from the code number, are stored in the microprocessor system; the code number is read and an unencrypted serial number is calculated from the code number with the aid of the information; and the decrypted serial number thus obtained is compared to the serial number of the module and the module is detected as exchanged if its serial number does not match the decrypted serial number.

Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Abstract: In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.

Abstract: The invention relates to a steam iron that comprises a housing including a tank (5) above a heating body and a safety device that protects the tank (5) against overpressure, the heating body (3) comprising a vaporisation chamber supplied with liquid from the tank (5) by a supply circuit, characterised in that said supply circuit includes a member (93) extending inside the tank (5) and having an opening (12) blocked by a valve (94A), said valve (94A) opening a passage through said opening (12) when the pressure inside the tank (5) reaches a predetermined value.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: Steam iron comprising a sole (1) in thermal communication with a heating body (5) equipped with a steam chamber (53), the steam chamber (53) communicating with a reservoir (7) by means of a supply circuit comprising a flow control valve (10) whose degree of opening is controlled by a thermally deformable element (16) in thermal communication with the heating body (5), characterized in that the opening of the control valve (10) is braked, beginning at an intermediate temperature, by a stabilizing element (18) that exerts a force that opposes the force generated by the thermally deformable element (16).

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Abstract: A method and apparatus for monitoring an electronic control system, where code of a memory is, in a context of ongoing instruction accesses, transferable via a word line out of the memory to a control unit having a specific word width encompassing code of a plurality of memory cells of the memory and where an additional datum is created in each case for the code of a word width and is storable in the memory, may include an arrangement that, outside the ongoing instruction accesses, checks an entire code of the memory by selecting for each word width a single memory cell to thereby activate a complete word line, that creates a check datum from code of the complete word line, and that compares the check datum with the stored additional datum.

Abstract: Steam iron comprising a sole (1) in thermal communication with a heating body (5) equipped with a steam chamber (53), the steam chamber (53) communicating with a reservoir (7) by means of a supply circuit comprising a flow control valve (10) whose degree of opening is controlled by a thermally deformable element (16) in thermal communication with the heating body (5), characterized in that the opening of the control valve (10) is braked, beginning at an intermediate temperature, by a stabilizing element (18) that exerts a force that opposes the force generated by the thermally deformable element (16).

Abstract: In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.

Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Abstract: System for contactless energy transmission includes a primary side winding and a secondary side winding that is rotatable relative to the primary side winding, a coil core being provided on the primary side winding, whose sectional view in at least one sectional plane containing the axis of rotation is formed as a U shape or C shape around the winding region of the primary side winding.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.