Patents by Inventor Marco Koert Stavenga

Marco Koert Stavenga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and lithographic apparatus cleaning method
    Patent number: 7969548
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: June 28, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren
  • LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20110149258
    Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 23, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Gerard Gosen, Albert Johannes Maria Jansen, Nicolaas Ten Kate, Marco Koert Stavenga, Koen Steffens, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns, Koen Cuypers
  • FLUID FILTRATION METHOD, FLUID FILTERED THEREBY, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACUTRING METHOD
    Publication number: 20110136064
    Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
    Type: Application
    Filed: February 17, 2011
    Publication date: June 9, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederik De Graaf, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110109887
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Application
    Filed: January 7, 2011
    Publication date: May 12, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
  • Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
    Patent number: 7914687
    Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: March 29, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederik De Graaf, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • Cleaning device and a lithographic apparatus cleaning method
    Patent number: 7900641
    Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: March 8, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Lithographic apparatus and device manufacturing method
    Patent number: 7880860
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: February 1, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100321650
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 26, 2010
    Publication date: December 23, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: THEODORUS PETRUS MARIA CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100277709
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: March 11, 2010
    Publication date: November 4, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Marco Koert STAVENGA, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100265476
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Application
    Filed: April 23, 2010
    Publication date: October 21, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
  • Lithographic apparatus and device manufacturing method having liquid evaporation control
    Patent number: 7804575
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Grant
    Filed: August 17, 2005
    Date of Patent: September 28, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20100214543
    Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
    Type: Application
    Filed: February 1, 2010
    Publication date: August 26, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100177292
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Application
    Filed: March 17, 2010
    Publication date: July 15, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans Jansen, Marco Koert Stavenga
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100165319
    Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
    Type: Application
    Filed: December 18, 2009
    Publication date: July 1, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Noud Jan Gilissen, Hans Jansen, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Harmen Klaas Van Der Schoot, Marco Koert Stavenga, Bob Streefkerk, Peter Paul Steijaert, Marcus Martinus Petrus Adrianus Vermeulen, Jan Cornelis Van Der Hoeven
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100157260
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Application
    Filed: December 4, 2009
    Publication date: June 24, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thijs Egidius Johannes KNAAPEN, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • Lithographic apparatus and device manufacturing method
    Patent number: 7733459
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Grant
    Filed: August 24, 2004
    Date of Patent: June 8, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
  • METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS
    Publication number: 20100110398
    Abstract: A method of detecting particles in an immersion fluid of or from a lithographic apparatus. The method includes extracting a sample, using a vacuum system, from a single phase flow of the immersion fluid of or from a fluid handling structure in the lithographic apparatus. The method includes detecting particles in the sample, and initiating a signal if the detected particles are above a certain threshold.
    Type: Application
    Filed: April 24, 2009
    Publication date: May 6, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roelof Frederik DE GRAAF, Antonius Johannus Van Der Net, Marco Koert Stavenga, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Martinus Wilhelmus Van Den Heuvel
  • Lithographic apparatus and device manufacturing method
    Patent number: 7710537
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: May 4, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • Lithographic apparatus and device manufacturing method
    Patent number: 7656502
    Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: February 2, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Harmen Klaus Van Der Schoot, Noud Jan Gilissen, Peter Paul Steijaert, Erik Roelof Loopstra, Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Johannes Catharinus Hubertus Mulkens, Martinus Hendrikus Antonius Leenders, Hans Jansen, Marco Koert Stavenga, Jan Cornelis Van Der Hoeven, Bob Streefkerk, Hernes Jacobs, Marcus Martinus Petrus Adrianus Vermeulen
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20090296065
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Application
    Filed: May 26, 2009
    Publication date: December 3, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie CLOIN, Nicolaas TEN KATE, Nicolaas Rudolf KEMPER, Marco Koert STAVENGA, Erik Henricus Egidius Catharina EUMMELEN, Michel RIEPEN, Olga Vladimirovna ELISSEEVA, Tijmen Wilfred Mathijs GUNTHER, Michaël Christiaan VAN DER WEKKEN