Patents by Inventor Joel M. Huston
Joel M. Huston has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11955362Abstract: Embodiments of substrate supports and process chambers equipped with the same are provided. In some embodiments, a substrate support includes: a support body having a first surface; one or more receptacles extending through the first surface and into the support body; and one or more protrusions respectively disposed within corresponding ones of the one or more receptacles and projecting from the first surface, wherein the one or more protrusions at least partially define a substantially planar support surface above the first surface. Methods of eliminating backside wafer damage are also disclosed.Type: GrantFiled: September 13, 2017Date of Patent: April 9, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Joel M Huston, Cheng-Hsiung Tsai, Gwo-Chuan Tzu
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Patent number: 11598003Abstract: Apparatus for processing a substrate are provided herein. In some embodiments a showerhead assembly includes a gas distribution plate having a plurality of apertures; a holder having a wall, an radially inwardly extending flange extending from a lower portion of the wall and coupled to the gas distribution plate, and a radially outwardly extending flange extending from an upper portion of the wall, wherein the wall has a thickness between about 0.015 inches and about 0.2 inches; and a heating apparatus disposed above and spaced apart from the gas distribution plate, wherein the heating apparatus includes a heater configured to heat the gas distribution plate.Type: GrantFiled: September 12, 2017Date of Patent: March 7, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Faruk Gungor, Dien-Yeh Wu, Joel M. Huston, Mei Chang, Xiaoxiong Yuan, Kazuya Daito, Avgerinos V. Gelatos, Takashi Kuratomi, Yu Chang, Bin Cao
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Publication number: 20210225640Abstract: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft.Type: ApplicationFiled: April 8, 2021Publication date: July 22, 2021Applicant: Applied Materials, Inc.Inventors: Chien-Teh Kao, Joel M. Huston, Mei Chang, Xiaoxiong Yuan
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Patent number: 10879090Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.Type: GrantFiled: October 27, 2017Date of Patent: December 29, 2020Assignee: Applied Materials, Inc.Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang
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Patent number: 10593539Abstract: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A flange extends radially outward from the cylindrical outer surface. A fluid channel is formed in the disk-shaped body and is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves formed in the upper surface are coupled by a hole to the vacuum conduit of the shaft. A gas conduit formed through the disk-shaped body couples the gas conduit of the shaft to the cylindrical outer surface of the disk-shaped body.Type: GrantFiled: April 26, 2012Date of Patent: March 17, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Chien-Teh Kao, Joel M. Huston, Mei Chang, Xiaoxiong (John) Yuan
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Publication number: 20200006054Abstract: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft.Type: ApplicationFiled: September 11, 2019Publication date: January 2, 2020Inventors: Chien-Teh KAO, Joel M. HUSTON, Mei CHANG, Xiaoxiong YUAN
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Patent number: 10400335Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.Type: GrantFiled: September 6, 2017Date of Patent: September 3, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Zhenbin Ge, Chien-Teh Kao, Joel M. Huston, Mei Chang
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Publication number: 20190078210Abstract: Apparatus for processing a substrate are provided herein. In some embodiments a showerhead assembly includes a gas distribution plate having a plurality of apertures; a holder having a wall, an radially inwardly extending flange extending from a lower portion of the wall and coupled to the gas distribution plate, and a radially outwardly extending flange extending from an upper portion of the wall, wherein the wall has a thickness between about 0.015 inches and about 0.2 inches; and a heating apparatus disposed above and spaced apart from the gas distribution plate, wherein the heating apparatus includes a heater configured to heat the gas distribution plate.Type: ApplicationFiled: September 12, 2017Publication date: March 14, 2019Inventors: FARUK GUNGOR, DIEN-YEH WU, JOEL M. HUSTON, MEI CHANG, XIAOXIONG YUAN, KAZUYA DAITO, AVGERINOS V. GELATOS, TAKASHI KURATOMI, YU CHANG, BIN CAO
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Publication number: 20190080951Abstract: Embodiments of substrate supports and process chambers equipped with the same are provided. In some embodiments, a substrate support includes: a support body having a first surface; one or more receptacles extending through the first surface and into the support body; and one or more protrusions respectively disposed within corresponding ones of the one or more receptacles and projecting from the first surface, wherein the one or more protrusions at least partially define a substantially planar support surface above the first surface. Methods of eliminating backside wafer damage are also disclosed.Type: ApplicationFiled: September 13, 2017Publication date: March 14, 2019Inventors: Joel M. HUSTON, Cheng-Hsiung TSAI, Gwo-Chuan TZU
