Patents by Inventor Marco Koert Stavenga

Marco Koert Stavenga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method involving a heater
    Patent number: 11378893
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Grant
    Filed: November 13, 2020
    Date of Patent: July 5, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20220121131
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: December 29, 2021
    Publication date: April 21, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20220082948
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Application
    Filed: November 22, 2021
    Publication date: March 17, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie CLOIN, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michael Christiaan Van Der Wekken
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 11215933
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: January 4, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Particle suppression systems and methods
    Patent number: 11204558
    Abstract: An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: December 21, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Yang-Shan Huang, Daniel Nathan Burbank, Marco Koert Stavenga
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 11187991
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: November 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie Cloin, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaël Christiaan Van Der Wekken
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER
    Publication number: 20210063898
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Application
    Filed: November 13, 2020
    Publication date: March 4, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VAN MEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
  • Lithographic apparatus and device manufacturing method involving a heater
    Patent number: 10838310
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: November 17, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 10712675
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • PARTICLE SUPPRESSION SYSTEMS AND METHODS
    Publication number: 20200142326
    Abstract: An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.
    Type: Application
    Filed: July 18, 2018
    Publication date: May 7, 2020
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yang-Shan HUANG, Daniel Nathan BURBANK, Marco Koert STAVENGA
  • Lithographic apparatus and device manufacturing method involving a liquid confinement structure
    Patent number: 10620546
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20200050116
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: October 18, 2019
    Publication date: February 13, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei SHULEPOV, Koen STEFFENS, Matheus Ana Karel VAN LIEROP, Samuel Bertrand Dominique DAVID, David BESSEMS
  • Lithographic apparatus and device manufacturing method
    Patent number: 10509326
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: December 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 10451980
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: April 18, 2017
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A LIQUID CONFINEMENT STRUCTURE
    Publication number: 20190258174
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Application
    Filed: April 30, 2019
    Publication date: August 22, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans JANSEN, Marco Koert STAVENGA
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER
    Publication number: 20190235397
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Application
    Filed: April 5, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VAN MEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
  • Lithographic apparatus and device manufacturing method involving a liquid confinement structure
    Patent number: 10274832
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: April 30, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • Lithographic apparatus and device manufacturing method involving a heater
    Patent number: 10254663
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: April 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOVLING A LIQUID CONFINEMENT STRUCTURE
    Publication number: 20180356735
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Application
    Filed: May 4, 2018
    Publication date: December 13, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans JANSEN, Marco Koert STAVENGA
  • Lithographic apparatus and device manufacturing method involving a liquid confinement structure
    Patent number: 9964861
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: May 8, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga