Patents by Inventor Katsuhiro Ito

Katsuhiro Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100251697
    Abstract: An object of the present invention is to provide a technology that enables reduction of NOx stored in an NOx catalyst with improved efficiency in an exhaust gas purification system for an internal combustion engine. According to the present invention, when NOx stored in the NOx catalyst is to be reduced, if the temperature of the NOx catalyst is lower than a specific temperature, the air-fuel ratio of the ambient atmosphere around the NOx catalyst is decreased only by decreasing the air-fuel ratio of the exhaust gas discharged from the internal combustion engine, and if the temperature of the NOx catalyst is not lower than the specific temperature, the air-fuel ratio of the ambient atmosphere around the NOx catalyst is decreased either only by adding reducing agent through reducing agent addition means, or by decreasing the air-fuel ratio of the exhaust gas discharged from the internal combustion engine and adding reducing agent through the reducing agent addition means.
    Type: Application
    Filed: November 11, 2008
    Publication date: October 7, 2010
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Koichiro Nakatani, Terutoshi Tomoda, Shinobu Ishiyama, Tomoyuki Ono, Tomoyuki Kogo, Katsuhiro Ito, Masayoshi Nakagawa, Yoshihiro Hisataka
  • Publication number: 20100242471
    Abstract: A control apparatus for an internal combustion engine, which can generate exhaust pressure pulsation at an early period while suppressing the degradation of volumetric efficiency, when a request to enhance the exhaust pressure pulsation is made in the internal combustion engine which includes a variable valve mechanism that makes variable a valve overlap period, and a variable nozzle type turbocharger.
    Type: Application
    Filed: November 10, 2008
    Publication date: September 30, 2010
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Terutoshi Tomoda, Shinobu Ishiyama, Tomoyuki Ono, Koichiro Nakatani, Tomoyuki Kogo, Katsuhiro Ito
  • Publication number: 20100229536
    Abstract: Disclosed is a technology that enables better reduction of NOx stored in an NOx catalyst in an exhaust gas purification system for an internal combustion engine. When NOx stored in an NOx catalyst is to be reduced, the air-fuel ratio of the ambient atmosphere around the NOx catalyst is decreased to a target air-fuel ratio by decreasing the air-fuel ratio of the exhaust gas discharged from the internal combustion engine. In doing so, if the temperature of the NOx catalyst is not lower than a specific temperature, the air-fuel ratio of the ambient atmosphere around the NOx catalyst is decreased to the target air-fuel ratio while bringing the combustion state into low temperature combustion.
    Type: Application
    Filed: November 11, 2008
    Publication date: September 16, 2010
    Applicant: Toyota Jidosha Kabushiki Kaisha
    Inventors: Koichiro Nakatani, Terutoshi Tomoda, Shinobu Ishiyama, Tomoyuki Ono, Tomoyuki Kogo, Katsuhiro Ito
  • Publication number: 20100053471
    Abstract: In an AV system in which a television apparatus and a recorder are individually connected to an AV amplifier through an HDMI, in the case where sound is output from the AV amplifier, if insertion of headphones into the television apparatus is detected, control information to switch the destination of the audio data is transmitted from the television apparatus to the AV amplifier. The AV amplifier switches the destination of the audio data that is input from the recorder from a speaker output section to the television apparatus in accordance with the control information. Thus, even if the headphones are inserted into the television apparatus while the AV amplifier is outputting sound reproduced by the recorder, the sound can be output from the headphones.
    Type: Application
    Filed: August 27, 2009
    Publication date: March 4, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yasushi Shikata, Takashi Yamamoto, Tomoyasu Yoshikawa, Katsuhiro Ito, Tomoki Kuroda, Kiyohiro Uemura, Masaki Tamura, Masatsugu Sasaki, Kinshirou Suzawa
  • Patent number: 7544461
    Abstract: A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: June 9, 2009
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Genji Imai, Toshikazu Murayama, Katsuhiro Ito, Haruhumi Hagino
  • Publication number: 20090054697
    Abstract: The present invention provides a method for producing an unsaturated ether compound represented by general formula (2) below, the method comprising reacting an acetal represented by general formula (1) below in the presence of an aliphatic or aromatic sulfonic acid and an organic base having a total carbon number of 3 to 7. (In the formulae, R1, R2, and R3 may be the same or different and each represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with the adjacent carbon atom.
    Type: Application
    Filed: April 26, 2006
    Publication date: February 26, 2009
    Applicant: KYOWA HAKKO CHEMICAL CO., LTD.
    Inventors: Ryo Numazaki, Katsuhiro Ito, Hiroshi Matsuoka, Iwao Hotta
  • Publication number: 20090035702
    Abstract: The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O—C—C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).
    Type: Application
    Filed: September 29, 2008
    Publication date: February 5, 2009
    Applicant: KYOWA HAKKO CHEMICAL CO., LTD.
