Patents by Inventor Johannes Henricus Wilhelmus Jacobs
Johannes Henricus Wilhelmus Jacobs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9891541Abstract: A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.Type: GrantFiled: April 16, 2013Date of Patent: February 13, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Jan Steven Christiaan Westerlaken
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Patent number: 9857695Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: August 29, 2016Date of Patent: January 2, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Publication number: 20170363964Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.Type: ApplicationFiled: September 1, 2017Publication date: December 21, 2017Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Haico Victor KOK, Yuri Johannes Gabriël VAN DE VIJVER, Johannes Antonius Maria VAN DE WAL, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Robbert-Jan VOOGD, Jan Steven Christiaan WESTERLAKEN, Johannes Hubertus Antonius VAN DE RIJDT, Allard Eelco KOOIKER, Wilhelmina Margareta Jozef HURKENS-MERTENS, Yohann Bruno Yvon TEILLET
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Publication number: 20170315454Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: ApplicationFiled: June 21, 2017Publication date: November 2, 2017Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
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Patent number: 9785055Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: May 7, 2013Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Patent number: 9753382Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.Type: GrantFiled: March 19, 2013Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Haico Victor Kok, Yuri Johannes Gabriël Van De Vijver, Johannes Antonius Maria Van De Wal, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Jan Steven Christiaan Westerlaken, Johannes Hubertus Antonius Van De Rijdt, Allard Eelco Kooiker, Wilhelmina Margareta Jozef Hurkens-Mertens, Yohann Bruno Yvon Teillet
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Publication number: 20170212421Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.Type: ApplicationFiled: April 7, 2017Publication date: July 27, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Hrishikesh PATEL, Johannes Henricus Wilhelmus JACOBS, Gerardus Adrianus Antonius Maria KUSTERS, Thibault Simon Mathieu LAURENT, Marcio Alexandre Cano MIRANDA, Ruud Hendricus Martinus Johannes BLOKS, Peng FENG, Johan Gertrudis Cornelis KUNNEN
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Patent number: 9696638Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: GrantFiled: December 10, 2015Date of Patent: July 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Joost Jeroen Ottens, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, William Peter Van Drent, Frank Staals, Lukasz Jerzy Macht, Erik Willem Bogaart
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Publication number: 20170139333Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.Type: ApplicationFiled: January 26, 2017Publication date: May 18, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Johannes Henricus Wilhelmus JACOBS, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Marco Koert STAVENGA, Bob STREEFKERK, Martinus Cornelis Maria VERHAGEN, Lejla SEUNTIENS-GRUDA
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Patent number: 9632435Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: GrantFiled: March 11, 2011Date of Patent: April 25, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
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Patent number: 9618858Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.Type: GrantFiled: January 20, 2011Date of Patent: April 11, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendrikus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
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Publication number: 20170090304Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: ApplicationFiled: October 18, 2016Publication date: March 30, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johanne De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Patent number: 9581914Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.Type: GrantFiled: April 1, 2015Date of Patent: February 28, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
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Publication number: 20160370713Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: August 29, 2016Publication date: December 22, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Patent number: 9507275Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: May 17, 2013Date of Patent: November 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Patent number: 9482967Abstract: An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.Type: GrantFiled: September 21, 2011Date of Patent: November 1, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus Van De Kerkhof, Johannes Henricus Wilhelmus Jacobs, Tammo Uitterdijk, Nicolas Alban Lallemant
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Patent number: 9429853Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.Type: GrantFiled: March 20, 2015Date of Patent: August 30, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Publication number: 20160109812Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: ApplicationFiled: December 10, 2015Publication date: April 21, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Joost Jeroen OTTENS, Emiel Jozef Melanie EUSSEN, Johannes Henricus Wilhelmus JACOBS, William Peter VAN DRENT, Frank STAALS, Lukasz Jerzy MACHT, Erik Willem BOGAART
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Patent number: 9280063Abstract: A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m·K) at 298 K.Type: GrantFiled: August 8, 2012Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Martijn Houben, Thibault Simon Mathieu Laurent, Frank Johannes Jacobus Van Boxtel, Sander Catharina Reinier Derks
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Patent number: 9268236Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.Type: GrantFiled: June 11, 2010Date of Patent: February 23, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen