Patents by Inventor Kiyoshi Takeuchi

Kiyoshi Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010029835
    Abstract: A three-position stop type swing actuator has a main piston freely moving in forward and backward directions in an axial direction within a casing, an output shaft placed at a coaxial position with the main piston in such a manner as to be fixed in an axial direction and freely rotate around an axis, a conversion and transmission mechanism converting a forward and backward motion of the main piston into a rotating and swinging motion of the output shaft, and a sub piston having a stroke smaller than that of the main piston a fluid pressure operating force larger than that of the main piston and arranged within the casing in such a manner as to freely move in the forward and backward directions and be capable of being brought into contact with the main piston so as to restrict a middle stop position of the main piston.
    Type: Application
    Filed: March 16, 2001
    Publication date: October 18, 2001
    Applicant: SMC CORPORATION
    Inventors: Kiyoshi Takeuchi, Yoshihiro Takeda, Mitsunori Magaribuchi
  • Publication number: 20010020413
    Abstract: The invention provides a rotary actuator having a rack driven in an oscillating manner by an air pressure, a pinion engaged with the rack, and a cushion mechanism for stopping the rack to at least one normal or inverse stroke end in a cushioning manner. The cushion mechanism has an exhaust port open to a pressure chamber at a position close to a chamber end rather than a port hole, a flow amount adjusting mechanism for restricting a flow amount of the exhaust air discharged from the exhaust port, and a cushion packing mounted to an outer peripheral surface of the piston and operating so as to shut the port hole from the pressure chamber immediately before the piston reaches the stroke end, thereby discharging the air within the pressure chamber through the flow amount adjusting mechanism.
    Type: Application
    Filed: February 27, 2001
    Publication date: September 13, 2001
    Applicant: SMC Corporation
    Inventors: Akihiro Hirano, Kenji Koiwa, Kiyoshi Takeuchi
  • Patent number: 6277994
    Abstract: There is disclosed a novel color-developing agent of a 1,2,4-thiadiazol-5-yl hydrazine type. There is also disclosed a silver halide photographic light-sensitive material which gives sufficient color formation by development and forms an image excellent in image quality and image storability, by using the color-developing agent. Further, there is disclosed an image-forming method using the light-sensitive material.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: August 21, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Osamu Uchida, Yasuhiro Ishiwata, Kiyoshi Takeuchi, Taiji Katsumata, Takashi Nakamura
  • Patent number: 6242272
    Abstract: In a reverse profiling method, first and second processes produce first and second groups of MOSFETs, respectively. In the first process, channel impurities are implanted into a semiconductor substrate after implantation of source/drain impurities and annealing of the semiconductor substrate. Consequently, the annealing modulates channel impurity density distribution. On the other hand, in the second process, source/drain impurities are implanted into a semiconductor substrate after implantation of channel impurities and annealing of the semiconductor substrate. The annealing does not modulate channel impurity density distribution in the second process. First threshold voltage-gate length characteristics of the MOSFETs of the first group are found. Similarly, second threshold voltage-gate length characteristics of the MOSFETs of the first group are found.
    Type: Grant
    Filed: August 2, 1999
    Date of Patent: June 5, 2001
    Assignee: NEC Corporation
    Inventors: Shigetaka Kumashiro, Kiyoshi Takeuchi
  • Patent number: 6071678
    Abstract: There is disclosed a silver halide photographic light-sensitive material that contains at least one color-developing agent of formula (I) and at least one dye-forming coupler of formula (II) contained in one or more photographic constitutional layers provided on a base: ##STR1## in formula (I), Z is a carbamoyl group or the like, and Q represents a group of atoms required to form an unsaturated ring together with the C, and in formula (II), M represents a coupler component capable of causing coupling reaction at the site where G is bonded with the oxidized color-developing agent, G is a hydrogen atom or a coupling split-off group, Y.sup.1 and Y.sup.2 each represent a group having a dissociation group, whose pKa is 1 or more but 12 or less, and n and m are each an integer of 0 to 3, provided that n+m.gtoreq.1. There is also disclosed an image-forming method using the light-sensitive material.
    Type: Grant
    Filed: August 31, 1998
    Date of Patent: June 6, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kiyoshi Takeuchi
  • Patent number: 6057086
    Abstract: A silver halide color photographic material is disclosed, comprising a support having thereon photographic constituent layers containing at least one light-sensitive silver halide emulsion layer, wherein any one of the photographic constituent layers contains at least one coupler for dye formation, at least one reducing agent for color formation represented by the following formula (I) and an auxiliary developing agent and/or a precursor thereof:R.sup.11 --NH--NH--X--R.sup.12 (I)wherein R.sup.11 represents an aryl or heterocyclic group, R.sup.12 represents an alkyl, alkenyl, alkynyl, aryl or heterocyclic group, and X represents --SO.sub.2 --, --CO--, --COCO--, --CO--O--, --CO-- N(R.sup.13)--, --COCO--O--, --COCO--N(R.sup.13)-- or --SO.sub.2 --N(R.sup.13)-- (wherein R.sup.13 represents a hydrogen atom or a group described for R.sup.12).
    Type: Grant
    Filed: November 25, 1997
    Date of Patent: May 2, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koichi Nakamura, Kiyoshi Takeuchi, Koki Nakamura
  • Patent number: 5976756
    Abstract: A diffusion transfer silver halide photographic material containing a color developing agent represented by the following formula (I) in a hydrophilic colloid layer provided on a support: ##STR1## wherein C.sub..alpha. represents a carbon atom; Z represents a carbamoyl group, an acyl group, an alkoxycarbonyl group, or an aryloxycarbonyl group; and Q represents an atomic group for forming a unsaturated ring together with C.sub..alpha., whereby a color diffusion transfer silver halide photographic material containing a novel color developing agent from which a diffusible dye can be formed is provided.
    Type: Grant
    Filed: November 29, 1996
    Date of Patent: November 2, 1999
    Assignee: Fuji Photo Film, Co., Ltd.
    Inventors: Koki Nakamura, Kiyoshi Takeuchi, Taiji Katsumata, Toshiki Taguchi
  • Patent number: 5970351
    Abstract: A method of producing a transistor having a source and drain diffusion layer formed so that is has a junction of a shallow depth and is low in parasitic resistance and parasitic capacitance. The method allows the manufacture of a transistor having a gate insulator formed on a principal plane of a semiconductor substrate, a gate electrode formed on the gate insulator, and source and drain diffusion layers of one conductivity type formed on the principal plane of the semiconductor substrate across the gate electrode. A semiconductor thin film layer doped with an impurity of the same conductivity type is selectively deposited on the principal plane of the semiconductor substrate on which the source and drain diffusion layers are formed. A facet face is formed at an end portion of the semiconductor thin film which opposes to a sidewall of the gate electrode. The facet face has an inclination angle between a sidewall face of the gate electrode and the principal plane of the semiconductor substrate.
    Type: Grant
    Filed: July 10, 1997
    Date of Patent: October 19, 1999
    Assignee: NEC Corporation
    Inventor: Kiyoshi Takeuchi
  • Patent number: 5965322
    Abstract: There is disclosed a silver halide color photographic light-sensitive material that contains, in photographic constitutional layers on a support, a hydrazine-series reducing agent for color formation, and a phenol-series magenta coupler having an acylamino group at the 5-position, and/or a naphthol-series cyan coupler having an amido group at the 5-position. The light-sensitive material makes low-replenishment and low-discharge processing possible, and exhibits good color reproducibility and good color-forming property.
    Type: Grant
    Filed: February 18, 1997
    Date of Patent: October 12, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiyuki Makuta, Koki Nakamura, Kiyoshi Takeuchi
  • Patent number: 5962892
    Abstract: A source and drain diffusion layer of a transistor has a junction of a shallow depth and low in parasitic resistance and parasitic capacitance.The transistor includes a gate insulator formed on a principal plane of a semiconductor substrate, a gate electrode formed on the gate insulator, and source and drain diffusion layers of one conductivity type formed on the principal plane of the semiconductor substrate across the gate electrode. A semiconductor thin film layer doped with an impurity of the same conductivity type is selectively deposited on the principal plane of the semiconductor substrate on which the source and drain diffusion layers are formed. A facet face is formed at an end portion of the semiconductor thin film which opposes to a sidewall of the gate electrode. The facet face has an inclination angle between a sidewall face of the gate electrode and the principal plane of the semiconductor substrate.
