Patents by Inventor Kouichi Takemoto
Kouichi Takemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8308932Abstract: Provided are a method of recovering valuable metals from IZO scrap, wherein indium and zinc are recovered as hydroxides by using an IZO scrap as both an anode and a cathode, and performing electrolysis while periodically reversing polarity; and a method of recovering valuable metals from IZO scrap, wherein the hydroxides of indium and zinc obtained by the electrolysis are roasted and indium and zinc are recovered as oxides. Specifically, provided is a method which enables the efficient recovery of indium and zinc from IZO scrap such as a spent indium-zinc oxide (IZO) sputtering target and IZO mill ends arising during the manufacture of such a sputtering target.Type: GrantFiled: January 30, 2009Date of Patent: November 13, 2012Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20120180600Abstract: Provided is a method for producing a high-purity tungsten powder having a phosphorus content of less than 1 wtppm; wherein an ammonium tungstate solution containing 1 wtppm or more of phosphorus as an impurity in terms of the inclusion in tungsten is used as a starting material, this solution is neutralized with hydrochloric acid at a temperature of 50° C. or less to adjust the pH at 4 or more and less than 7 so as to precipitate ammonium paratungstate undecahydrate crystals, the resulting solution is heated to 70 to 90° C. and filtered in a high-temperature state so as to obtain ammonium paratungstate pentahydrate crystals, the obtained crystals are calcined so as to form a tungsten oxide, and the tungsten oxide is subject to hydrogen reduction so as to obtain a high-purity tungsten powder. Additionally provided is a method for producing a high-purity tungsten powder having a phosphorus content of 0.Type: ApplicationFiled: September 28, 2010Publication date: July 19, 2012Applicants: JAPAN NEW METALS CO., LTD., JX NIPPON MINING & METALS CORPORATIONInventors: Jin Sato, Kouichi Takemoto, Takeshi Sasaki, Mikio Ohno, Junji Ogura
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Patent number: 8216442Abstract: A manufacturing method of ultrahigh purity copper is provided wherein, upon subjecting copper to high purification with the electrolytic method, an anode and a cathode are partitioned with an anion exchange membrane, anolyte is intermittently or continuously extracted and introduced into an active carbon treatment vessel, a chlorine-containing material is added to the active carbon treatment vessel so as to precipitate impurities as chloride, active carbon is subsequently poured in and agitated so as to adsorb the precipitated impurities, the adsorbed impurities are removed by filtration, and the obtained high purity copper electrolytic solution is intermittently or continuously introduced into the cathode side and electrolyzed. This technology enables the efficient manufacture of ultrahigh purity copper having a purity of 8N (99.999999 wt %) or higher from a copper raw material containing large amounts of impurities.Type: GrantFiled: March 11, 2010Date of Patent: July 10, 2012Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 8192596Abstract: Ultrahigh purity copper having a residual resistance ratio of 38,000 or greater and a purity of 8N or higher (excluding gas components), and in particular ultrahigh purity copper wherein the respective elements of O, C, N, H, S and P as gas components are 1 ppm or less. Further provided is a method of subjecting copper to high purification. An anode and a cathode are partitioned with an anion exchange membrane, an anolyte is intermittently or continuously extracted and introduced into an active carbon treatment vessel, a chlorine-containing material is added to the active carbon treatment vessel so as to precipitate impurities as chloride, active carbon is subsequently poured in and agitated so as to adsorb the precipitated impurities, the adsorbed impurities are removed by filtration, and the obtained high purity copper electrolytic solution is intermittently or continuously introduced into the cathode side and electrolyzed.Type: GrantFiled: January 5, 2005Date of Patent: June 5, 2012Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 8152864Abstract: High purity copper sulfate having a purity of 99.99% or higher and in which the content of transition metals such as Fe, Cr, Ni is 3 wtppm or less is provided. A method for producing such high purity copper sulfate includes the steps of dissolving copper sulfate crystals in purified water, performing evaporative concentration thereto, removing the crystals precipitated