Patents by Inventor Kaori Kimura

Kaori Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8980451
    Abstract: According to one embodiment, in a method of manufacturing a magnetic recording medium which is configured such that a ferromagnetic recording part is formed on a substrate in a desired track pattern or a desired bit pattern, a ferromagnetic film is formed on the substrate, and then a mask is formed on the ferromagnetic film, the mask having an opening above a region for isolating the ferromagnetic film between tracks or bits. Subsequently, a B-based gas is radiated on the region of the ferromagnetic film through the opening of the mask, thereby increasing a B content of the region to nonmagnetize the region.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: March 17, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Kaori Kimura, Takeshi Iwasaki
  • Publication number: 20150069010
    Abstract: A patterning method includes steps of forming a first copolymer layer comprising a first diblock copolymer which has portions which are phase incompatible. The first copolymer layer is annealed to form a first phase pattern including a first phase dispersed in a second surrounding phase. The first copolymer is then etched forming a first topographic pattern that corresponds to the first phase pattern. A second copolymer layer of a second diblock copolymer is then formed over the first topographic pattern, and then annealed to generate a second phase pattern offset from the first topographic pattern. Etching is used to form a second topographic pattern corresponding to the second phase pattern. The first and second topographic patterns are then transferred to the substrate. The patterning method can be used, for example, to form patterned recording layers for magnetic storage devices.
    Type: Application
    Filed: February 28, 2014
    Publication date: March 12, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Akira WATANABE, Katsuya SUGAWARA, Kazutaka TAKIZAWA, Kaori KIMURA
  • Publication number: 20150072172
    Abstract: According to one embodiment, there is provided a pattern formation method including forming a target layer to be processed on a substrate, adding a second dispersion containing a polymer material including a polymer chain having a base metal at a terminal end and a second solvent to a first dispersion containing noble-metal microparticles and a first solvent, thereby preparing a noble-metal microparticle layer coating solution in which microparticles covered with the polymer material are dispersed, arranging the noble-metal microparticles covered with the polymer material on the target layer by using the noble-metal microparticle layer coating solution, and transferring a projections pattern of the noble-metal microparticles covered with the polymer material to the target layer.
    Type: Application
    Filed: January 10, 2014
    Publication date: March 12, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kazutaka TAKIZAWA, Kaori Kimura, Akihiko Takeo
  • Publication number: 20150069013
    Abstract: According to one embodiment, a magnetic recording layer is coated with a fine particle coating solution containing fine particles coated with a protective layer containing a first additive including a straight-chain structure for increasing wettability to the magnetic recording layer, and a carboxy group or the like, and a second additive including a carboxy group or the like and a polymerizable functional group, each fine particle having, on at least a surface thereof, a material selected from Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, and oxides thereof, thereby forming a fine particle monolayer, and heat or light energy is applied, thereby curing the protective layer and forming a periodic pattern.
    Type: Application
    Filed: January 10, 2014
    Publication date: March 12, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Kazutaka TAKIZAWA, Akira FUJIMOTO
  • Publication number: 20150072071
    Abstract: According to one embodiment, there is provided a pattern formation method including coating a substrate or mask layer with a fine particle coating solution containing fine particles including a protective group having a close surface polarity and containing, on at least surfaces thereof, a material selected from the group consisting of Al, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, and oxides thereof, a viscosity modifier, and a solvent for adjusting mixing of the viscosity modifier and the fine particles having the protective group, thereby forming a fine particle layer on the substrate or mask layer.
    Type: Application
    Filed: January 27, 2014
    Publication date: March 12, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Kazutaka Takizawa, Akira Fujimoto
  • Publication number: 20150069014
    Abstract: According to one embodiment, there is provided a pattern formation method including coating a substrate or mask layer with a fine particle coating solution containing fine particles including a protective group having a close surface polarity and containing, on at least surfaces thereof, a material selected from the group consisting of Al, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, Au, Ag, Pd, Cu, Pt and oxides thereof, a viscosity modifier, and a solvent for adjusting mixing of the viscosity modifier and the fine particles having the protective group to form a fine particle layer on the substrate or mask layer.
    Type: Application
    Filed: July 7, 2014
    Publication date: March 12, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Kazutaka TAKIZAWA, Akira FUJIMOTO
  • Publication number: 20150004438
    Abstract: According to one embodiment, there is provided a method for forming a pattern including forming an island-like metal underlayer comprised of a first metal, a phase-separated release layer including a first metal, a second metal, and a metal oxide, a mask layer, and a resist layer on a processed layer in this order, forming a concave-convex pattern on the resist layer, transferring the pattern to the mask layer, the phase-separated release layer, and the processed layer in this order, dissolving the phase-separated release layer using a peeling liquid for dissolving the first metal and the second metal, and removing the mask layer from the processed layer to expose the concave-convex pattern.