    Type: Grant
    Filed: October 11, 1995
    Date of Patent: October 5, 1999
    Assignee: NEC Corporation
    Inventor: Kiyoshi Takeuchi
  • Patent number: 5952273
    Abstract: A grease composition for constant velocity joints comprising: (a) a base oil; (b) a diurea thickener of the formula (1):R.sup.1 NH--CO--NH--C.sub.6 H.sub.4 -p-CH.sub.2 --C.sub.6 H.sub.4 -p-NH--CO--NHR.sup.2wherein R.sup.1 and R.sup.2 may be the same or different and represent aryl groups having 6 or 7 carbon atoms or cyclohexyl groups; (c) a molybdenum dialkyldithiocarbamate; (d) molybdenum disulfide; (e) at least one extreme pressure agent selected from the group consisting of zinc dithiophosphates, and sulfur-nitrogen extreme pressure agents; and (f) a phosphorus-free sulfur extreme pressure agent. The grease composition has low coefficient of friction, good performance for reducing induced thrust and high durability.
    Type: Grant
    Filed: March 25, 1998
    Date of Patent: September 14, 1999
    Assignees: Kyodo Yushi Co., Ltd,, NTN Corporation
    Inventors: Yoichi Suzuki, Takashi Okaniwa, Yukio Asahara, Keizo Nagasawa, Mitsuhiro Kakizaki, Kiyoshi Takeuchi, Yukio Hasegawa, Shinichi Takabe
  • Patent number: 5889163
    Abstract: There is disclosed a method for producing azo dye compounds, which comprises reacting a compound represented by formula (I) or (II) with a coupling component, in the presence of an oxidizing agent. ##STR1## wherein Z.sup.1 and Z.sup.2 each represent an acyl group, a carbamoyl group, an alkoxycarbonyl group, or an aryloxycarbonyl group; X.sup.1, X.sup.2, X.sup.3, X.sup.4, and X.sup.5, each represent a hydrogen atom or a substituent, provided that the sum of the Hammett substituent constant .sigma.p values of X.sup.1, X.sup.3, and X.sup.5 and the Hammett substituent constant .sigma.m values of X.sup.2 and X.sup.4 is 0.80 or more but 3.80 or below; and R.sup.3 represents a heterocyclic group. According to the above method, azo dye compounds can be produced in a high yield by the use of hydrazines or azo compounds, both of which are safe raw materials, rather than a diazonium salt compound that involves a risk of explosion.
    Type: Grant
    Filed: November 26, 1996
    Date of Patent: March 30, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kiyoshi Takeuchi, Koki Nakamura
  • Patent number: 5869867
    Abstract: In a semiconductor device, an extra wiring area generated by the connection of an upper layer wiring to an element on a semiconductor substrate is reduced to improve the level of integration, and the parasitic capacitances between the gate and the source-drain regions are reduced to enhance the performance of the circuit.A gate electrode is formed via a gate insulating film on a semiconductor layer formed in the semiconductor substrate. This semiconductor layer is for forming the source region and the drain region, where the source region and the drain region are formed on the left and right of the gate electrode with the gate electrode at the center. Wirings connected to the source region are formed on the same side of the gate electrode. Wirings connected to the drain region are formed on the opposite side of the gate electrode with the semiconductor layer in between.
    Type: Grant
    Filed: March 14, 1997
    Date of Patent: February 9, 1999
    Assignee: NEC Corporation
    Inventor: Kiyoshi Takeuchi
  • Patent number: 5860307
    Abstract: A pipe is bent by advancing the pipe through a guide and into a ring disposed just upstream of said guide in the direction of pipe movement. The ring with the leading end of the pipe therein is moved by a controller along a predetermined curve along which the pipe is to be bent.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: January 19, 1999
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Tamio Nakano, Shin Takeda, Kiyoshi Takeuchi
  • Patent number: 5851745
    Abstract: There is disclosed a silver halide photographic light-sensitive material that contains at least one color-developing agent of formula (I) and at least one dye-forming coupler of formula (II) contained in one or more photographic constitutional layers provided on a base: ##STR1## in formula (I), Z is a carbamoyl group or the like, and Q represents a group of atoms required to form an unsaturated ring together with the C, and in formula (II), M represents a coupler component capable of causing coupling reaction at the site where G is bonded with the oxidized color-developing agent, G is a hydrogen atom or a coupling split-off group, Y.sup.1 and Y.sup.2 each represent a group having a dissociation group, whose pKa is 1 or more but 12 or less, and n and m are each an integer of 0 to 3, provided that n+m.gtoreq.1. There is also disclosed an image-forming method using the light-sensitive material.
