Patents by Inventor Johannes Henricus Wilhelmus Jacobs

Johannes Henricus Wilhelmus Jacobs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method
    Patent number: 10551752
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
  • Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method
    Patent number: 10520837
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: December 31, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
  • Lithographic apparatus and device manufacturing method
    Patent number: 10495984
    Abstract: A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
  • Object holder and lithographic apparatus
    Patent number: 10481502
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: November 19, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER
    Publication number: 20190235397
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Application
    Filed: April 5, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VAN MEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190179232
    Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
    Type: Application
    Filed: February 15, 2019
    Publication date: June 13, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Nicolaas Rudolf KEMPER, Ferdy MIGCHELBRINK, Elmar EVERS
  • Lithographic apparatus and device manufacturing method involving a heater
    Patent number: 10254663
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: April 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190072863
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
    Type: Application
    Filed: November 1, 2018
    Publication date: March 7, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
  • Lithographic apparatus and device manufacturing method
    Patent number: 10209629
    Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: February 19, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
  • Lithographic apparatus and a device manufacturing method
    Patent number: 10191377
    Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: January 29, 2019
    Assignee: ASML Netherlands, B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
  • Thermal conditioning unit, lithographic apparatus and device manufacturing method
    Patent number: 10191395
    Abstract: A thermal conditioning unit to thermally condition a substrate in a lithographic apparatus, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: January 29, 2019
    Assignee: ASML Neatherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Jan Steven Christiaan Westerlaken
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 10175585
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: January 8, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Support apparatus, lithographic apparatus and device manufacturing method
    Patent number: 10120292
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
    Type: Grant
    Filed: October 18, 2016
    Date of Patent: November 6, 2018
    Assignee: ASML NETHERLANDS, B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
  • Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method
    Publication number: 20180284627
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Application
    Filed: February 16, 2018
    Publication date: October 4, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
  • OBJECT HOLDER AND LITHOGRAPHIC APPARATUS
    Publication number: 20180267412
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Application
    Filed: March 12, 2018
    Publication date: September 20, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
  • THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180164704
    Abstract: A thermal conditioning unit to thermally condition a substrate in a lithographic apparatus, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.
    Type: Application
    Filed: December 28, 2017
    Publication date: June 14, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus JACOBS, Jan Steven Christiaan Westerlaken
  • Sensor, lithographic apparatus and device manufacturing method
    Patent number: 9971254
    Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
    Type: Grant
    Filed: September 1, 2017
    Date of Patent: May 15, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Haico Victor Kok, Yuri Johannes Gabriël Van De Vijver, Johannes Antonius Maria Van De Wal, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert-Jan Voogd, Jan Steven Christiaan Westerlaken, Johannes Hubertus Antonius Van De Rijdt, Allard Eelco Kooiker, Wilhelmina Margareta Jozef Hurkens-Mertens, Yohann Bruno Yvon Teillet
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180081285
    Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
    Type: Application
    Filed: November 28, 2017
    Publication date: March 22, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Nicolaas Rudolf KEMPER, Ferdy MIGCHELBRINK, Elmar EVERS
  • Object holder and lithographic apparatus
    Patent number: 9915877
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: March 13, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
  • Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method
    Patent number: 9897928
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: February 20, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks