Abstract: A semiconductor memory device is operated by, inter alia, performing least significant bit programs for pages in a first page group, performing least significant bit programs for pages in a second page group, and performing most significant bit programs for the pages in the first page group. The distance between the second page group and the common source line is greater than that between the first page group and the common source line.

Abstract: A semiconductor memory device includes a memory string including a first cells portion and a second cells portion each including a multiple of memory cells, the second cells portion being disposed over the first cells portion, and a control logic configured to control a peripheral circuit such that each of at least two memory cells in a top of the first cells portion and each of at least two memory cells in a bottom of the second cells portion is programmed to have a smaller data bit than remaining memory cells in the first and second cells portions.

Abstract: A semiconductor memory device includes: a plurality of first channel columns including a plurality of first channel layers that are arranged in a direction and offset by their centers; a plurality of second channel columns alternately arranged with the plurality of first channel columns and having a plurality of second channel layers that are arranged in the direction and offset by their centers; first insulating layers and first conductive layers alternately stacked to surround the first channel layers; second insulating layers and second conductive layers stacked to surround the second channel layers; and spacers placed between the first channel columns and the second channel columns and interposed between the first conductive layers and the second conductive layers.

Abstract: A semiconductor device includes a substrate including a cell region and a peripheral region, a cell stacked structure stacked on the substrate in the cell region, a channel layer in one structure penetrating the cell stacked structure, a driving transistor formed in the peripheral region, and a plug structure coupled to the driving transistor and including a stacking structure of at least two contact plugs shorter than the channel layer, wherein each of the contact plugs is arranged at a same height as a part of the cell stacked structure.

Abstract: A semiconductor memory device, a memory system having the same, and a method of operating the same are provided. The semiconductor memory device includes a plurality of memory cells electrically coupled between a source select transistor and a drain select transistor, a peripheral circuit configured to perform a program operation on the plurality of memory cells, and a control logic unit configured to control the operation of the peripheral circuit so that at least two memory cells of the plurality of memory cells adjacent to the source select transistor and at least two memory cells of the plurality of memory cells adjacent to the drain select transistor are programmed to have a relatively fewer number of data bits than that of remaining memory cells of the plurality of memory cells in the program operation.

Abstract: A semiconductor device includes a memory block including memory cells connected to a word line, and an operation circuit suitable for consecutively applying a main program pulse and a sub program pulse to the word line to perform a program operation of the memory cells, and suitable for performing a program verification operation of the memory cells, wherein the sub program pulse has a lower voltage level than the main program pulse.

Abstract: A semiconductor device includes a first memory string and a second memory string. The first memory string includes a plurality of first main memory cells formed on a pipe transistor of a semiconductor substrate and a plurality of first dummy memory cells connected between the first main memory cells and a common source line. The second memory string includes a plurality of second main memory cells formed on the pipe transistor and a plurality of second dummy memory cells connected between the second main memory cells and a bit line. The number of the second dummy memory cells is greater than the number of the first dummy memory cells.

Abstract: A method for fabricating a non-volatile memory device includes: providing a substrate which includes a cell region where a plurality of memory cells are to be formed and a peripheral circuit region where a plurality of peripheral circuit devices are to be formed; forming the memory cells that are stacked perpendicularly to the substrate of the cell region; and forming a first conductive layer for forming a gate electrode of a selection transistor over the memory cells while forming the first conductive layer in the peripheral circuit region simultaneously, wherein the first conductive layer of the peripheral circuit region functions as a resistor body of at least one peripheral circuit device of the peripheral circuit devices.

Abstract: A semiconductor memory device may include source selection transistors coupled to a common source line, source side dummy memory cells coupled between the source selection transistors and the normal memory cells, and drain selection transistors coupled to a bit line. The semiconductor memory device may include drain side dummy memory cells coupled between the drain selection transistors and the normal memory cells. A number of the source side dummy memory cells is less than a number of the drain side dummy memory cells, and a number of the drain selection transistors may be greater than the source selection transistors.

Abstract: A semiconductor memory device may include source selection transistors coupled to a common source line, source side dummy memory cells coupled between the source selection transistors and the normal memory cells, and drain selection transistors coupled to a bit line. The semiconductor memory device may include drain side dummy memory cells coupled between the drain selection transistors and the normal memory cells. A number of the source side dummy memory cells is less than a number of the drain side dummy memory cells, and a number of the drain selection transistors may be greater than the source selection transistors.

Abstract: An operating method of a semiconductor memory device includes performing a first read operation on main cells of a first page with an initial read voltage, performing a second read operation on the main cells of the first page with a read voltage corresponding to a read retry number when the number of error bits generated as results of performing the first read operation exceeds the number of error-correctable bits, and storing the read retry number in spare cells of the first page while the second read operation is performed, and repeatedly performing the second read operation and repeatedly storing the read retry number until the number of error bits generated as results of performing the second read operation becomes the number of error-correctable bits or less.

Abstract: A memory system includes: a memory controller configured to change data to be stored in memory cells according to an address of a weak cell in order to store changed data having a lower program level than a highest program level among a plurality of program levels in peripheral cells adjacent to the weak cell; and a memory device configured to execute a program loop in order to store the changed data in a selected page.

Abstract: A semiconductor memory device is operated by, inter alia, performing least significant bit programs for pages in a first page group, performing least significant bit programs for pages in a second page group, and performing most significant bit programs for the pages in the first page group. The distance between the second page group and the common source line is greater than that between the first page group and the common source line.

Abstract: By programming the memory cells MC0, MC1, MCn, MCn-1 adjacent to the source and drain select transistors SST and DST using different program methods, a total number of data bits of the memory cells MC0, MC1 adjacent to the source side dummy memory cell SPMC may be three. The TLC program method may have eight threshold voltage distributions PV0-PV7 to store the three-bit data. When programming the two memory cells using the SLC program method and the MLC program method, the three-bit data may be stored using six threshold voltage distributions, PV0 and PV1 threshold voltage distributions in the SLC program method and PV0-PV3 threshold voltage distributions in the MLC program method.

Abstract: A semiconductor memory device may include source selection transistors coupled to a common source line, source side dummy memory cells coupled between the source selection transistors and the normal memory cells, and drain selection transistors coupled to a bit line. The semiconductor memory device may include drain side dummy memory cells coupled between the drain selection transistors and the normal memory cells. A number of the source side dummy memory cells is less than a number of the drain side dummy memory cells, and a number of the drain selection transistors may be greater than the source selection transistors.

Abstract: A semiconductor device includes a memory block including memory cells connected to a word line, and an operation circuit suitable for consecutively applying a main program pulse and a sub program pulse to the word line to perform a program operation of the memory cells, and suitable for performing a program verification operation of the memory cells, wherein the sub program pulse has a lower voltage level than the main program pulse.

Abstract: A semiconductor device includes a first memory string and a second memory string. The first memory string includes a plurality of first main memory cells formed on a pipe transistor of a semiconductor substrate and a plurality of first dummy memory cells connected between the first main memory cells and a common source line. The second memory string includes a plurality of second main memory cells formed on the pipe transistor and a plurality of second dummy memory cells connected between the second main memory cells and a bit line. The number of the second dummy memory cells is greater than the number of the first dummy memory cells.

Abstract: A semiconductor device may include a memory block including a plurality of memory cells, and an operation circuit configured to perform a first program loop, a second program loop, and a third program loop based on data stored in the memory cells. The first program loop may distribute threshold voltages of the memory cells into four levels. The second program loop may distribute the threshold voltages of the memory cells into seven levels. The third program loop may distribute the threshold voltages of the memory cells into eight levels.

Abstract: A non-volatile memory device includes a plurality of gate electrodes stacked over a semiconductor substrate and stretched in a first direction along the semiconductor substrate and a plurality of junction layers having a first region protruding from the semiconductor substrate and crossing the gate electrodes and a second region formed between the gate electrodes.

Abstract: A semiconductor memory device includes: a plurality of first channel columns including a plurality of first channel layers that are arranged in a direction and offset by their centers; a plurality of second channel columns alternately arranged with the plurality of first channel columns and having a plurality of second channel layers that are arranged in the direction and offset by their centers; first insulating layers and first conductive layers alternately stacked to surround the first channel layers; second insulating layers and second conductive layers stacked to surround the second channel layers; and spacers placed between the first channel columns and the second channel columns and interposed between the first conductive layers and the second conductive layers.