initially, performing further evaporative concentration to effect crystallization, and subjecting this to filtration to obtain high purity copper sulfate. This manufacturing method of high purity copper sulfate allows the efficient removal of impurities from commercially available copper sulfate crystals at a low cost through dissolution with purified water and thermal concentration.Type: GrantFiled: October 21, 2010Date of Patent: April 10, 2012Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 8012336Abstract: Proposed is a method for collecting valuable metal from an ITO scrap in which a mixture of indium hydroxide and tin hydroxide or metastannic acid is collected by subjecting the ITO scrap to electrolysis in pH-adjusted electrolyte, and roasting this mixture as needed to collect the result as a mixture of indium oxide and tin oxide. This method enables the efficient collection of indium hydroxide and tin hydroxide or metastannic acid, or indium oxide and tin oxide from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.Type: GrantFiled: June 27, 2007Date of Patent: September 6, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 8012337Abstract: Proposed is a method for collecting valuable metal from an ITO scrap by subjecting the ITO scrap to electrolysis and collecting the result as metallic indium. Specifically, the present invention proposes a method for selectively collecting metallic indium including the steps of subjecting the ITO scrap to electrolysis in an electrolytic bath partitioned with a diaphragm or an ion-exchange membrane, subsequently extracting anolyte temporarily, eliminating tin contained in the anolyte by a neutralization method, a replacement method or other methods, placing a solution from which the tin was eliminated in a cathode side again and performing electrolysis thereto; or a method for collecting valuable metal from an ITO scrap including the steps of obtaining a solution of In or Sn in an ITO electrolytic bath, eliminating the Sn in the solution, and collecting In in the collecting bath.Type: GrantFiled: June 27, 2007Date of Patent: September 6, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 8012335Abstract: Proposed is a method for collecting valuable metal from an ITO scrap including a step of collecting tin by subjecting the ITO scrap to electrolysis. Further proposed is a method for collecting valuable metal from an ITO scrap including the steps of providing an ITO electrolytic bath and a tin collecting bath, dissolving the ITO scrap in the electrolytic bath, and thereafter collecting tin in the tin collecting bath. Additionally proposed is a method for collecting valuable metal from an ITO scrap including the steps of dissolving the ITO scrap by subjecting it to electrolysis as an anode in electrolyte, precipitating only tin contained in the solution as tin itself or a substance containing tin, extracting the precipitate, placing it in a collecting bath, re-dissolving this to obtain a solution of tin hydroxide, and performing electrolysis or neutralization thereto in order to collect tin.Type: GrantFiled: June 27, 2007Date of Patent: September 6, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 8007652Abstract: Proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis and collecting the result as indium-tin alloy. Additionally provided is a method for collecting valuable metal from an ITO scrap including the steps of providing an ITO electrolytic bath and an indium-tin alloy collecting bath, dissolving the ITO in the electrolytic bath, and thereafter collecting indium-tin alloy in the indium-tin alloy collecting bath. These methods enable the efficient collection of indium-tin alloy from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.Type: GrantFiled: June 27, 2007Date of Patent: August 30, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 8003065Abstract: Proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis in pH-adjusted electrolyte, and collecting indium or tin as oxides. Additionally proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis in an electrolytic bath partitioned with a diaphragm or an ion-exchange membrane to precipitate hydroxide of tin, thereafter extracting anolyte temporarily, and precipitating and collecting indium contained in the anolyte as hydroxide. With the methods for collecting valuable metal from an ITO scrap described above, indium or tin may be collected as oxides by roasting the precipitate containing indium or tin. Consequently, provided is a method for efficiently collecting indium from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.Type: GrantFiled: June 27, 2007Date