Patents by Inventor Kaori Kimura

Kaori Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8257560
    Abstract: A patterned media has a substrate, and a magnetic recording layer on the substrate including protruded magnetic patterns and a nonmagnetic material filled in between the protruded magnetic patterns. In the patterned media, a depth Db and a depth Da, which are defined that Db is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a first central part between the magnetic patterns adjacent to each other in a cross-track direction or a down-track direction, and Da is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a second central part in a portion surrounded by the magnetic patterns, have a relationship that the depth Da is greater than the depth Db.
    Type: Grant
    Filed: August 2, 2010
    Date of Patent: September 4, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Masatoshi Sakurai, Satoshi Shirotori, Kaori Kimura
  • Patent number: 8206602
    Abstract: According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: June 26, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Yousuke Isowaki, Yoshiyuki Kamata, Masatoshi Sakurai
  • Publication number: 20120087039
    Abstract: According to one embodiment, a magnetic recording medium includes a substrate, and a magnetic recording layer formed on the substrate. The magnetic recording layer includes recording portions having patterns regularly arranged in an longitudinal direction and containing cobalt and platinum, and non recording portions formed between the recording portions and containing boron and at least one light rare earth metal selected from the group consisting of yttrium, lanthanum, and cerium.
    Type: Application
    Filed: June 20, 2011
    Publication date: April 12, 2012
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Iwasaki, Kaori Kimura, Yoshiyuki Kamata, Tsuyoshi Onitsuka, Masatoshi Sakurai
  • Publication number: 20120082800
    Abstract: According to one embodiment, there is provided a method for manufacturing a magnetic recording medium, the method including: depositing a magnetic recording layer on a substrate; forming a mask on a region of the magnetic recording layer corresponding to a recording area; irradiating another region of the magnetic recording layer where the mask is not formed with an ion beam using a C-containing gas as a source gas to deactivate the another region and to thereby form a non-recording area; and forming a protective film over an entire surface of the substrate.
    Type: Application
    Filed: August 24, 2011
    Publication date: April 5, 2012
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Masatoshi SAKURAI, Kaori Kimura, Yoshiyuki Kamata, Takeshi Iwasaki
  • Publication number: 20120067844
    Abstract: According to one embodiment, in a method manufacturing a magnetic recording medium which is configured such that a ferromagnetic recording part is formed on a substrate in a desired track pattern or a desired bit pattern, a ferromagnetic film is formed on a substrate, and then a B thin film is formed on a region for isolating the ferromagnetic film between tracks or bits. Subsequently, ions are radiated on the B thin film, thereby increasing a B content of the region of the ferromagnetic film, on which the B thin film has been formed, and nonmagnetizing the region.
    Type: Application
    Filed: July 19, 2011
    Publication date: March 22, 2012
    Inventors: Yoshiyuki Kamata, Kaori Kimura, Takeshi Iwasaki
  • Publication number: 20120069468
    Abstract: According to one embodiment, in a method of manufacturing a magnetic recording medium which is configured such that a ferromagnetic recording part is formed on a substrate in a desired track pattern or a desired bit pattern, a ferromagnetic film is formed on the substrate, and then a mask is formed on the ferromagnetic film, the mask having an opening above a region for isolating the ferromagnetic film between tracks or bits. Subsequently, a B-based gas is radiated on the region of the ferromagnetic film through the opening of the mask, thereby increasing a B content of the region to nonmagnetize the region.
    Type: Application
    Filed: July 19, 2011
    Publication date: March 22, 2012
    Inventors: Yoshiyuki KAMATA, Kaori Kimura, Takeshi Iwasaki
  • Publication number: 20120067843
    Abstract: A method of forming a fine pattern according to an embodiment includes: forming a hard mask on a substrate; forming a mask reinforcing member on the hard mask; forming a di-block copolymer layer on the mask reinforcing member, the di-block copolymer layer comprising a sea-island structure; forming a pattern comprising a concave-convex structure in the di-block copolymer layer, with island portions of the sea-island structure being convex portions; and transferring the pattern onto the hard mask by performing etching on the mask reinforcing member and the hard mask, with a mask being the pattern formed in the di-block copolymer layer. The mask reinforcing member is comprised of a material having an etching speed that is higher than an etching speed for the hard mask and is lower than an etching speed for sea portions of the sea-island structure of the di-block copolymer layer.
    Type: Application
    Filed: March 16, 2011
    Publication date: March 22, 2012
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Akira Watanabe, Kaori Kimura, Yousuke Isowaki, Yoshiyuki Kamata, Naoko Kihara, Akira Kikitsu
  • Publication number: 20120052328
    Abstract: According to one embodiment, a method of manufacturing a patterned medium includes forming an implantation depth-adjusting layer above a magnetic recording layer, the magnetic recording layer being made of a material that is deactivated when implanted with a chemical species, and the implantation depth-adjusting layer being made of a material that is etched when irradiated with an ion beam of the chemical species and irradiating the implantation depth-adjusting layer with the ion beam to implant the chemical species into a part of the magnetic recording layer through the implantation depth-adjusting layer while etching the implantation depth-adjusting layer by an action of the ion beam to decrease a thickness of the implantation depth-adjusting laver.
