Abstract: Non-chemically amplified radiation sensitive resist compositions containing silicon are especially useful for lithographic applications, especially E-beam lithography. More particularly, radiation-sensitive resist compositions comprising a polymer having at least one silicon-containing moiety and at least one radiation-sensitive moiety cleavable upon radiation exposure to form aqueous base soluble moiety can be used to pattern sub-50 nm features with little or no blur.

Abstract: A micro-electrical mechanical oscillator has a resonant frequency of oscillation that is varied by application of heat. The resonant frequency is varied at a frequency different from the resonant frequency of the oscillator to amplify oscillations. In one embodiment, the oscillator is disc of material supported by a pillar of much smaller diameter than the disc. The periphery of the disc is heated by a laser to provide a time varying shift of the resonant frequency (or equivalently the stiffness) of the disc. Feedback from movement of the disc is used to modulate the intensity of the laser, and thus the stiffness of the disc to provide parametric amplification of sensed vibrations, using heating as a pump. Various other shapes of micro-electrical mechanical oscillators are used in other embodiment, including an array of such oscillators on a substrate, each having different resonant frequencies.

Abstract: Electron beam lithography is used to make very small mechanical structures in single-crystal silicon. The structure may be a mesh having beam widths of less than 30 nm and suspended in a wafer, above a substrate. An rf drive voltage applied between the suspended structure and the underlying substrate produces vibration at or near the resonant frequency of the structure, and optical interference techniques are used to detect and measure the motion of the structure. The small dimensions of the structure provides a resonant frequency above 40 MHz. In one embodiment, the structure is a mesh formed of interconnected, very narrow, high aspect ratio parallel beams spaced about 315 nm apart. This results in a nanostructure having a low mass and a large relative surface area.