Abstract: A method of forming a bump, a method of forming an image sensor using the method, a semiconductor chip and the sensor so formed. According to a method of forming the bump, a conductive pad is used as a seed layer to form the bump by a plating process. Since the conductive pad is used as a seed layer, it is not necessary to form an additional aluminum pad or seed layer and the manufacturing process is simplified. The conductive pad and the bump are formed of the same materials simplifying the manufacturing a process.

Abstract: An image sensor includes a photodiode formed in substrate, an insulating interlayer structure formed on the substrate, a metal structure formed in the insulating interlayer structure, a dummy pattern formed on the insulating interlayer structure, and a light-shielding layer pattern enclosing the dummy pattern. The dummy pattern is at least partially overlapped by the metal structure and the light-shielding layer pattern is at least partially overlapped by the photodiode.

Abstract: In order to be capable of a chemical reaction, analysis or the like wherein a small amount of samples is used, a reactor comprises a flat plate-like first substrate the inside of which is provided with a heating means; and a flat plate-like second substrate, which is placed on the top of the above-described first substrate, and on a surface thereof to be placed on the top of the above-described first substrate a flow channel having a predetermined contour has been defined.

Abstract: Methods of forming a dielectric layer of a MIM capacitor can include forming a passivation layer on a dielectric layer of a MIM capacitor to separate the dielectric layer from direct contact with an overlying photo-resist pattern. Related capacitor structures are also disclosed.

Abstract: A method of forming an image sensor is provided. The method includes forming a protection insulating layer, a lower mold insulating layer and an upper mold insulating layer over a semiconductor substrate in which a plurality of photodiodes are spaced apart from one another. The method further includes forming a dummy pattern contact with the lower mold insulating layer in the upper mold insulating layer, forming a preliminary cavity exposing the lower mold insulating layer contact with the dummy pattern by selectively removing the dummy pattern, and forming a cavity exposing the protection insulating layer over the photodiode by anisotropically etching the exposed lower mold insulating layer.

Abstract: An image sensor includes a photodiode formed in substrate, an insulating interlayer structure formed on the substrate, a metal structure formed in the insulating interlayer structure, a dummy pattern formed on the insulating interlayer structure, and a light-shielding layer pattern enclosing the dummy pattern. The dummy pattern is at least partially overlapped by the metal structure and the light-shielding layer pattern is at least partially overlapped by the photodiode.

Abstract: In order to be capable of handling quantitatively a liquid in a simple structure by only easy operations, a control mechanism comprises a first flow channel and a second flow channel each extending along a predetermined direction; and a third flow channel having a thinner thickness than that of the first flow channel and that of the second flow channel; the above-described third flow channel being opened on flow channel walls of the first flow channel and the second flow channel, respectively, whereby the third flow channel links the first flow channel to the second flow channel; a liquid introduced into the first flow channel being pulled in the third flow channel due to a capillary phenomenon through an opening of the third flow channel opened on the flow channel wall of the first flow channel, and then, the liquid remained in the first flow channel being removed to prepare a droplet having a volume corresponding to a capacity of the third flow channel.

Abstract: In order to be capable of a chemical reaction, analysis or the like wherein a small amount of samples is used, a reactor comprises a flat plate-like first substrate the inside of which is provided with a heating means; and a flat plate-like second substrate, which is placed on the top of the above-described first substrate, and on a surface thereof to be placed on the top of the above-described first substrate a flow channel having a predetermined contour has been defined.

Abstract: In order to reduce a treating time for distributing micro-substances, for example, particles, molecules and the like such as cells, organelles, proteins, and nucleic acids, there is provided a microchip for aqueous distribution comprising a micro channel having a predetermined shape, which is defined on a flat plate substrate; and a plurality of branched channels, each of which has a predetermined shape and is defined on the substrate, besides these branched channels are linked to only either end of the micro channel.