Patents by Inventor Johan Frederik Dijksman

Johan Frederik Dijksman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110266706
    Abstract: A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.
    Type: Application
    Filed: May 2, 2011
    Publication date: November 3, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Frederik DIJKSMAN, Arie Jeffrey DEN BOEF, Sander Frederik WUISTER, Martinus Bernardus VAN DER MARK
  • Publication number: 20110268869
    Abstract: An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.
    Type: Application
    Filed: July 15, 2011
    Publication date: November 3, 2011
    Applicants: KONINKLIJKE PHILIPS ELECTRONICS N.V., ASML NETHERLANDS B.V.
    Inventors: Johan Frederik DIJKSMAN, Antonius Johannes Joseph Wismans, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
  • Publication number: 20110266255
    Abstract: A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.
    Type: Application
    Filed: July 12, 2011
    Publication date: November 3, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik WUISTER, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Patent number: 8015939
    Abstract: An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Frederik Dijksman, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Patent number: 8001924
    Abstract: An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: August 23, 2011
    Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.
    Inventors: Johan Frederik Dijksman, Antonius Johannes Joseph Wismans, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
  • Patent number: 7998651
    Abstract: A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: August 16, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Patent number: 7946837
    Abstract: In an embodiment, an imprint lithography apparatus is disclosed that includes a support structure configured support an imprint template, the imprint template having a neutral plane which substantially bisects the imprint template, and an actuator located in a position such that, when the imprint template is supported by the support structure, the actuator is located between the support structure and a side of the imprint template, wherein the actuator is configured to meet the imprint template at a location which is displaced from the neutral plane of the imprint template.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: May 24, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram
  • Patent number: 7943080
    Abstract: A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: May 17, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Frederik Dijksman, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Publication number: 20110049097
    Abstract: In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
    Type: Application
    Filed: August 26, 2010
    Publication date: March 3, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Sander Frederik WUISTER, Vadim Yevgenyevich Banine, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Roelof Koole
  • Patent number: 7878791
    Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
    Type: Grant
    Filed: March 1, 2006
    Date of Patent: February 1, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Klaus Simon, Karel Diederick Van Der Mast, Johan Frederik Dijksman
  • Publication number: 20110017612
    Abstract: The inventions relates to a kit comprising a swallowable capsule (1, 45) with a potentiometric sensor (3), such as a pH sensor, with an unfilled electrolyte cell (31). The kit further includes a separate container (46) containing a liquid electrolyte. The kit can, e.g., be packed in a blister package. After unpacking the capsule the electrolyte cell (31) is filled with the electrolyte.
    Type: Application
    Filed: March 24, 2009
    Publication date: January 27, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Johan Frederik Dijksman, Anke Pierik, Judith Margreet Rensen, Jeff Shimizu, Petrus Leonardus Adrianus Van Der Made, Michel Gerardus Pardoel, Frits Tobi De Jongh, Johan Gerard Kleibeuker
  • Publication number: 20110001254
    Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 6, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Andre Bernardus Jeunink, Arie Jeffrey Den Boef, Vadim Yevgenyevich Banine, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Johan Frederik Dijksman, Carolus Johannes Catharina Schoormans, Adrianus Hendrik Koevoets, Catharinus De Schiffart, Sander Frederik Wuister
  • Patent number: 7862756
    Abstract: A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: January 4, 2011
    Assignee: ASML Netherland B.V.
    Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Patent number: 7854877
    Abstract: An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another.
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: December 21, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
  • Publication number: 20100228082
    Abstract: A device or support, system and method are provided for precisely targeted and/or highly controlled interaction with a targeted cell or tissue in a body, with the support providing an ergonomic connecting interface for selectively connecting the support to a cell or tissue with at least minimal adverse affect to such cell or tissue, the system providing a remote facility that may be operatively associated with the support, and the method providing steps for employing the support and/or system so as to, inter alia, improve treatment, diagnostic and/or monitoring techniques and increase sensitivity and specificity with respect to interacting with, for example, diseased or abnormal cells or tissue without adversely effecting surrounding healthy cells or tissue, and/or the body in general.
    Type: Application
    Filed: April 12, 2007
    Publication date: September 9, 2010
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Hans Zou, Stein Kuiper, Bernardus Hendrikus Wilhelmus Hendriks, Jan Frederik Suijver, Anke Pierik, Judith Margreet Rensen, Johan Frederik Dijksman, Jeff Shimizu, Jacob Marinus Jan Den Toonder
  • Publication number: 20100193994
    Abstract: An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.
    Type: Application
    Filed: February 2, 2010
    Publication date: August 5, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Sander Frederik WUISTER, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Leendert Van Der Tempel
  • Publication number: 20100173803
    Abstract: The invention provides an ink jet device and method for producing a biological assay substrate (41) by releasing a plurality of substances onto the substrate (41) The device comprises at least a print head and a plurality of substance containers (60, 61, 62) connectable thereto, and mounting means (55) for the containers, whereby at least part of the containers (60, 61, 62) is provided with identification means (63) The device further comprises reading means to read information contained in the identification means (63).
    Type: Application
    Filed: August 10, 2007
    Publication date: July 8, 2010
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Anke Pierik, Johan Frederik Dijksman, Martin Maurice Vernhout, Leonardus Johannes Cornelius Van Den Besselaar, Dirkjan Bernhard Van Dam, Giovanni Nisato, Albert Hendrik Jan Immink
  • Publication number: 20100135855
    Abstract: The present invention relates to a method for depositing a substance on a support, comprising the provision of a substance solution, the provision of a transfer solution capable of activating the support, the deposition of the transfer solution on a predefined position of the support and the deposition of the substance solution on the same predefined position where the transfer solution was placed, whereby an immobilization of the deposited substance at the location of overlap between the deposited transfer solution and the deposited substance solution on said support is achieved. The present invention further relates to the use of a method for depositing a substance on a support for the manufacturing of a chip, a method for manufacturing a chip, wherein a substance is deposited on a chip substrate according to the method for depositing a substance on a support and a chip manufactured according to said method.
    Type: Application
    Filed: November 25, 2009
    Publication date: June 3, 2010
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: ANKE PIERIK, JOHAN FREDERIK DIJKSMAN
  • Patent number: 7677877
    Abstract: A lithographic apparatus is disclosed that includes an imprint template and a radiation source configured to cure photosensitive material, the radiation source including a laser or a light emitting diode. An imprint template is also disclosed.
    Type: Grant
    Filed: November 3, 2006
    Date of Patent: March 16, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Publication number: 20100063486
    Abstract: An electronic capsule (100) is provided. The capsule (100) has a discrete drive element (300) comprising: a housing (109), electronics for making the electronic capsule (100) operable, a pumping mechanism (115) for dosing and displacing a substance, a power source (105) for powering the electronic capsule (100) and enabling the electronics and the pumping mechanism (115) to operate, and a locking mechanism (130); and a discrete payload element (200) comprising: a housing (109), a reservoir (210) for storing the substance, one or more openings (250) in the housing (109) for releasing the substance from the reservoir (210) and a locking mechanism (230) for engaging the drive element locking mechanism (130). Engagement of the drive element locking mechanism (130) with the payload element locking mechanism (230) secures the drive element (300) to the payload element (200), thereby making the electronic capsule (100) operable and specific.
    Type: Application
    Filed: September 20, 2007
    Publication date: March 11, 2010
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Johan Frederik Dijksman, Anke Pierik, Judith Margreet Rensen, Jeff Shimizu, Hans Zou, Michel Pardoel, Frits Tobi De Jongh