    Type: Application
    Filed: June 22, 2011
    Publication date: March 1, 2012
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Masatoshi Sakurai, Kaori Kimura, Hiroyuki Hyodo, Takeshi Iwasaki
  • Publication number: 20120028076
    Abstract: According to one embodiment, a magnetic recording medium includes a substrate, a soft magnetic layer, an underlayer, a magnetic recording layer, and a protective layer, wherein the magnetic recording layer is provided with a pattern including recording portions and non-recording portions, the non-recording portions have a composition that is equal to a composition obtained by demagnetizing the recording portions, the non-recording portions contain at least one metal element selected from the group consisting of vanadium and zirconium and at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen, and the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen is contained in the non-recording portions at a higher content than the content of the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen in the recording portions.
    Type: Application
    Filed: July 1, 2011
    Publication date: February 2, 2012
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Iwasaki, Kaori Kimura, Yoshiyuki Kamata, Masatoshi Sakurai
  • Publication number: 20120009439
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming protruded magnetic patterns on a substrate, depositing a nonmagnetic material in recesses between the magnetic patterns and on the magnetic patterns, and etching back the nonmagnetic material using an oxygen-containing etching gas while reforming a surface of the nonmagnetic material.
    Type: Application
    Filed: September 20, 2011
    Publication date: January 12, 2012
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori Kimura, Yoshiyuki Kamata, Satoshi Shirotori, Masatoshi Sakurai
  • Patent number: 8057689
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: November 15, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yousuke Isowaki, Kaori Kimura, Yoshiyuki Kamata, Masatoshi Sakurai
  • Patent number: 8059368
    Abstract: It is possible to improve the recording and reproducing S/N ratio, the reproduction signal intensity, and the degree of high density recording. There are provided a plurality of recording tracks formed on a substrate, each recording track being formed of a magnetic material, and non-recording sections formed on the substrate, each non-recording section separating adjacent recording tracks, each recording track including a plurality of recording sections and connecting sections for connecting the recording sections adjacent thereto in a track longitudinal direction, and each connecting section having a cross-sectional area in a track width direction that is smaller than a cross-sectional area in a track width direction of adjacent recording sections.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: November 15, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Satoshi Shirotori, Hiroyuki Hieda
  • Patent number: 8049993
    Abstract: A magnetic recording medium includes: a substrate; a recording layer that is formed on the substrate to have a grooved pattern; and a protection layer formed on the recording layer to fill in the grooved pattern, wherein the recording layer is defined to have a servo portion that retains servo data and a recording track portion that retains recording data, and wherein a first film thickness of the protection layer at the servo portion is larger than a second film thickness of the protection layer at the recording track portion by a thickness that is in a range from 1 nm to 10 nm.
    Type: Grant
    Filed: March 12, 2008
    Date of Patent: November 1, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Satoshi Shirotori, Yoshiyuki Kamata, Kaori Kimura
  • Patent number: 8043516
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming protruded magnetic patterns on a substrate, depositing a nonmagnetic material in recesses between the magnetic patterns and on the magnetic patterns, and etching back the nonmagnetic material using an oxygen-containing etching gas while reforming a surface of the nonmagnetic material.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: October 25, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Yoshiyuki Kamata, Satoshi Shirotori, Masatoshi Sakurai
  • Patent number: 8029682
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: October 4, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yousuke Isowaki, Kaori Kimura, Yoshiyuki Kamata, Masatoshi Sakurai
  • Publication number: 20110235212
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming on a magnetic recording layer a first hard mask, a second hard mask, a third hard mask and a resist, imprinting the resist with a stamper, removing a residue left in the recesses of the patterned resist, etching the third hard mask by use of the patterned resist as a mask, etching the second hard mask by use of the third hard mask as a mask, etching the first hard mask by use of the second hard mask as a mask, forming a pattern of the magnetic recording layer with ion beam irradiation, and removing the first hard mask by use of a remover liquid with higher reactivity to the metal material of the first hard mask than to a constituent element of the magnetic recording layer.
    Type: Application
    Filed: January 14, 2011
    Publication date: September 29, 2011
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Masatoshi Sakurai, Kaori Kimura, Yousuke Isowaki, Akira Watanabe, Yoshiyuki Kamata
  • Patent number: 8017023
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: September 13, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Kaori Kimura, Yousuke Isowaki, Masatoshi Sakurai
  • Patent number: 8012361
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: September 6, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Yousuke Isowaki, Yoshiyuki Kamata, Masatoshi Sakurai
  • Patent number: 8002997
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
    Type: Grant
    Filed: August 20, 2009
    Date of Patent: August 23, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Kaori Kimura, Yousuke Isowaki, Masatoshi Sakurai
  • Patent number: 7993536
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: August 9, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yousuke Isowaki, Kaori Kimura, Yoshiyuki Kamata, Masatoshi Sakurai