Patents by Inventor Marco Koert Stavenga

Marco Koert Stavenga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method involving a heater
    Patent number: 9188880
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Grant
    Filed: November 3, 2011
    Date of Patent: November 17, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 9176393
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: November 3, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie Cloin, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaël Christiaan Van Der Wekken
  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 9164391
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: October 20, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150277238
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: June 15, 2015
    Publication date: October 1, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei SHULEPOV, Koen STEFFENS, Matheus Anna Karel VAN LIEROP, Samuel Bertrand Dominique DAVID, David BESSEMS
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150205214
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Application
    Filed: April 1, 2015
    Publication date: July 23, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Johannes Henricus Wilhelmus JACOBS, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Marco Koert STAVENGA, Bob STREEFKERK, Martinus Cornelis Maria VERHAGEN, Lejla SEUNTIENS-GRUDA
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 9059228
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: March 11, 2010
    Date of Patent: June 16, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Lithographic apparatus and device manufacturing method
    Patent number: 9025127
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: May 5, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150116675
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Application
    Filed: December 29, 2014
    Publication date: April 30, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans JANSEN, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Marco Koert STAVENGA, Bob STREEFKERK, Jan Cornelis VAN DER HOEVEN, Cedric Desire GROUWSTRA
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Patent number: 9013672
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS
    Publication number: 20150056559
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Application
    Filed: October 1, 2014
    Publication date: February 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans JANSEN, Marco Koert STAVENGA, Jacobus Johannus Leonardus Hendricus VERSPAY, Franciscus Johannes Joseph JANSSEN, Anthonie KUIJPER
  • Lithographic apparatus and device manufacturing method
    Patent number: 8953144
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: February 10, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Patent number: 8947629
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: February 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Lithographic apparatus and device manufacturing method
    Patent number: 8941811
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: January 27, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
  • Lithographic apparatus and device manufacturing method
    Patent number: 8902404
    Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Martinus Cornelis Maria Verhagen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140335457
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Application
    Filed: July 28, 2014
    Publication date: November 13, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans JANSEN, Marco Koert STAVENGA
  • Immersion liquid, exposure apparatus, and exposure process
    Patent number: 8859188
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: February 6, 2006
    Date of Patent: October 14, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • Immersion lithography apparatus
    Patent number: 8817227
    Abstract: An immersion lithographic apparatus is disclosed that includes a detector to measure a distance between a substrate support structure and/or a substrate and a fluid handling system and/or to detect when an item is present between the fluid handling system and a top surface of the substrate and/or substrate support structure. The detector may use information of an electrical property of the fluid provided by the fluid handling system to measure the distance. The detector may measure variation in resistance and/or in capacitance between an electrode of the fluid handling system and an electrode of the substrate and/or substrate support structure.
    Type: Grant
    Filed: October 3, 2008
    Date of Patent: August 26, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Hans Jansen
  • Lithographic apparatus and device manufacturing method involving a liquid confinement structure
    Patent number: 8817231
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: March 17, 2010
    Date of Patent: August 26, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • Lithographic apparatus and device manufacturing method
    Patent number: 8780321
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: July 15, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Thijs Egidius Johannes Knaapen, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • Lithographic apparatus and a device manufacturing method
    Patent number: 8755026
    Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: June 17, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Gerard Gosen, Albert Johannes Maria Jansen, Nicolaas Ten Kate, Marco Koert Stavenga, Koen Steffens, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns, Koen Cuypers