of Patent: August 23, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Patent number: 7927879Abstract: Proposed is a zirconium crucible used for melting an analytical sample in the pretreatment of the analytical sample, wherein the purity of the zirconium crucible is 99.99 wt % or higher. In light of the recent analytical technology demanded of fast and accurate measurement of high purity materials, the present invention provides a zirconium crucible for melting an analytical sample, a method of preparing such analytical sample, and a method of analysis that enables the analysis of high purity materials by inhibiting the inclusion of impurities from the crucible regardless of difference in the analysts and their skill.Type: GrantFiled: February 20, 2007Date of Patent: April 19, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Masahiro Sakaguchi, Mitsuru Yamaguchi, Tomio Takahashi, Kouichi Takemoto
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Patent number: 7892843Abstract: A nickel crucible used for melting an analytical sample in the pretreatment of the analytical sample, characterized in that the purity of the nickel crucible is 99.9999 wt % or higher. Also provided is a method of analysis, comprising melting a sample by the use of the nickel crucible for melting having a purity of 99.9999 wt % or higher, and analyzing the melt to thereby obtain an analytical result in which the respective lower limits of determination of Mn, Al, Si, Mg, Pb, Fe, Co, Ti, Cu, Cr, Zr, Mo, and W are Mn: 5 wtppm, Al: 10 wtppm, Si: 10 wtppm, Mg: 5 wtppm, Pb: 5 wtppm, Fe: 5 wtppm, Co: 5 wtppm, Ti: 20 wtppm, Cu: 20 wtppm, Cr: 10 wtppm, Zr: 5 wtppm, Mo: 2 wtppm, and W: 10 wtppm. In light of the recent analytical technology demanded of fast and accurate measurement of high purity materials, high purity analysis is attained through inhibition of mixing of impurities from the crucible.Type: GrantFiled: February 15, 2007Date of Patent: February 22, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Masahiro Sakaguchi, Mitsuru Yamaguchi, Tomio Takahashi, Kouichi Takemoto
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Patent number: 7887603Abstract: High purity copper sulfate having a purity of 99.99% or higher and in which the content of transition metals such as Fe, Cr, Ni is 3 wtppm or less; and a method for producing such high purity copper sulfate which includes the steps of dissolving copper sulfate crystals in purified water, performing evaporative concentration thereto, removing the crystals precipitated initially, performing further evaporative concentration to effect crystallization, and subjecting this to filtration to obtain high purity copper sulfate. This manufacturing method of high purity copper sulfate allows the efficient removal of impurities from commercially available copper sulfate crystals at a low cost through dissolution with purified water and thermal concentration.Type: GrantFiled: August 12, 2003Date of Patent: February 15, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20110033369Abstract: High purity copper sulfate having a purity of 99.99% or higher and in which the content of transition metals such as Fe, Cr, Ni is 3 wtppm or less is provided. A method for producing such high purity copper sulfate includes the steps of dissolving copper sulfate crystals in purified water, performing evaporative concentration thereto, removing the crystals precipitated initially, performing further evaporative concentration to effect crystallization, and subjecting this to filtration to obtain high purity copper sulfate. This manufacturing method of high purity copper sulfate allows the efficient removal of impurities from commercially available copper sulfate crystals at a low cost through dissolution with purified water and thermal concentration.Type: ApplicationFiled: October 21, 2010Publication date: February 10, 2011Applicant: JX NIPPON MINING & METALS CORPORATIONInventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20100316544Abstract: Proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis in pH-adjusted electrolyte, and collecting indium or tin as oxides. Additionally proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis in an electrolytic bath partitioned with a diaphragm or an ion-exchange membrane to precipitate hydroxide of tin, thereafter extracting anolyte temporarily, and precipitating and collecting indium contained in the anolyte as hydroxide. With the methods for collecting valuable metal from an ITO scrap described above, indium or tin may be collected as oxides by roasting the precipitate containing indium or tin. Consequently, provided is a method for efficiently collecting indium from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.Type: ApplicationFiled: June 27, 2007Publication date: December 16, 2010Applicant: NIPPON MINING & METALS CO., LTD.Inventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20100294082Abstract: Proposed is a method for collecting valuable metal from an ITO scrap including a step of collecting tin by subjecting the ITO scrap to electrolysis. Further proposed is a method for collecting valuable metal from an ITO scrap including the steps of providing an ITO electrolytic bath and a tin collecting bath, dissolving the ITO scrap in the electrolytic bath, and thereafter collecting tin in the tin collecting bath. Additionally proposed is a method for collecting valuable metal from an ITO scrap including the steps of dissolving the ITO scrap by subjecting it to electrolysis as an anode in electrolyte, precipitating only tin contained in the solution as tin itself or a substance containing tin, extracting the precipitate, placing it in a collecting bath, re-dissolving this to obtain a solution of tin hydroxide, and performing electrolysis or neutralization thereto in order to collect tin.Type: ApplicationFiled: June 27, 2007Publication date: November 25, 2010Applicant: NIPPON MINING & METALS CO., LTD.Inventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20100288645Abstract: Provided is a method of recovering valuable metals from IZO scrap in which valuable metals are recovered as indium and zinc metals or suboxides by performing electrolysis using an insoluble electrode as an anode and an IZO scrap as a cathode. Specifically, this method enables the efficient recovery of indium and zinc from IZO scrap such as an indium-zinc oxide (IZO) sputtering target or IZO mill ends that arise during the manufacture of such a sputtering target.Type: ApplicationFiled: December 9, 2008Publication date: November 18, 2010Applicant: NIPPON MINING & METALS CO., LTD.Inventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20100288646Abstract: Provided are a method of recovering valuable metals from IZO scrap, wherein indium and zinc are recovered as hydroxides by using an IZO scrap as both an anode and a cathode, and performing electrolysis while periodically reversing polarity; and a method of recovering valuable metals from IZO scrap, wherein the hydroxides of indium and zinc obtained by the electrolysis are roasted and indium and zinc are recovered as oxides. Specifically, provided is a method which enables the efficient recovery of indium and zinc from IZO scrap such as a spent indium-zinc oxide (IZO) sputtering target and IZO mill ends arising during the manufacture of such a sputtering target.Type: ApplicationFiled: January 30, 2009Publication date: November 18, 2010Applicant: NIPPON MINING & METALS CO., LTD.Inventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20100282615Abstract: Provided are a method of recovering valuable metals from IZO scrap, wherein valuable metals are recovered as hydroxides of indium and zinc by using an insoluble electrode as an anode or a cathode and an IZO scrap as the other cathode or anode as the opposite electrode, and performing electrolysis while periodically reversing polarity; and a method of recovering valuable metals from IZO scrap, wherein the hydroxides of indium and zinc obtained by the electrolysis are roasted and valuable metals are recovered as oxides of indium and zinc. Specifically, provided is a method which enables the efficient recovery of indium and zinc from IZO scrap such as a spent indium-zinc oxide (IZO) sputtering target and IZO mill ends arising during the manufacture of such a sputtering target.Type: ApplicationFiled: January 30, 2009Publication date: November 11, 2010Applicant: NIPPON MINING & METALS CO., LTD.Inventors: Yuichiro Shindo, Kouichi Takemoto
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Publication number: 20100193372Abstract: Proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis and collecting the result as indium-tin alloy. Additionally provided is a method for collecting valuable metal from an ITO scrap including the steps of providing an ITO electrolytic bath and an indium-tin alloy collecting bath, dissolving the ITO in the electrolytic bath, and thereafter collecting indium-tin alloy in the indium-tin alloy collecting bath. These methods enable the efficient collection of indium-tin alloy from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.Type: ApplicationFiled: June 27, 2007Publication date: August 5, 2010Applicant: NIPPON MINING & METALS CO., LTD.Inventors: Yuichiro Shindo, Kouichi Takemoto