Patents by Inventor Johannes Henricus Wilhelmus Jacobs
Johannes Henricus Wilhelmus Jacobs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9268242Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: GrantFiled: August 26, 2010Date of Patent: February 23, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
-
Publication number: 20160048085Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: ApplicationFiled: October 13, 2015Publication date: February 18, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VERMEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPA Y, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
-
Patent number: 9229340Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: GrantFiled: September 25, 2013Date of Patent: January 5, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Joost Jeroen Ottens, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, William Peter Van Drent, Frank Staals, Lukasz Jerzy Macht, Erik Willem Bogaart
-
Patent number: 9188880Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: GrantFiled: November 3, 2011Date of Patent: November 17, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
-
Publication number: 20150309420Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: March 20, 2015Publication date: October 29, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
-
Publication number: 20150205214Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.Type: ApplicationFiled: April 1, 2015Publication date: July 23, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Johannes Henricus Wilhelmus JACOBS, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Marco Koert STAVENGA, Bob STREEFKERK, Martinus Cornelis Maria VERHAGEN, Lejla SEUNTIENS-GRUDA
-
Patent number: 9052612Abstract: A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure.Type: GrantFiled: May 14, 2009Date of Patent: June 9, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Marcus Martinus Petrus Adrianus Vermeulen, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens
-
Publication number: 20150131064Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: ApplicationFiled: May 7, 2013Publication date: May 14, 2015Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
-
Patent number: 9025127Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.Type: GrantFiled: September 23, 2011Date of Patent: May 5, 2015Assignee: ASML Netherlands B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
-
Publication number: 20150109599Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: ApplicationFiled: May 17, 2013Publication date: April 23, 2015Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Raymond Wilhelmus Louis Laffarre, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum, Robert De Jong
-
Patent number: 9013682Abstract: The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.Type: GrantFiled: June 20, 2008Date of Patent: April 21, 2015Assignee: ASML Netherlands B.V.Inventors: Rene Theodorus Petrus Compen, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens, Martin Frans Pierre Smeets
-
Patent number: 8994917Abstract: An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article.Type: GrantFiled: July 22, 2009Date of Patent: March 31, 2015Assignee: ASML Netherlands B.V.Inventors: Joost Jeroen Ottens, Johannes Henricus Wilhelmus Jacobs
-
Patent number: 8988651Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: September 23, 2011Date of Patent: March 24, 2015Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
-
Publication number: 20150077728Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.Type: ApplicationFiled: March 19, 2013Publication date: March 19, 2015Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Haico Victor Kok, Yuri Johannes Gabriƫl Van De Vijver, Johannes Antonius Maria Van De Wal, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Jan Steven Christiaan Westerlaken, Johannes Hubertus Antonius Van De Rijdt, Allard Eelco Kooiker, Wilhelmina Margareta Jozef Hurkens-Mertens, Yohann Bruno Yvon Teillet
-
Patent number: 8982316Abstract: A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system.Type: GrantFiled: June 12, 2009Date of Patent: March 17, 2015Assignee: ASML Netherlands B.V.Inventors: Axel Sebastiaan Lexmond, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Leonard Ferdinand Gerard Geers
-
Publication number: 20150070666Abstract: A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.Type: ApplicationFiled: April 16, 2013Publication date: March 12, 2015Applicant: ASML Netherlands B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Jan Steven Christiaan Westerlaken
-
Patent number: 8976334Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: September 22, 2011Date of Patent: March 10, 2015Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
-
Publication number: 20150055102Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.Type: ApplicationFiled: August 29, 2014Publication date: February 26, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Robert Douglas WATSO, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
-
Patent number: 8958051Abstract: An apparatus configured to de-gas a liquid includes a semi-permeable membrane having a first side on which the liquid is provided; and (i) a vaporizer configured to provide vapor of the liquid to a second side of the membrane; or (ii) a gas inlet configured to provide a gas to the second side of the membrane, the gas adapted to dissociate when dissolved in the liquid and an ion exchanger for the liquid downstream of the semi-permeable membrane.Type: GrantFiled: December 22, 2011Date of Patent: February 17, 2015Assignee: ASML Netherlands B.V.Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederick De Graaf, Johannes Henricus Wilhelmus Jacobs, Franciscus Johannes Herman Maria Teunissen, Jurgen Benischek
-
Patent number: 8958054Abstract: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.Type: GrantFiled: July 15, 2011Date of Patent: February 17, 2015Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Ferdy Migchelbrink