Publication number: 20220372012
Abstract: Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: wherein, in formula (I), R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—; and AI? represents an organic anion.
Type:
Application
Filed:
April 11, 2022
Publication date:
November 24, 2022
Applicant:
SUMITOMO CHEMICAL COMPANY, LIMITED
Inventors:
Katsuhiro KOMURO, Jun OGUMA, Koji ICHIKAWA