    Type: Grant
    Filed: August 7, 1997
    Date of Patent: December 22, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kiyoshi Takeuchi
  • Patent number: 5780210
    Abstract: There is disclosed a light-sensitive material comprising, in a hydrophilic colloid provided on a base, a color-developing agent represented by formula (I) or (II): ##STR1## wherein Z.sup.1 represents an acyl group, a carbamoyl group, an alkoxycarbonyl group, or an aryloxycarbonyl group; Z.sup.2 represents a carbamoyl group, an alkoxycarbonyl group, or an aryloxycarbonyl group; X.sup.1, X.sup.2, X.sup.3, X.sup.4, and X.sup.5 each represent a hydrogen atom or a substituent, provided that the sum of the Hammett substituent constant .sigma.p values of X.sup.1, X.sup.3, and X.sup.5 and the Hammett substituent constant .sigma.m values of X.sup.2 and X.sup.4 is 0.80 or more but 3.80 or below; and R.sup.3 represents a heterocyclic group. There is also disclosed a novel color-developing agent that can be built in. By using the color-developing agent, the light-sensitive material can attain a rapid and simple formation of an image.
    Type: Grant
    Filed: February 15, 1996
    Date of Patent: July 14, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kiyoshi Takeuchi, Koki Nakamura, Toshiki Taguchi, Koichi Nakamura, Toshiyuki Makuta
  • Patent number: 5770494
    Abstract: Using a lamination of a tungsten silicide layer and a non-doped polysilicon layer as a mask, a dopant impurity is ion implanted into a semiconductor substrate so as to form impurity regions and dope the tungsten silicide layer with the dopant impurity, and the dopant impurity is diffused from the tungsten silicide layer into the non-doped polysilicon layer during the activation of the dopant impurity introduced into the substrate, thereby making the process simple.
    Type: Grant
    Filed: March 18, 1996
    Date of Patent: June 23, 1998
    Assignee: NEC Corporation
    Inventors: Toyoji Yamamoto, Kiyoshi Takeuchi
  • Patent number: 5762216
    Abstract: A cap comprises a cap body and a top lid, which are united by a hinge. A rubber-like elastic member is provided on the cap body and/or the top lid such as to be elastically deformed between the cap body and the top lid when the top lid is closed.
    Type: Grant
    Filed: January 21, 1997
    Date of Patent: June 9, 1998
    Assignee: Kao Corporation
    Inventor: Kiyoshi Takeuchi
  • Patent number: 5728879
    Abstract: A bisguanidine salt selected from the group consisting of a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis(1,3-diethylguanyl)ethylenediamine, a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis(1,3-diisopropylguanyl)ethylenediamine, a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis-(imidazoline-2-yl)ethylenediamine, a 4-(phenylsulfonyl)-phenylsulfonylacetic acid salt of 1,4-bis(1,3-diisopropylguanyl)piperazine, a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of 1,4-bis(1,3-diethylguanyl)piperazine, a 4-(4-methylphenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis(1,3-diethylguanyl)ethylenediamine and a 4-(4-ethylphenylsulfonyl)phenylsulfonylacetic acid salt of 1,4-bis(1,3-diethylguanyl)piperazine which can be used as a base precursor which is rapidly decomposed by heat treatment at 120.degree. C. or less to release a base.
    Type: Grant
    Filed: March 25, 1997
    Date of Patent: March 17, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Jiro Tsukahara, Kiyoshi Takeuchi, Hideaki Satoh, Shun-ichi Ishikawa, Keizo Ogawa, Tomomi Ishino
  • Patent number: 5695913
    Abstract: A process for the formation of a color image which comprises the steps of: exposing to light a silver halide light-sensitive material comprising a support having thereon at least one light-sensitive emulsion layer, and developing said light-sensitive material to form a color image, wherein said light-sensitive material comprises at least one dye-forming coupler and at least one coloring reducing agent represented by formula (I) and is intensified with a solution containing hydrogen peroxide or a compound releasing hydrogen peroxide to form an intensified image:R.sup.11 --NH--NH--X--R.sup.12 (I)wherein R.sup.11 represents an aryl group or a heterocyclic group; R.sup.12 represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group; and X represents --SO.sub.2 --, --CO--, --COCO--, --CO--O--, --CO--N(R.sup.13)--, --COCO--O--, --COCO--N(R.sup.13)--, or --SO.sub.2 --N(R.sup.13)--, in which R.sup.
    Type: Grant
    Filed: February 28, 1996
    Date of Patent: December 9, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koichi Nakamura, Koki Nakamura, Kiyoshi Takeuchi