Patents by Inventor Jun Iwashita
Jun Iwashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120282551Abstract: A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or R3 and R4 may be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond.Type: ApplicationFiled: February 22, 2012Publication date: November 8, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Kensuke MATSUZAWA, Jun IWASHITA, Yoshitaka KOMURO, Masatoshi ARAI
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Publication number: 20120251951Abstract: A resist composition including: a base component (A) that exhibits changed solubility in a developing solution by action of acid; and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) includes a resin component (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below or general formula (a0-2) shown below; and the acid generator component (B) includes an acid generator (B1) including a compound represented by general formula (b0-1) or (b0-2) shown below:Type: ApplicationFiled: March 19, 2012Publication date: October 4, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Jun Iwashita, Kensuke Matsuzawa
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Patent number: 8268530Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.Type: GrantFiled: April 19, 2010Date of Patent: September 18, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshiyuki Utsumi, Jun Iwashita
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Publication number: 20120208128Abstract: A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the base component (A) including a resin component (A1) containing a structural unit (a0-1) having a group represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid.Type: ApplicationFiled: February 10, 2012Publication date: August 16, 2012Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daichi Takaki, Daiju Shiono, Masatoshi Arai, Jun Iwashita, Kenri Konno
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Publication number: 20120208124Abstract: The present invention is related to a resist composition for EUV exhibiting E0KrF greater than E0EUV, wherein E0KrF is a sensitivity to KrF light of 248 nm, and E0EUV is a sensitivity to EUV light, and a method of producing a resist composition for EUV including preparing the resist composition so that E0KrF is greater than E0EUV, and a method of forming a resist pattern, including: applying the resist composition for EUV to a substrate to form a resist film on the substrate; conducting EUV exposure of the resist film; and developing the resist film to form a resist pattern. According to the present invention, a resist composition for EUV exhibiting excellent lithography properties and pattern shape in EUV lithography, a method of producing the resist composition for EUV, and a method of forming a resist pattern that uses the resist composition for EUV can be provided.Type: ApplicationFiled: February 6, 2012Publication date: August 16, 2012Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Kenri Konno
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Patent number: 8232040Abstract: A positive resist composition including a base material component (A) that exhibits increased solubility in an alkali developing solution under action of an acid; and an acid generator component (B) that generates an acid upon exposure, wherein the base material component (A) includes a polymeric compound (A1) having a structural unit (a10) derived from hydroxystyrene and a structural unit (a11) represented by general formula (a11-1) shown below: wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, or a halogenated alkyl group of 1 to 5 carbon atoms; R21 represents an alkyl group; and R22 represents a group that forms an aliphatic monocyclic group of 7 to 10-membered ring together with the carbon atom to which this R22 group is bonded.Type: GrantFiled: November 17, 2009Date of Patent: July 31, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Takeyoshi Mimura
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Patent number: 8198004Abstract: A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.Type: GrantFiled: October 15, 2008Date of Patent: June 12, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu, Toshikazu Tachikawa, Jun Iwashita, Keita Ishiduka, Tomotaka Yamada, Toshikazu Takayama, Masaaki Yoshida
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Publication number: 20120100487Abstract: A resist composition including a base component that generates acid upon exposure and also exhibits increased polarity by action of acid, the base component including a polymeric compound having a structural unit that generates acid upon exposure; a structural unit derived from an acrylate ester, in which a hydrogen atom bonded to a carbon atom on the ?-position may be substituted with a substituent, and also includes an acid decomposable group that exhibits increased polarity by action of acid; and a structural unit represented by a particular general formula.Type: ApplicationFiled: October 19, 2011Publication date: April 26, 2012Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Daichi Takaki, Daiju Shiono, Kenri Konno, Kensuke Matsuzawa, Jun Iwashita
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Publication number: 20110311912Abstract: A positive resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under action of acid; and a sensitizer (G), wherein the sensitizer (G) is at least one compound selected from the group consisting of a polymeric compound (G1) having a core portion that includes a hydrocarbon group or a heterocycle of two or more valences and also at least one arm portion that is bonded to the core portion and is represented by general formula (1) shown below, and a polymeric compound (G2) having a core portion that includes a polymer having a molecular weight of 500 or more and 20,000 or less and also at least one arm portion that is bonded to the core portion and is represented by general formula (1) shown below; and either the base component (A) includes a resin component (A1) that generates acid upon exposure and also exhibits increased solubility in an alkali developing solution under action of acid, or the positive resist composition further contains an aType: ApplicationFiled: June 8, 2011Publication date: December 22, 2011Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Jun IWASHITA, Masahito YAHAGI, Kenri KONNO, Isamu TAKAGI