    Inventors: Hiroshi Matsuoka, Junzo Yamano, Katsuhiro Ito, Ikuo Shimizu, Ryo Numazaki
  • Patent number: 7417162
    Abstract: The present invention provides oils for cosmetics comprising a dibasic acid diester represented by general formula (I) (wherein R1, R2, R3 and R4, which are the same or different, each represent lower alkyl) and excellent in solubility of a long-wave ultraviolet light absorber or the like, and so forth.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: August 26, 2008
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Yukitoshi Fukuda, Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tomoya Takahashi
  • Patent number: 7358030
    Abstract: The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: April 15, 2008
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
  • Patent number: 7294448
    Abstract: The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: November 13, 2007
    Assignee: Kyowa Hakko Kogyo Co., Ltd.
    Inventors: Tsuguo Yamaoka, Katsuhiro Ito, Takeshi Iwasaki, Ikuo Shimizu
  • Publication number: 20070259279
    Abstract: A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
    Type: Application
    Filed: July 22, 2005
    Publication date: November 8, 2007
    Applicant: Kansai Paint Co., Ltd.
    Inventors: Genji Imai, Toshikazu Murayama, Katsuhiro Ito, Haruhumi Hagino
  • Publication number: 20060177763
    Abstract: The present invention provides a process for producing a compound having a group represented by general formula (II). (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O—C—C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).
    Type: Application
    Filed: August 31, 2004
    Publication date: August 10, 2006
    Applicant: Kyowa Hakko Chemical Co., Ltd.
    Inventors: Hiroshi Matsuoka, Junzo Yamano, Katsuhiro Ito, Ikuo Shimizu, Ryo Numazaki
  • Publication number: 20060074262
    Abstract: The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above respectively.
    Type: Application
    Filed: November 30, 2005
    Publication date: April 6, 2006
    Applicant: KYOWA YUKA CO., LTD.
    Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
  • Patent number: 7015363
    Abstract: The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: March 21, 2006
    Assignee: Kyowa Yuka Co., Ltd.
    Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
  • Publication number: 20060003259
    Abstract: The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.
    Type: Application
    Filed: August 20, 2003
    Publication date: January 5, 2006
    Applicant: Kyowa Hakko Chemical Co.,
    Inventors: Tsuguo Yamaoka, Katsuhiro Ito, Takeshi Iwasaki, Ikuo Shimizu
  • Publication number: 20050130850
    Abstract: The present invention provides dibasic acid diesters, which are suitable for use in lubricating base oils, etc. and excellent in hydrolysis resistance, etc., represented by general formula (I): (wherein R2 and R3, which may be the same or different, each represent lower alkyl; and R1 and R4, which may be the same or different, each represent alkyl having 7 or more carbon atoms).
    Type: Application
    Filed: October 10, 2002
    Publication date: June 16, 2005
    Inventors: Yukitoshi Fukuda, Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada
  • Publication number: 20040219178
    Abstract: The present invention provides oils for cosmetics comprising a dibasic acid diester represented by general formula (I) 1
    Type: Application
    Filed: February 20, 2004
    Publication date: November 4, 2004
    Inventors: Yukitoshi Fukuda, Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tomoya Takahashi
  • Publication number: 20040181097
    Abstract: The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.
    Type: Application
    Filed: December 24, 2003
    Publication date: September 16, 2004
    Inventors: Ikuo Shimizu, Katsuhiro Ito, Kazuyasu Osada, Tsuguo Yamaoka
  • Patent number: 5685241
    Abstract: A furnace body (4) consists of drums (D1, D2, and D3) which are supported and drove by rotation drive assemblies (3) independently of each other. Each drum has open ends at both sides, and adjacent open ends are engaged to each other in a rotatable manner. One open end of the furnace body (4) are provided with a waste feeding assembly (6), and the other is provided with a gas exhausting assembly (7). Oxygen supply units (5) are connected to the joint between the open ends of adjacent drums.
    Type: Grant
    Filed: September 11, 1996
    Date of Patent: November 11, 1997
    Assignee: Kabushiki Kaisha Daiken Enterprise
    Inventors: Katsuhiro Ito, Takeshi Ito
  • Patent number: 5250932
    Abstract: An LCD device having an improved contrast, able to be operated by a matrix drive, and having a large display area, comprises a pair of transparent first and second bases; picture element electrodes arranged on the first base; signal lines arranged adjacent to the picture element electrode; non-linear elements consisting of varistor particle layers forming bridges between the picture element electrodes and the signal lines; scanning electrodes arranged on the second base; and a liquid crystal material layer located between the picture element electrodes and the scanning electrodes the liquid crystal material being dispersed in a polymeric matrix to form, for example, a NCAP system.
    Type: Grant
    Filed: September 23, 1991
    Date of Patent: October 5, 1993
    Assignee: Ube Industries, Ltd.
    Inventors: Hataaki Yoshimoto, Katsuhiro Ito