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Publication number: 20180053667Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.Type: ApplicationFiled: October 27, 2017Publication date: February 22, 2018Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang
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Publication number: 20170362710Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.Type: ApplicationFiled: September 6, 2017Publication date: December 21, 2017Inventors: Zhenbin Ge, Chien-Teh Kao, Joel M. Huston, Mei Chang
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Patent number: 9837250Abstract: Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing substrates includes a chamber body enclosing a processing volume, the chamber body comprising a chamber floor, a chamber wall coupled to the chamber floor, and a chamber lid removably coupled to the chamber wall, wherein at least one of the chamber floor, the chamber wall, and the chamber lid comprise passages for a flow of a thermal control media; a heater plate disposed adjacent to and spaced apart from the chamber floor; a sleeve disposed adjacent to and spaced apart from the chamber wall, the sleeve supported by the heater plate; and a first sealing element disposed at a first interface between the chamber wall and the chamber lid.Type: GrantFiled: July 16, 2014Date of Patent: December 5, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Joel M. Huston, Olkan Cuvalci, Michael P. Karazim, Joseph Yudovsky
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Patent number: 9831109Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.Type: GrantFiled: March 11, 2014Date of Patent: November 28, 2017Assignee: Applied Materials, Inc.Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang
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Patent number: 9765432Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.Type: GrantFiled: May 12, 2016Date of Patent: September 19, 2017Assignee: Applied Materials, Inc.Inventors: Zhenbin Ge, Chien-Teh Kao, Joel M. Huston, Mei Chang
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Patent number: 9627185Abstract: Methods and apparatus for in-situ cleaning of substrate processing chambers are provided herein. A substrate processing chamber may include a chamber body enclosing an inner volume; a chamber lid removably coupled to the chamber body and including a first flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first outlet; a chamber floor including a second flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first inlet; and a pump ring disposed in and in fluid communication with the inner volume, the pump ring comprising an upper chamber fluidly coupled to a lower chamber, and a second outlet fluidly coupled to the lower chamber to selectively open or seal the inner volume to or from the second outlet.Type: GrantFiled: December 2, 2014Date of Patent: April 18, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Joel M. Huston, Nicholas R. Denny, Chien-Teh Kao
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Patent number: 9543186Abstract: Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a support plate having a support surface to support a substrate, a support ring to support a substrate at a perimeter of the support surface; and a plurality of first support elements disposed in the support ring, wherein an end portion of each of the first support elements is raised above an upper surface of the support ring to define a gap between the upper surface of the support ring and an imaginary plane disposed on the end portions of the plurality of first support elements.Type: GrantFiled: February 1, 2013Date of Patent: January 10, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Olkan Cuvalci, Joel M. Huston, Gwo-Chuan Tzu
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Publication number: 20160273108Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.Type: ApplicationFiled: May 12, 2016Publication date: September 22, 2016Inventors: Zhenbin Ge, Chien-Teh Kao, Joel M. Huston, Mei Chang
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Patent number: 9353440Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.Type: GrantFiled: December 20, 2013Date of Patent: May 31, 2016Assignee: Applied Materials, Inc.Inventors: Zhenbin Ge, Chien-Teh Kao, Joel M. Huston, Mei Chang
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Publication number: 20150176126Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.Type: ApplicationFiled: December 20, 2013Publication date: June 25, 2015Inventors: Zhenbin Ge, Chien-Teh Kao, Joel M. Huston, Mei Chang
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Publication number: 20150155142Abstract: Methods and apparatus for in-situ cleaning of substrate processing chambers are provided herein. A substrate processing chamber may include a chamber body enclosing an inner volume; a chamber lid removably coupled to the chamber body and including a first flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first outlet; a chamber floor including a second flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first inlet; and a pump ring disposed in and in fluid communication with the inner volume, the pump ring comprising an upper chamber fluidly coupled to a lower chamber, and a second outlet fluidly coupled to the lower chamber to selectively open or seal the inner volume to or from the second outlet.Type: ApplicationFiled: December 2, 2014Publication date: June 4, 2015Inventors: JOEL M. HUSTON, NICHOLAS R. DENNY, CHIEN-TEH KAO