    Type: Application
    Filed: October 22, 2013
    Publication date: January 1, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kazutaka Takizawa, Akira Watanabe, Kaori Kimura, Takeshi Iwasaki, Akihiko Takeo
  • Patent number: 8858809
    Abstract: A manufacturing method of a magnetic recording medium includes steps of forming a magnetic recording layer, a first mask layer, a second mask layer containing silicon as primary component, a strip layer, a third mask layer, and a resist layer, a step of patterning the resist layer to provide a pattern, steps of transferring the pattern to the third mask layer, to the strip layer, and to the second mask layer, a step of removing the strip layer by wet etching and of stripping the third mask layer and the resist layer above the magnetic recording layer, steps of transferring the pattern to the first mask layer and to the magnetic recording layer, and a step of stripping the first mask layer remaining on the magnetic recording layer.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: October 14, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akira Watanabe, Kaori Kimura, Kazutaka Takizawa, Takeshi Iwasaki, Tsuyoshi Onitsuka, Akihiko Takeo
  • Publication number: 20140287266
    Abstract: According to exemplary embodiments, a pattern forming method includes: forming a diblock copolymer coating film by applying coating liquid containing a diblock copolymer including a chain of a first polymer and a chain of a second polymer which is not compatible with the first polymer, and a homopolymer having affinity with the first polymer, on a substrate, and drying the liquid; and performing phase separation of the first polymer and the second polymer by providing a coating film for solvent annealing using a solvent having compatibility with the second polymer.
    Type: Application
    Filed: September 3, 2013
    Publication date: September 25, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Akira WATANABE, Kazutaka TAKIZAWA, Kaori KIMURA
  • Publication number: 20140287265
    Abstract: According to one embodiment, a magnetic recording medium including a substrate and a magnetic recording layer formed on the substrate and including a plurality of projections is obtained. The array of the plurality of projections includes a plurality of domains in which the projections are regularly arranged, and a boundary region between the domains, in which the projections are irregularly arranged. The boundary region is formed along a perpendicular bisector of a line connecting the barycenters of adjacent projections.
    Type: Application
    Filed: July 12, 2013
    Publication date: September 25, 2014
    Inventors: Kaori Kimura, Kazutaka Takizawa, Akira Watanabe, Takeshi Iwasaki, Akihiko Takeo
  • Publication number: 20140247519
    Abstract: According to one embodiment, there is provided a magnetic recording medium which includes a base, a magnetic recording layer having convex-shaped magnetic layers, which is formed on the base, and a protective film formed on the magnetic recording layer. There are gaps in a region surrounded by the protective film, the surface of the base, and each side wall of each magnetic layer.
    Type: Application
    Filed: July 17, 2013
    Publication date: September 4, 2014
    Inventors: Kazutaka Takizawa, Akira Watanabe, Kaori Kimura, Tsuyoshi Onitsuka, Takeshi Iwasaki, Masahiro Takashita, Akihiko Takeo
  • Publication number: 20140248513
    Abstract: According to one embodiment, there is provided a method for producing a magnetic recording medium which includes forming a mask layer on a magnetic recording layer, applying metal fine particles on the mask layer, covering the metal fine particles with an overcoat layer, irradiating with energy beams through the overcoat layer so as to deactivate a protective coating of the metal fine particles, transferring a metal fine particle pattern from the mask layer to the magnetic recording layer, and removing the mask layer from the magnetic recording layer.
    Type: Application
    Filed: July 12, 2013
    Publication date: September 4, 2014
    Inventors: Kazutaka Takizawa, Akira Watanabe, Kaori Kimura, Tsuyoshi Onitsuka, Takeshi Iwasaki, Akihiko Takeo
  • Patent number: 8815336
    Abstract: According to one embodiment, there is provided a magnetic recording medium manufacturing method including forming a resist layer on a magnetic recording layer, patterning the resist layer, forming a magnetic pattern by performing ion implantation through the resist layer, partially modifying the surface of the magnetic recording layer, removing the resist, applying a self-organization material to the surface of the magnetic recording layer and forming a dotted mask pattern, and patterning the magnetic recording layer.
    Type: Grant
    Filed: October 23, 2012
    Date of Patent: August 26, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Masatoshi Sakurai, Kazuto Kashiwagi, Akihiko Takeo
  • Publication number: 20140147701
    Abstract: A magnetic recording medium is manufactured by forming a magnetic recording layer on a substrate, forming a protective layer on the magnetic recording layer, executing a sputtering process using a target containing a first ingredient and a second ingredient to form on the protective layer a grain-state mask layer that includes grains formed of the first ingredient and grain boundaries between the grains formed of the second ingredient, etching the grain boundaries so that a projection pattern of the grains is formed, and transferring the projection pattern of the grains to the magnetic recording layer.