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Patent number: 8043795Abstract: Disclosed is a method of forming a resist pattern, including: applying a positive resist composition on a support 1 to form a first resist film 2; selectively exposing the first resist film 2 through a first mask pattern, and developing it to form a first resist pattern 3; applying a negative resist composition including an organic solvent (S?) containing an alcohol-based organic solvent on the support 1 that the first resist pattern 3 is formed, thereby forming a second resist film 6; and selectively exposing the second resist film 6 through a second mask pattern, and developing it to form a resist pattern denser than the first resist pattern 3.Type: GrantFiled: September 18, 2007Date of Patent: October 25, 2011Assignee: Tokyo Ohika Kogyo Co., Ltd.Inventor: Jun Iwashita
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Patent number: 8034536Abstract: A novel resist composition and method of forming a resist pattern that can be used in lithography applications. The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a polymer compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below, wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, R2 and R3 each independently represents a hydrogen atom or an alkyl group that may include an oxygen atom at an arbitrary position, or R2 and R3 are bonded together to form an alkylene group, and W represents a cyclic alkylene group that may include an oxygen atom at an arbitrary position.Type: GrantFiled: May 26, 2009Date of Patent: October 11, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Shogo Matsumaru, Sho Abe
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Patent number: 8021824Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.Type: GrantFiled: February 6, 2008Date of Patent: September 20, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Sho Abe, Makiko Irie, Takeshi Iwai
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Patent number: 7939243Abstract: A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.Type: GrantFiled: December 26, 2006Date of Patent: May 10, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masaru Takeshita, Jun Iwashita, Takeshi Iwai, Yuji Ohgomori
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Publication number: 20100273106Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.Type: ApplicationFiled: April 19, 2010Publication date: October 28, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshiyuki Utsumi, Jun Iwashita
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Patent number: 7820360Abstract: There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof. The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below. (wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R0 represents an alkyl group containing a hydroxyl group.) Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.Type: GrantFiled: August 17, 2006Date of Patent: October 26, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Ayako Kusaka
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Publication number: 20100248144Abstract: The positive resist composition including a base material component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid generator component (B) which generates acid upon exposure, the positive resist composition characterized in that in those cases where a resist film is formed on a substrate using the positive resist composition and is then subjected to a selective exposure and developing to form a hole pattern, followed by a bake treatment, a bake treatment temperature (Tf), at which the size of the hole is reduced by 10%, as compared to the size of the hole before the bake treatment, is at least 100° C.Type: ApplicationFiled: March 23, 2010Publication date: September 30, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takeshi IWAI, Jun IWASHITA, Daichi TAKAKI
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Publication number: 20100159389Abstract: A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.Type: ApplicationFiled: December 26, 2006Publication date: June 24, 2010Inventors: Masaru Takeshita, Jun Iwashita, Takeshi Iwai, Yuji Ohgomori
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Publication number: 20100143845Abstract: A positive resist composition including a base material component (A) that exhibits increased solubility in an alkali developing solution under action of an acid; and an acid generator component (B) that generates an acid upon exposure, wherein the base material component (A) includes a polymeric compound (A1) having a structural unit (a10) derived from hydroxystyrene and a structural unit (a11) represented by general formula (a11-1) shown below: wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, or a halogenated alkyl group of 1 to 5 carbon atoms; R21 represents an alkyl group; and R22 represents a group that forms an aliphatic monocyclic group of 7 to 10-membered ring together with the carbon atom to which this R22 group is bonded.Type: ApplicationFiled: November 17, 2009Publication date: June 10, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Jun Iwashita, Takeyoshi Mimura
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Patent number: 7709179Abstract: A chemically amplified negative resist composition is provided in addition to a method of forming a resist pattern from which a desirable pattern shape can be obtained.Type: GrantFiled: April 7, 2006Date of Patent: May 4, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventor: Jun Iwashita
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Publication number: 20100081080Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.Type: ApplicationFiled: February 6, 2008Publication date: April 1, 2010Inventors: Jun Iwashita, Sho Abe, Makiko Irie, Takeshi Iwai