    Type: Application
    Filed: April 23, 2013
    Publication date: May 29, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Takeshi IWASAKI, Kazutaka TAKIZAWA, Akira WATANABE, Kaori KIMURA, Tsuyoshi ONITSUKA
  • Publication number: 20140120375
    Abstract: According to one embodiment, a magnetic recording medium manufacturing method includes a step of coating the mask layer with a metal fine particle coating solution containing metal fine particles and a first solvent, thereby forming a metal fine particle coating layer having a multilayered structure of the metal fine particles, and a step of dropping, on the coating layer, a second solvent having a second solubility parameter having a difference of 0 to 12.0 from a first solubility parameter of the first solvent, thereby forming a monolayered metal fine particle film by washing away excessive metal fine particles and changing the multilayered structure of the metal fine particles into a monolayer. The projections pattern is made of the monolayered metal fine particle film.
    Type: Application
    Filed: January 29, 2013
    Publication date: May 1, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kazutaka TAKIZAWA, Kaori KIMURA, Akira WATANABE, Akihiko TAKEO
  • Publication number: 20140120249
    Abstract: According to one embodiment, in a magnetic recording medium manufacturing method, an inversion liftoff layer and pattern formation layer are formed on a layer on which an inverted pattern is to be formed, a depressions pattern is formed by patterning the pattern formation layer and transferred to the inversion liftoff layer, the surface of the layer on which an inverted pattern is to be formed is exposed by removing the inversion liftoff layer from depressions, an inversion layer is formed on the inversion liftoff layer and exposed layer, and the inversion liftoff layer is removed, thereby forming, on the exposed layer, an inversion layer having a projections pattern obtained by inverting the depressions pattern.
    Type: Application
    Filed: February 6, 2013
    Publication date: May 1, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Kazutaka TAKIZAWA, Akira WATANABE, Takeshi IWASAKI, Akihiko TAKEO
  • Patent number: 8703621
    Abstract: A manufacturing method of a magnetic recording medium according to one embodiment includes forming a mask layer having a pattern regularly arranged in a longitudinal direction on a magnetic recording medium containing a substrate and a magnetic recording layer, forming a recording portion having a magnetic pattern and a non-recording portion by patterning the magnetic recording layer, and submitting the mask layer to a peeling liquid to peel the mask layer. The mask layer contains a lamination layer of a lift-off layer, a first hard mask, and a second hard mask. The second hard mask is formed of a material that is different from the material of the first hard disk and the material is dissolvable in the same peeling liquid as the peeling liquid that dissolves the lift-off layer.
    Type: Grant
    Filed: July 5, 2012
    Date of Patent: April 22, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Kazutaka Takizawa, Masatoshi Sakurai, Akihiko Takeo
  • Patent number: 8652338
    Abstract: A magnetic recording medium a magnetic recording medium includes a soft magnetic layer formed on a substrate, magnetic patterns made of a protruded ferromagnetic layer separated from each other on the soft magnetic layer, and a nonmagnetic layer formed between the magnetic patterns, a nitrogen concentration therein being higher on a surface side than on a substrate side.
    Type: Grant
    Filed: November 15, 2012
    Date of Patent: February 18, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Yoshiyuki Kamata, Satoshi Shirotori, Tsuyoshi Onitsuka
  • Publication number: 20140004272
    Abstract: According to one embodiment, there is provided a magnetic recording medium manufacturing method including forming a resist layer on a magnetic recording layer, patterning the resist layer, forming a magnetic pattern by performing ion implantation through the resist layer, partially modifying the surface of the magnetic recording layer, removing the resist, applying a self-organization material to the surface of the magnetic recording layer and forming a dotted mask pattern, and patterning the magnetic recording layer.
    Type: Application
    Filed: October 23, 2012
    Publication date: January 2, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Masatoshi SAKURAI, Kazuto KASHIWAGI, Akihiko TAKEO
  • Publication number: 20140002929
    Abstract: A manufacturing method of a magnetic recording medium includes follows: forming a magnetic recording layer on a substrate; forming an under layer and a metal release layer that forms an alloy with the under layer on the magnetic recording layer in this order and forming an alloyed release layer by alloying the under layer and the metal release layer; forming a mask layer on the alloyed release layer; forming a resist layer on the mask layer; providing a protrusion-recess pattern by patterning the resist layer; transferring the protrusion-recess pattern to the mask layer; transferring the protrusion-recess pattern to the alloyed release layer; transferring the protrusion-recess pattern to the magnetic recording layer; dissolving the alloyed release layer by using a stripping solution and removing a layer formed on the alloyed release layer from an upper side of the magnetic recording layer.
    Type: Application
    Filed: October 24, 2012
    Publication date: January 2, 2014
    Inventors: Kazutaka TAKIZAWA, Akira Watanabe, Kaori Kimura, Takeshi Iwasaki, Akihiko Takeo